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Image-reversal process

Figure 6 Image reversal process and related chemistry based on a... Figure 6 Image reversal process and related chemistry based on a...
Preparation of a Novel Silicone-Based Positive Photoresist and Its Application to an Image Reversal Process... [Pg.175]

This paper describes the preparation of SPP and its application to an image reversal process, as well as the chemistry of the SPP image reversal. [Pg.176]

Application to image reversal process a)Electron beam lithography... [Pg.177]

Figure 4 shows an SEM photograph of 0.3 urn line and 0.5 m space pattern delineated in an SPP 2LR system with a dose of 5 u C/cm2. The combination of this SPP image reversal process and EB direct wafer-writing technology represents a promising approach for achieving sub-halfmicron resolution. [Pg.179]

Recently, other thermally induced image-reversal processes have been... [Pg.348]

The first step in the image-reversal process (Figure 2.3) is patterned exposure. During this exposure, a latent image of photogenerated indene-... [Pg.80]

Figure 2.3. The base-catalyzed image-reversal process involves a patternwise exposure that converts the diazoquinone to the corresponding indenecarboxylic acid, follotved by a bake step that causes base-catalyzed decarboxylation that produces the nonphotosensitive indene derivative. Subsequent flood exposure converts the diazoquinone in the previously unexposed areas of the film into the indenecarboxylic acid. Development then yields a negative image of the mask because the originally patterned areas containing the lipophilic indene derivative are less soluble in base than those containing the... Figure 2.3. The base-catalyzed image-reversal process involves a patternwise exposure that converts the diazoquinone to the corresponding indenecarboxylic acid, follotved by a bake step that causes base-catalyzed decarboxylation that produces the nonphotosensitive indene derivative. Subsequent flood exposure converts the diazoquinone in the previously unexposed areas of the film into the indenecarboxylic acid. Development then yields a negative image of the mask because the originally patterned areas containing the lipophilic indene derivative are less soluble in base than those containing the...
One approach to minimize these problems is the image-reversal process described in Section 2.2 (28, 29). Another approach has been to increase the nonbleachable absorbance of the resist by adding a dye (30). This ap-... [Pg.92]

Figure 2.21. Resist hardening and image-reversal processes for the Rohm 6-... Figure 2.21. Resist hardening and image-reversal processes for the Rohm 6-...
FIGURE 5.45 Schematic of image reversal process of DNS-novolac positive photoresist. [Pg.606]

Fig. 6. Scanning electron microscope (SEM) picture of 0.8 pm lines and spaces in a photoresist used in an image reversal process. The development was stopped at the moment the profiles of the... Fig. 6. Scanning electron microscope (SEM) picture of 0.8 pm lines and spaces in a photoresist used in an image reversal process. The development was stopped at the moment the profiles of the...

See other pages where Image-reversal process is mentioned: [Pg.11]    [Pg.176]    [Pg.179]    [Pg.179]    [Pg.300]    [Pg.605]    [Pg.671]    [Pg.242]    [Pg.974]    [Pg.605]   


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