Electron photon

Ionization efficiency. The ratio of the number of ions formed to the number of electrons, photons, or particles that are used to produce ionization... 

Other techniques in which incident photons excite the surface to produce detected electrons are also Hsted in Table 1. X-ray photoelectron Spectroscopy (xps), which is also known as electron spectroscopy for chemical analysis (esca), is based on the use of x-rays which stimulate atomic core level electron ejection for elemental composition information. Ultraviolet photoelectron spectroscopy (ups) is similar but uses ultraviolet photons instead of x-rays to probe atomic valence level electrons. Photons are used to stimulate desorption of ions in photon stimulated ion angular distribution (psd). Inverse photoemission (ip) occurs when electrons incident on a surface result in photon emission which is then detected. 

The electron—photon coupling that forms the microscopic basis of MOKE makes it possible, in principle, to determine the electron spin-dependent band structure of elements and alloys. This is done by examining the dependence of the Kerr response on the wavelength of the incident light. 

Nearly all these techniques involve interrogation of the surface with a particle probe. The function of the probe is to excite surface atoms into states giving rise to emission of one or more of a variety of secondary particles such as electrons, photons, positive and secondary ions, and neutrals. Because the primary particles used in the probing beam can also be electrons or photons, or ions or neutrals, many separate techniques are possible, each based on a different primary-secondary particle combination. Most of these possibilities have now been established, but in fact not all the resulting techniques are of general application, some because of the restricted or specialized nature of the information obtained and others because of difficult experimental requirements. In this publication, therefore, most space is devoted to those surface analytical techniques that are widely applied and readily available commercially, whereas much briefer descriptions are given of the many others the use of which is less common but which - in appropriate circumstances, particularly in basic research - can provide vital information. 

Panel on Electronic, Photonic, and Recording Materials and Devices... 

Integrating individual chemical process steps used in the manufacture of electronic, photonic, and recording materials and devices. This is a key to boosting the yield, throughput, and reliability of overall manufacturing processes. 

The importance and sophistication of current chemical manufacturing processes for electronic, photonic, and recording materials and devices are not widely appreciated. A more detailed description serves to highlight their central role in these technologies. 

A third research challenge that is generic to electronic, photonic, and recording materials and devices stems from the need for starting materials that meet purity levels once thought to be imattainable. 

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