Compounds borides

The main chemical products produced from these minerals are (a) boron oxides, boric acid and borates, (b) esters of boric acid, (c) refractory boron compounds (borides, eu .), (d) boron halides, (e) boranes and carbaboranes and (f) organoboranes. The main industrial and domestic uses of boron compounds in Europe (USA in parentheses) are ... 

II-VI and III-V compounds, borides, carbides, nitrides and silicides of transition metals, as well as sulphides, phosphides, aluminides, etc. A1203, AIN, B203, BN, SiC, Si3N4, U02, Y203, Zr02, etc. 

Metal-Matrix Composites. A metal-matrix composite (MMC) is comprised of a metal ahoy, less than 50% by volume that is reinforced by one or more constituents with a significantly higher elastic modulus. Reinforcement materials include carbides, oxides, graphite, borides, intermetahics or even polymeric products. These materials can be used in the form of whiskers, continuous or discontinuous fibers, or particles. Matrices can be made from metal ahoys of Mg, Al, Ti, Cu, Ni or Fe. In addition, intermetahic compounds such as titanium and nickel aluminides, Ti Al and Ni Al, respectively, are also used as a matrix material (58,59). P/M MMC can be formed by a variety of full-density hot consolidation processes, including hot pressing, hot isostatic pressing, extmsion, or forging. 

The materials deposited by PVD techniques include metals, semiconductors (qv), alloys, intermetaUic compounds, refractory compounds, ie, oxides, carbides, nitrides, borides, etc, and mixtures thereof. The source material must be pure and free of gases and inclusions, otherwise spitting may occur. 

Refractory Compounds. Refractory compounds resemble oxides, carbides, nitrides, borides, and sulfides in that they have a very high melting point. In some cases, they form extensive defect stmctures, ie, they exist over a wide stoichiometric range. For example, in TiC, the C Ti ratio can vary from 0.5 to I.O, which demonstrates a wide range of vacant carbon lattice sites. 

Boron forms B—N compounds that are isoelectronic with graphite (see Boron compounds, refractoryboron compounds). The small size also has a significant role in the interstitial alloy-type metal borides boron forms. Boron forms borides with metals that are less electronegative than itself including titanium, zirconium, and hafnium. 

Borides have metallic characteristics such as high electrical conductivity and positive coefficients of electrical resistivity. Many of them, particularly the borides of metals of Groups 4 (IVB), 5 (VB), and 6 (VIB), the MB compounds of Groups 2(11) and 13(111), and the borides of aluminum and siUcon, have high melting points, great hardness, low coefficients of thermal expansion, and good chemical stabiUty. 

Next to Cr C2, TiC is the principal component for heat and oxidation-resistant cemented carbides. TiC-based boats, containing aluminum nitride, AIN, boron nitride, BN, and titanium boride, TiB2, have been found satisfactory for the evaporation of metals (see Boron compounds, refractory boron compounds Nitrides). 

For a large number of applications involving ceramic materials, electrical conduction behavior is dorninant. In certain oxides, borides (see Boron compounds), nitrides (qv), and carbides (qv), metallic or fast ionic conduction may occur, making these materials useful in thick-film pastes, in fuel cell apphcations (see Fuel cells), or as electrodes for use over a wide temperature range. Superconductivity is also found in special ceramic oxides, and these materials are undergoing intensive research. Other classes of ceramic materials may behave as semiconductors (qv). These materials are used in many specialized apphcations including resistance heating elements and in devices such as rectifiers, photocells, varistors, and thermistors. 

Derivatives such as borides, carbides, nitrides, and hydrides are best prepared by direct reaction between the elements. These metaHoid-type compounds, which often show variable composition, are colored and sometimes semiconducting. 

Many binary and pseudo-binary compounds of the alkali metals are more conveniently treated within the context of the chemistry of the other element and for this reason discussion Is deferred to later chapters, e.g. borides (p. 145),... 

The various stoichiometries are not equally common, as can be seen from Fig. 6.5 the most frequently occurring are M2B, MB, MB2, MB4 and MBfi, and these five classes account for 75% of the compounds. At the other extreme RunBg is the only known example of this stoichiometry. Metal-rich borides tend to be formed by the transition elements whereas the boron-rich borides are characteristic of the more electropositive elements in Groups 1-3, the lanthanides and the actinides. Only the diborides MB2 are common to both classes. 

Boron (like silicon) invariably occurs in nature as 0X0 compounds and is never found as the element or even directly bonded to any other element than oxygen. The structural chemistry of B-O compounds is characterized by an extraordinary complexity and diversity which rivals those of the borides (p. 145) and boranes (p. 151). In addition, vast numbers of predominantly organic compounds containing B-O are known. 

Attempts to classify carbides according to structure or bond type meet the same difficulties as were encountered with hydrides (p. 64) and borides (p. 145) and for the same reasons. The general trends in properties of the three groups of compounds are, however, broadly similar, being most polar (ionic) for the electropositive metals, most covalent (molecular) for the electronegative non-metals and somewhat complex (interstitial) for the elements in the centre of the d block. There are also several elements with poorly characterized, unstable, or non-existent carbides, namely the later transition elements (Groups 11 and 12), the platinum metals, and the post transition-metal elements in Group 13. 

The most extensive group of nitrides are the metallic nitrides of general formulae MN, M2N, and M4N in which N atoms occupy some or all of the interstices in cubic or hep metal lattices (examples are in Table 11.1, p. 413). These compounds are usually opaque, very hard, chemically inert, refractory materials with metallic lustre and conductivity and sometimes having variable composition. Similarities with borides (p. 145) and carbides (p. 297) are notable. Typical mps (°C) are ... 

Such reactions are discussed at appropriate points throughout the book as each individual compound is being considered. A particularly important set of reactions in this category is the synthesis of element hydrides by hydrolysis of certain sulfides (to give H2S), nitrides (to give NH3), phosphides (PH3), carbides (C Hm), borides (B Hm), etc. Useful reviews are available on hydrometallurgy (the recovery of metals by use of aqueous solutions at relatively low temperatures), hydrothermal syntheses and the use of supercritical water as a reaction medium for chemistry. 

The binaiy hydrides (p. 64), borides (p. 145), carbides (p. 299) and nitrides (p. 417) are hard, refractory, nonstoichiometric materials with metallic conductivities. They have already been discussed in relation to comparable compounds of other metals in earlier chapters. 

In general, many metals and alloys (e.g. of Al, Ta and Mo) can be deposited on metallic and some non-metallic substrates. M may also be a metal compound having special useful properties (e.g. borides, nitrides, oxides, silicides and carbides), or even a non-metal such as Si (as in Ihrigising ). 

Carbide decompositions yield no volatile product and, therefore, many of the more convenient experimental techniques based on gas evolution or mass change cannot be applied. This is a probable reason for the relative lack of information about the kinetics of reaction of these and other compounds which are correctly classifed under this heading, such as borides, silicides, etc. 

The deposition of a binary compound can be achieved by a coreduction reaction. In this manner, ceramic materials such as oxides, carbides, nitrides, borides, and silicides can be produced readily and usually more readily than the parent metal. A common example is the deposition of titanium diboride ... 

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