Direct current argon plasma

Inductively coupled argon plasma (icp) and direct current argon plasma (dcp) atomic emission spectrometry are solution techniques that have been appHed to copper-beryUium, nickel—beryUium, and aluminum—beryUium aUoys, beryUium compounds, and process solutions. The internal reference method, essential in spark source emission spectrometry, is also useful in minimizing drift in plasma emission spectrometry (17). Electrothermal (graphite... 

Among the plasma sources that have been used for analytical measurements include the inductively coupled argon plasma (ICP), direct current argon plasma (DCP) and microwave induced heUum plasma (MIP). The instrumentation and I rformance of the more popular ICP source have been discussed by Barnes More rwently, Thompson and Walsh have published a book dealing with the practical aspects of ICP. 

This effect has been successfully employed to improve the LC detection of metal ions as their metal complexes (496.497.499). Recently, it has also been demonstrated that metal ions can be detected by direct-current argon plasma emission spectroscopy after LC separation with micellar mobile phases (490). 

Greene B, Uranga A, Sneddon J. 1985. Observations on the determination of uranium in waters by direct current argon plasma emission spectrometry. Spectroscopy Letters 18(6) 425-436. 

Mitchell, P.G., Greene, B. and Sneddon, J. (1986) Direct determination of mercury in solid algal cells by direct-current argon-plasma emission spectrometry with sample introduction by electrothermal vaporization. Microchim. Acta, 1986 I, 249-258. 

Mitchell et al. [80] have described development of a laser ablation/direct-current argon plasma (DCP) emission spectrometry system based on a relatively low-energy, high-repetition rate Nd YAG laser as opposed to the high-energy and low-repetition rate ruby lasers. 

Direct-current argon plasma 6 000 to 10000 Emission Direct-current plasma spectroscopy, DCP... 

D.J. Mazzo, WG. Elliott, PC. Uden, and R.M. Barnes. The design and characterization of an interface for high performance liquid chromatography with direct current argon plasma detection. Appl. Spec., 38(4), 585 (1984). 

ICP-OES is an analytical system that can do simultaneous or sequential determination of up to 50 elements at all concentration levels with a high degree of accuracy and precision. Excellent vaporization-atomization-excitation-ionization is obtained with an argon-supported ICP operated at atmospheric pressure. The emitted spectra is observed with a polychromator or a scanning spectrometer may be used depending on whether simultaneous or sequential determinations are desired. This atomization-excitation process does not exhibit interelenent effects often seen in AAS, and ppb range detection is routine. Effective nebulization of samples needs to be improved on however, ICP and direct-current (DC) plasmas are extremely effective atomization sources that provide the most effective instrumental technique for simultaneous elemental analysis. 

In a direct-current plasma source (DCP) initial heating of an inert gas, usually argon, is produced by a dc-arc. Experimentally it is arranged for the plasma to be established in a high-velocity gas stream. When the edges of the plasma are cooled with an inert gas vortex, the cooler outer parts have... 

There are two popular types of plasma sources l) the direct current plasma (DCP), and 2) the inductively coupled plasma (ICP). In the commercial version of the former plasma source (marketed by Spectrometries, Inc.), the sample is aspirated with argon through a small orifice into a chamber where the large droplets settle out and the fine mist is conveyed by the argon stream through a chimney to the vertex of a plasma which is in the form of... 

In CG-direct-current plasma (DCP), a direct-current arc is struck between two electrodes as an inert gas sweeps between the electrodes carrying the sample. Carrier gases such as helium, argon, and nitrogen have been used. 

Can the anode magnetron be used in the precleaning process of the metallic substrate that is used as the cathode in the cathodic plasma polymerization In a more broad sense, can the surface of metal (cathode) be cleaned by argon direct current (DC) discharge sputtering ... 

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