Aspen Technology, Inc

ASPEN-PLUS Introduction Manual, Aspen Technology Inc., Cambridge, Massachusetts. 

ASPEN steady-state Aspen Technology Inc. Ten Canal Park, Aspentech.com... 

Aspen Technology, Inc. Aspen Plus, Aspen Custom Modeler, Dynaplus, Split, Advent, Adsim. Cambridge, MA (1998). 

The non-random two-liquid segment activity coefficient model is a recent development of Chen and Song at Aspen Technology, Inc., [1], It is derived from the polymer NRTL model of Chen [26], which in turn is developed from the original NRTL model of Renon and Prausznitz [27]. The NRTL-SAC model is proposed in support of pharmaceutical and fine chemicals process and product design, for the qualitative tasks of solvent selection and the first approximation of phase equilibrium behavior in vapour liquid and liquid systems, where dissolved or solid phase pharmaceutical solutes are present. The application of NRTL-SAC is demonstrated here with a case study on the active pharmaceutical intermediate Cimetidine, and the design of a suitable crystallization process. 

Aspen Technology, Inc., 4spenPlus Users Guide, Cambridge, Mass., 1988, pp. 5—46, appendix pp. C25—C34. 

ASPEN PLUS User s Guide (1994), Aspen Technology Inc., 251 Vassor St., Cambridge, MA 02139 (1994). 

Chau-Chyun Chen, Aspen Technology, Inc., Burlington, MA 01803, USA... 

The local composition model (LCM) is an excess Gibbs energy model for electrolyte systems from which activity coefficients can be derived. Chen and co-workers (17-19) presented the original LCM activity coefficient equations for binary and multicomponent systems. The LCM equations were subsequently modified (1, 2) and used in the ASPEN process simulator (Aspen Technology Inc.) as a means of handling chemical processes with electrolytes. The LCM activity coefficient equations are explicit functions, and require computational methods. Due to length and complexity, only the salient features of the LCM equations will be reviewed in this paper. The Aspen Plus Electrolyte Manual (1) and Taylor (21) present the final form of the LCM binary and multicomponent equations used in this work. 

AspenPlus and Aspen Dynamics are registered trademarks of Aspen Technology Inc. 

Aspen Plus User s Guide, Aspen Technology Inc, Cambridge, 1998. 

Most pinch analysis in industry is carried out using commercial pinch analysis software. Programs such as Aspen HX-Net (Aspen Technology Inc.), SUPERTARGET ... 

We are grateful to Aspen Technology Inc. and Honeywell Inc. for permission to include the screen shots that were generated using their software to illustrate the process simulation and costing examples. Laurie Wang of Honeywell also provided valuable review comments. The material safety data sheet in Appendix I is reproduced with permission of Eischer Scientific Inc. Aspen Plus , Aspen Kbase, Aspen ICARUS,... 

C-C. Chen Dr, Aspen Technology Inc., 10 Canal Park, Cambridge, MA 02141 USA Tel +1 617 941 1202 e-mail chauchyun.chen aspentech.com... 

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