X-Ray and Extreme Ultraviolet Lithographies

Like a great ring of pure and endless light 

---

Currently, the fabrication of well-defined nanostructures for both scientific and industrial purposes mainly relies on top-down nanolithographic processes, such as nanoimprint, X-ray, extreme ultraviolet, and electron-beam lithography [1,2], Most of these methods require time consuming, complex, and expensive beam sources for exposure as well as harmful corrosive chemicals for the involved etching steps. However, the resolution of the structures, the quantities of nanostmctures produced, and the fabrication of complex three-dimensional structures are usually rather limited for these techniques. 

---