Direct current inductively coupled

Inductively coupled plasma (icp) emission, direct current plasma (dcp), and inductively coupled plasma mass spectrometry (icp/ms) have taken over as the methods of choice for the simultaneous detection of metallic impurities in hafnium and hafnium compounds (29,30). 

Inductively coupled argon plasma (icp) and direct current argon plasma (dcp) atomic emission spectrometry are solution techniques that have been appHed to copper-beryUium, nickel—beryUium, and aluminum—beryUium aUoys, beryUium compounds, and process solutions. The internal reference method, essential in spark source emission spectrometry, is also useful in minimizing drift in plasma emission spectrometry (17). Electrothermal (graphite... 

The current generation of inductively coupled plasma emission spectrometers provide limits of detection in the range of 0.1-500pg L 1 in solution, a substantial degree of freedom from interferences and a capability for simultaneous multi-element determination facilitated by a directly proportional response between the signal and the concentration of the analyte over a range of about five orders of magnitude. 

Among the plasma sources that have been used for analytical measurements include the inductively coupled argon plasma (ICP), direct current argon plasma (DCP) and microwave induced heUum plasma (MIP). The instrumentation and I rformance of the more popular ICP source have been discussed by Barnes More rwently, Thompson and Walsh have published a book dealing with the practical aspects of ICP. 

Flames and plasmas can be used as atomisation/excitation sources in OES. Electrically generated plasmas produce flame-like atomisers with significantly higher temperatures and less reactive chemical environments compared with flames. The plasmas are energised with high-frequency electromagnetic fields (radiofrequency or microwave energy) or with direct current. By far the most common plasma used in combination with OES for analytical purposes is the inductively coupled plasma (ICP). 

There are two popular types of plasma sources l) the direct current plasma (DCP), and 2) the inductively coupled plasma (ICP). In the commercial version of the former plasma source (marketed by Spectrometries, Inc.), the sample is aspirated with argon through a small orifice into a chamber where the large droplets settle out and the fine mist is conveyed by the argon stream through a chimney to the vertex of a plasma which is in the form of... 

Microwave-induced plasma (MIP), direct-current plasma (DCP), and inductively coupled plasma (ICP) have also been successfully utilized. The abundance of emission lines offer the possibility of multielement detection. The high source temperature results in strong emissions and therefore low levels of detection. Atomic absorption (AA) and atomic fluorescence (AF) offer potentially greater selectivity because specific line sources are utilized. On the other hand, the resonance time in the flame is short, and the limit of detectability in atomic absorption is not as good as emission techniques. The linearity of the detector is narrower with atomic absorption than emission and fluorescence techniques. 

The most suitable techniques for the rapid, accurate determination of the elemental content of foods are based on analytical atomic spectrometry, for example, atomic absorption spectrometry (AAS), atomic emission spectrometry (AES), and mass spectrometry, the most popular modes of which are Game (F), electrothermal atomization (ET), and hydride generation (HG) AAS, inductively coupled plasma (ICP), microwave-induced plasma (MIP), direct current plasma (DCP) AES, and ICP-MS. Challenges in the determination of elements in food include a wide range of concentrations, ranging from ng/g to percent levels, in an almost endless combination of analytes with matrix speci be matrices. 

Figure 3.2 Direct-current arc (after G.L. Moore, Introduction to Inductively Coupled Plasma. Atomic Emission Spectrometry, p. 35. C 1989, with the permission of Elsevier Science, Amsterdam).

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