Chemical vapor deposition defined

Deposition of Thin Films. Laser photochemical deposition has been extensively studied, especially with respect to fabrication of microelectronic stmctures (see Integrated circuits). This procedure could be used in integrated circuit fabrication for the direct generation of patterns. Laser-aided chemical vapor deposition, which can be used to deposit layers of semiconductors, metals, and insulators, could define the circuit features. The deposits can have dimensions in the micrometer regime and they can be produced in specific patterns. Laser chemical vapor deposition can use either of two approaches. 

Chemical vapor deposition may be defined as the deposition of a solid on a heated surface from a chemical reaction in the vapor phase. It belongs to the class of vapor-transfer processes which is atomistic in nature, that is the deposition species are atoms or molecules or a combination ofthese. Beside CVD, they include various physical-vapor-deposition processes (PVD) such as evaporation, sputtering, molecular-beam epitaxy, and ion plating. 

According to Ref. [12], template for synthesis of nanomaterials is defined as a central structure within which a network forms in such a way that removal of this template creates a filled cavity with morphological or stereochemical features related to those of the template. The template synthesis was applied for preparation of various nanostructures inside different three-dimensional nanoporous structures. Chemically, these materials are presented by polymers, metals, oxides, carbides and other substances. Synthetic methods include electrochemical deposition, electroless deposition, chemical polymerization, sol-gel deposition and chemical vapor deposition. These works were reviewed in Refs. [12,20]. An essential feature of this... 

Silicon Epitaxy. A critical step in IC fabrication is the epitaxial deposition of silicon on an integrated circuit. Epitaxy is defined as a process whereby a thin crystalline film is grown on a crystalline substrate. Silicon epitaxy is used in bipolar ICs to create a high resistivity layer on a low resistivity substrate. Most epitaxial depositions are done either by chemical vapor deposition (CVD) or by molecular beam epitaxy (MBE) (see Thin FILMS). CVD is the mainstream process. 

Chemical Vapor Deposition (CVD) has been defined as a materials synthesis process whereby constituents of the vapor phase react chemically near or on a substrate surface to form a solid product. With these traditional processes a reaction chamber and secondary energy (heat) source are mandatory making them different from the Combustion CVD process. Numerous flame-based variations of CVD have been used to generate powders, perform spray pyrolysis, create glass forms, and form carbon films including diamond films. 

Without loss of generality, chemical vapor deposition (CVD) can be defined as a deposition technique, in which chemical components in the vapor phase react on a surface to form a solid film. This technique has been the workhorse of the industry for a large number of applications involving thin film depositions, as will be discussed in the later sections. This is primarily due to the unique advantages CVD has to offer, some of which are listed below ... 

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