Chemically amplified cross-linking negative resists

Chemically amplified cross-linking negative resists... [Pg.224]

Acid-C t lyzed Chemistry. Acid-catalyzed reactions form the basis for essentially all chemically amplified resist systems for microlithography appHcations (61). These reactions can be generally classified as either cross-linking (photopolymerization) or deprotection reactions. The latter are used to unmask acidic functionality such as phenohc or pendent carboxyhc acid groups, and thus lend themselves to positive tone resist apphcations. Acid-catalyzed polymer cross-linking and photopolymerization reactions, on the other hand, find appHcation in negative tone resist systems. Representative examples of each type of chemistry are Hsted below. [Pg.125]

Chemically amplified negative phenolic resists based on acid-catalyzed condensation/intermolecular dehydration cross-linking reactions... [Pg.224]

Chemically amplified condensation/intermolecular dehydration negative resists based on acid-catalyzed cross-linking with acid-sensitive electrophile (cross-linking agent)... [Pg.238]