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Deposition methods electrochemical

Stamenkovic V, Arenz M, Ross PN, Markovic NM. 2004. Temperature-induced deposition method for anchoring metallic nanoparticles onto reflective substrates for in situ electrochemical infrared spectroscopy. J Phys Chem B 108 17915-17920. [Pg.268]

Anode materials are most typically deposited by evaporation, sputtering, or chemical vapor deposition methods. Other methods such as screen printing, laser ablation, electrochemical deposition, etc., have also been used. [Pg.302]

Possible advantages to an electrochemical deposition method include... [Pg.193]

Electrodeposition of Cu for IC fabrication has been used successfully since 1997 for the production of interconnection lines down to 0.20 )Lim width. Electrochemical metal deposition methods represent a very attractive alternative to the conventional IC fabrication processes (33). Development of electrochemical deposition technology for IC fabrication also represents an excellent opportunity for the electrochemists community. This opportunity stems from the fact that new electrochemical deposition processes, producing deposits of different structure and properties, are needed to meet requirements of new, sub-micrometer-range computer technologies. [Pg.5]

A GCE coated with a film of Prussian Blue (Fe4[Fe(CN)6]3) mimics HRP as catalyst for selective electrochemical reduction of H2O2 in the presence of O2. A careful deposition method has to be followed to prevent leakage of the oxidized form of the pigment from the coating into the solution. Amperometric determinations in phosphate buffer at pH 6.0, with an apphed potential of —50 mV vs. SCSE, shows Unearity in the 0.1 to 100 p,M range. ... [Pg.655]

Electrodeposition of Cu for IC fabrication has been successfully used since 1997 for the production of interconnection lines down to 0.20 /tun width. Electrochemical metal deposition methods represent a very attractive alternative to the conventional IC fabrication processes (33). [Pg.6]

J. S. Newman, Electrochemical Systems, 2nd ed., Prentice Hall, New Jersey, 1991. 8Y. Cherrault, Convergence of Adomian s method, Kyhernetes. 18(2) (1989) 31-38. 9A. Wazwaz and S. El-Sayed, A new modification of the Adomain deposition method for linear and nonlinear operators, Appl. Math and Computing 122 (2001) 393-405. [Pg.303]

The direct electrochemical deposition methods for the preparation of electrocatalysts allow to localize the catalyst particles on the top surface of the carbon support, as close as possible to the solid polymer electrolyte and does not need heat (oxidative and/or reducing) treatment, as most of the chemical methods do, in order to clean the catalytic particles from surfactant contamination [27,28], This will prevent catalyst sintering due to the agglomeration of nanoparticles under thermal treatment. [Pg.397]

Vapor deposition methods include physical vapor deposition (PVD) (Heremans et al., 2000) and chemical vapor deposition (CVD) (Cheng et al., 2000) or metallorganic chemical vapor deposition (MOCVD) (Berry et al., 1996). Vapor deposition and electrochemical deposition are capable of... [Pg.179]

Nanoparticles can be prepared with electrochemical deposition method. Dai and his coworkers made some platinum nanoparticle-modified glassy carbon electrodes... [Pg.76]

Each of the electrode geometries shown in Fig. 1 can be arranged in groups to form array electrodes, examples of which are shown in Fig. 2. The behavior of array electrodes depends on the ratio of the diameter of the individual electrode features to the spacing between electrode features as demonstrated in Fig. 3. Arrays may be made using lithographic procedures or electrochemical or electroless template deposition methods. [Pg.207]

Metal-vapour-deposition methods have begun to provide new low-valent complexes of uncommon stoichiometry. The preparation of gram quantities of paramagnetic (ji = 2.02 BM) [Co(bipy)2] has been reported and its reactions with Br2, tetracyanoethylene and tetracyanoquinodimethane studied.283 Electrochemically it behaves identically to [Co(bipy)3]2+ (equation 47).283... [Pg.691]

Hi DAKA H, Ajisaka K, Horikoshi S, Oyama T, Takeuchi K, Zhao J, Serpone N (2001) Comparative Assessment of the Efficiency of T102/0TE Thin Eilm Electrodes Fabricated by Three Deposition Methods. Photo-electrochemical Degradation of the DBS Anionic Surfactant, J. Photochem. Photobiol. A Chem. 138 185-192. [Pg.139]


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See also in sourсe #XX -- [ Pg.665 , Pg.668 , Pg.688 ]




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