Atomic layer deposition metal oxides

Raeisaenen P.I., Ritala M., Leskelae M. Atomic layer deposition of AI2O3 films using AICI3 and Al(0 Pr)3 as precursors. J. Mater. Chem. 2002 12 1415-1418 Rahtu A., Ritala M., Leskelae M. Atomic layer deposition ofzirconium titanium oxide from titanium isopropoxide and zirconium chloride. Chem. Mater. 2001 13 1528-1532 Ritala M., Kukli K., Rahtu A., Raisanen P.I., Leskela M., Sajavaara T., Keinonen J. Atomic layer deposition of oxide thin films with metal alkoxides as oxygen sources. Science 2000 288 319-321... 

Reductive UPD is the major atomic layer deposition processes used in EC-ALE, Equation 1. Many metals can be obtained in a soluble oxidized form, from which atomic layers can be deposited at underpotentials. Control points are the reactant... 

Wang, X., S.M. Tabakman, and H. Dai, Atomic layer deposition of metal oxides on pristine and functionalized graphene. Journal of the American Chemical Society, 2008.130(26) p. 8152-8153. 

This chapter is intended to cover major aspects of the deposition of metals and metal oxides and the growth of nanosized materials from metal enolate precursors. Included are most types of materials which have been deposited by gas-phase processes, such as chemical vapor deposition (CVD) and atomic layer deposition(ALD), or liquid-phase processes, such as spin-coating, electrochemical deposition and sol-gel techniques. Mononuclear main group, transition metal and rare earth metal complexes with diverse /3-diketonate or /3-ketoiminate ligands were used mainly as metal enolate precursors. The controlled decomposition of these compounds lead to a high variety of metal and metal oxide materials such as dense or porous thin films and nanoparticles. Based on special properties (reactivity, transparency, conductivity, magnetism etc.) a large number of applications are mentioned and discussed. Where appropriate, similarities and difference in file decomposition mechanism that are common for certain precursors will be pointed out. 

M. Knez et al. showed the application of atomic layer deposition, a gas-phase thin film deposition process, to biological macromolecules (tobacco mosaic virus and ferritin), which are frequently used as templates in nanoscale science, and the possibility to fabricate metal oxide nanotubes and thin films with embedded... 

Knez M, Kadri A, Wege C, Gosele U, Jeske H, Nielsch K (2006) Atomic layer deposition on biological macromolecules metal oxide coating of tobacco mosaic virus and ferritin. Nano Lett 6 1172-1177... 

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