Effect of substrate temperature

N.W. Schmidt, T.S. Totushek, W.A. Kimes, D.R. Callender, and J.R. Doyle, Effects of substrate temperature and near-substrate plasma density on the properties of d.c. magnetron sputtered aluminum-doped zinc oxide, J. Appl. Phys., 94 5514-5521 (2003). 

Kim, Y. S., Park, Y. C., Ansari, S. G., Lee, B. S. and Shin, H. S. (2003b), Effect of substrate temperature on the bonded states of indium tin oxide thin films deposited by plasma enhanced chemical vapor deposition. Thin Solid Films, 426(1-2) 124-131. 

The effects of substrate temperature (Ts b) on cubic boron nitride (c-BN) films synthesized using magnetron sputtering were studied. Fourier transform infrared (FTIR) spectroscopy. X-ray photoelectron spectroscopy (XPS) were employed to characterize the structure and composition of the films. It is found that Ts , plays a crucial role on the formation of cubic phase, and an appropriate T, , can lead to a high content. A tentative explanation on the mechanism of such Ts b effects is reported with the most details. 

As far as the effect of substrate temperature was concerned, it was suggested that at temperatures lower than 70°C, impingement of low energy carbon ions creates immobile carbon interstitials and therefore the sp rich phase is formed. With increasing temperature the mobility increases and the atoms diffuse to the surface releasing the internal stress to form the thermodynamically stable sp phase. 

Figure 5.9 Effect of substrate temperature on /co/p for perfluoro-2-butyltetrahydrofuran.

The effect of substrate temperature was investigated at T = 20- 400°C. At T < 200°C, the LIF intensity was essentially temperature-independent, while it decreased with temperature at T >... 

A. (2008) Effect of substrate temperature on mechanical properties of calcium phosphate coatings. /. Biomed. Mater. Res. Part... 

Takeuchi, S., Ito, M., and Takeda, K. (1990) Modelling of residual stress in plasma-sprayed coatings effect of substrate temperature. Surf. Coat. Technol., 43/44 (1), 426-435. 

Haq et al.P l presented the time evolution of diamond nucleation on Si(lOO) in MW PACVD, as shown in Fig, 1. The effect of substrate temperature on the nucleation processes is evident in the figure. For each substrate temperature, the nucleation density increases drastically after the incubation period, and then rapidly attains its saturation level. For substrate temperatures less than 816°C, higher substrate temperatures lead to shorter incubation periods, higher nucleation rates and higher nucleation densities. 

Park and Lee s experiments show that the effect of filament temperature in HFCVD on diamond nucleation on Si is qualitatively similar to the effect of substrate temperature, i.e., with increasing filament temperature, the nucleationdensity initially increased, reached amaximum at2100°C and decreased thereafter. The drop-off forT>2100 C was explained by the observation that the etching of nucleation sites was enhanced with increasing filament temperature. Similar results were also reported in Ref. 346. 

Miyake, A., Yamada, T., Makino, H., Yamamoto, N., and Yamamoto, T. (2008) Effect of substrate temperature on structural, electrical and optical properties of Ga-doped ZnO films on cycro olefin polymer substrate by ion plating deposition. Thin Solid Films,... 

Fig. 11a - c. STM images of Ag deposited on Cu(l 11) showing the effect of substrate temperature during deposition, (a) Deposition of 0.8 ML at 225 K leads to a moire pattern, while (b) deposition of the same amount at 300 K results in a triangular misfit dislocation structure, (c) Deposition of Ag submonolayers at 775 K leads to alloying of Ag atoms into the first Cu layer (dark spots) [97Bes]. 

N. Z. Mehdizadeh, M. Raessi, S. Chandra, J. Mostaghimi Effect of substrate temperature on splashing of molten tin droplets, J. Heat Transfer, 126,445-452 (2004). 

Park, S.-M., Ikegami, T. and Ebihara, K. (2006) Effects of substrate temperature on the properties of Ga-doped ZnO by pulsed laser deposition. Thin Solid Films, 513, 90. 

Figure 10.20 The effect of substrate temperature on film stress. Note that the thermal expansion mismatch stress can be either compressive or tensile while the growth stress is generally tensile at low temperatures. If the thermal expansion stress is tensile then the total stress is the sum of the two curves shown. If the thermal expansion stress is compressive then the total stress is the difference of the two curves.

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