Contact formation process

The studies conducted indicate that the fine disperse filler added to mineral binders did not act solely as a substrate support for the hydration nuclei, but played an important role as an active structure-forming element and took direct part in the contact formation process. 

Landman U, Luedtke W D and Ringer E M 1992 Moiecuiar dynamics simuiations of adhesive contact formation and friction Fundamentals of Friction Macroscopic and Microscopic Processes (NATO ASI Series E220) eds i LSinger and FI M Pollock (Dordrecht Kiuwer) pp 463-508... 

The clipping reaction used in [52, 53, 55] to synthesize tetralactam-based squaraine rotaxanes such as 14 and 15 afforded only moderate yields (ca. 28-35%) of the rotaxanes, possibly because of the unavoidable presence of nucleophiles that react with the chemically unstable squaraines during the reaction. The slippage approach [62] minimizes the squaraine dye s contact with nucleophiles during the rotaxane formation process and therefore can be used to efficiently encapsulate a squaraine dye such as 23 in a macrocycle such as 25 [63],... 

Because of the similar potentials between fully lithiated graphite and lithium metal, it has been suggested that the chemical nature of the SEIs in both cases should be similar. On the other hand, it has also been realized that for carbonaceous anodes this formation process is not expected to start until the potential of this anode is cathodically polarized (the discharge process in Figure 11) to a certain level, because the intrinsic potentials of such anode materials are much higher than the reduction potential for most of the solvents and salts. Indeed, this potential polarization process causes one of the most fundamental differences between the SEI on lithium metal and that on a carbonaceous anode. For lithium metal, the SEI forms instantaneously upon its contact with electrolytes, and the reduction of electrolyte components should be indiscriminate to all species possible,while, on a carbonaceous anode, the formation of the SEI should be stepwise and preferential reduction of certain electrolyte components is possible. 

The NEB method has been applied successfiilly to a wide range of problems, for example studies of diffusion processes at metal smfaces, multiple atom exchange processes observed in sputter deposition simulations, dissociative adsorption of a molecule on a smface, diffusion of rigid water molecules on an ice Di siuface, contact formation between metal tip and a smface, cross-slip of screw dislocations in a metal (a simulation requiring over 100,000 atoms in the system, and a total of over 2,000,000 atoms in the MEP calculation), g d diffusion processes at and near semiconductor smfaces (using a plane wave based Density Fimctional Theory method to calculate the atomic forces). In the last two applications the calculation was carried out on a cluster of workstations with the force on each image calculated on a separate node. 

The formation and replication of patterns into polymer films using instabilities is a new contribution in the field of soft lithography, which typically requires the mechanical contact between a patterned master and the resist. Two classes of instabilities were discussed. The demixing of two incompatible polymers leads to a well known spinodal pattern. In thin films, this structure formation process can be guided by a pattern in surface energy. 

Deposition and etching of Si can be accomplished at line widths <0.4 Jim (204). Practical applications of this laser microchemical processing include ohmic contact formation on p-InP (p-type indium phosphide) and hard-surface-mask repair (205). Further details on recent applications of this process can be found (204-206). 

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