Diffusion post-treatment processes

Vol. 1 Polymer Engineering Vol. 2 Filtration Post-Treatment Processes Vol. 3 Multicomponent Diffusion Vol. 4 Transport in Porous Catalysts... 

It is evident that a highly dispersed CuCl catalyst will combine better with silicon and the Cu will diffuse faster into the Si lattice in the subsequent reaction steps. However, most works on this aspect have focused on the post treatment of a ready-made catalyst, which is a complicated process using a large amount of energy. 

Equation 2 is an analytical statement of the solution-diffusion mqdel of penetrant transport in polymers, which is the most widely accepted explanation of the mechanism of gas permeation in nonporous polymers (75). According to this model, penetrants first dissolve into the upstream (i.e, high pressure) face of Ae film, diffuse through the film, and desorb at the downstream (Le. low pressure) face of the film. Diffusion, the second step, is the rate limiting process in penetrant permeation. As a result, much of the fundamental research related to the development of polymers with improved gas separation properties focuses on manipulation of penetrant diffusion coefficients via systematic modification of polymer chemical structure or superstructure and either chemical or thermal post-treatment of polymer membranes. Many of the fundamental studies recorded in this book describe the results of research projects to explore the linkage between polymer structure, processing history, and small molecule transport properties. 

Excellent transport characteristics, solubilization power, and sensitivity to process variables all contribute to the success of the methodology. The generic scheme involves homogenization, impregnation, deposition, and optional post treatment steps such as curing reactions. The mechanism of transport in the porous matrix is permeation and diffusion while the primary mechanisms for deposition are pressure reduction, temperature swing, sorption, and reaction (i.e., polymerization). 

Understanding the adsorption, diffusivities and transport limitations of hydrocarbons inside zeolites is important for tailoring zeolites for desired applications. Knowledge about diffusion coefficients of hydrocarbons inside the micropores of zeolites is important in discriminating whether the transport process is micropore or macropore controlled. For example, if the diffusion rate is slow inside zeolite micropores, one can modify the post-synthesis treatment of zeolites such as calcination, steaming or acid leaching to create mesopores to enhance intracrystalline diffusion rates [223]. The connectivity of micro- and mesopores then becomes an... 

Luo, Cui and Li (1999) addressed the problem of temperature sensitivity of IBAD of ACPs and their subsequent crystallisation forming hydroxyapatite. Post-depositional annealing temperatures were decreased to 400 °C. The crystallisation of calcium phosphate coating is a hydroxyl ion diffusion-controlled process, thought to be the mechanism responsible for the decrease of the crystallisation temperature. The detailed study of the crystallisation process of calcium phosphate coatings shows that the crystallinity of the hydroxyapatite coating can be well controlled by adjusting the post-heat-treatment time. 

Supercritical fluid anti-solvent processes have been recently proposed as alternatives to liquid anti-solvent processes commonly employed in the industry. The key advantage of the supercritical processes over liquid ones is the possibility to completely remove the anti-solvent by pressure reduction. This step of the process is problematic in case of liquid anti-solvents since it requires complex post-processing treatments for the complete elimination of liquid residues. Furthermore, the supercritical anti-solvent is characterized by diffusivity that can be up to two orders of magnitude higher than those of liquids. Therefore, its very fast diffusion into the liquid solvent produces the supersaturation of the solute and the precipitation in micronized particles with diameters that are not possible to obtain using liquid anti-solvents or other methods. 

The depositing film material may diffuse and react with the substrate to form an interfacial region . The material in the interfacial region has been called the interphase material and its properties are important to the adhesion, electrical, and electronic properties of film-substrate systems. In particular, the development of ohmic contacts to semiconductor materials is very dependent on the interface formation process, The type and extent of the interfacial region can change as the deposition process proceeds or may be modified by post-deposition treatments. Interfacial regions are categorized as ... 

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