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Vacuum level

The surface work fiincdon is fonnally defined as the minimum energy needed m order to remove an electron from a solid. It is often described as being the difference in energy between the Fenni level and the vacuum level of a solid. The work ftmction is a sensitive measure of the surface electronic structure, and can be measured in a number of ways, as described in section B 1.26.4. Many processes, such as catalytic surface reactions or resonant charge transfer between ions and surfaces, are critically dependent on the work ftmction. [Pg.300]

Solvent must have sufficient volatihty to be easily removed at target temperature and vacuum levels. [Pg.452]

May be inferior for systems with high boiling point elevations (high vacuum levels requited). [Pg.452]

FIG, 10-104 Vacuum levels normally required to perform common manufacturing processes. (Couriesy of Compressed Air magazine.)... [Pg.936]

Cake Thickness Control Sometimes the rate of cake formation with bottom feed-type filters is rapid enough to create a cake too thick for subsequent operations. Cake thickness may be controlled by adjusting the bridge-blocks in the filter valve to decrease the effective submergence, by reducing the slurry level in the vat, and by reducing the vacuum level in the cake formation portion of the filter valve. If these measures are inadequate, it may be necessaiy to use a toploading filter. [Pg.1693]

At the start of the leaf test run, the hose between the test leaf and filtrate receiver should be crimped by hand to bring the filtrate receiver to the operating vacuum level. The use of a valve at this point is not only less convenient but very frequently results in a hydraulic... [Pg.1695]

In any leaf test program there is always a question as to what vacuum level should be used. With very porous materials, a vacuum in the range of 0.1 to 0.3 bar (3 to 9 in Hg) should be used, and, except for thermal-drying apphcations using hot air, the vacuum level should be adjusted to give an air rate in the range of 450 to 900 mVm h (30 to 40 cfm/ft measured at the vacuum. [Pg.1696]

For materials of moderate to low porosity, a good starting vacuum level is 0.6 to 0.7 bar (18 to 21 in Hg), as the capacity of most vacuum pumps starts to fall off rapidly at vacuum levels higher than 0.67 bar (20 in Hg). Unless there is a critical moisture content which requires the use of higher vacuums, or unless the deposited cake is so impervious that the air rate is extremely low, process economics will favor operation at vacuums below this level. When test work is carried out at an elevation above sea level different than that of the plant, the elevation at the plant should be taken into account when determining the vacuum system capacity for high vacuum levels (>0.5 bar). [Pg.1696]

Hand-crimp the hose in back of the test leaf, and then turn on the vacuum pump and regulate the bypass valve on the pump to give the desired vacuum level in the receiver. [Pg.1697]

During each of the operations record all periinent information such as vacuum level, temperature, time required for the cake to crack, filtrate foaming characteristics, air flow rate during the drying periods, etc. [Pg.1697]

Darcy s law has been used to derive an expression which reflects not only the effect of a change in elevation, but also provides a means for estimating changes in air rate resulting from changes in vacuum level and cake thickness (or cake weight per unit areaj. In order for this relationship to hold for changes in vacuum and cake thickness, it must be assumed that both cakes have the same specific resistance. [Pg.1702]

Process data Sp. gr. of feed liquid = 1.0 TDS (total dissolved solids) in feed liquid = 4.0 wt % fresh water used for washing vacuum level = 18 in Hg final cake liquid content = 25 wt %. [Pg.1704]

Monitor vacuum level between source and reaction vessel... [Pg.75]

The ejector is widely used as a vacuum pump, where it is staged when required to achieve deeper vacuum levels. If the motive fluid pressure is sufficiently high, the ejector can compress gas to a slightly positive pressure. Ejectors are used both as subsonic and supersonic devices. The design must incorporate the appropriate nozzle and diffuser compatible with the gas velocity. The ejector is one of the ( to liquid carryover in the suction gas. [Pg.10]

Historically, EELS is one of the oldest spectroscopic techniques based ancillary to the transmission electron microscope. In the early 1940s the principle of atomic level excitation for light element detection capability was demonstrated by using EELS to measure C, N, and O. Unfortunately, at that time the instruments were limited by detection capabilities (film) and extremely poor vacuum levels, which caused severe contamination of the specimens. Twenty-five years later the experimental technique was revived with the advent of modern instrumentation. The basis for quantification and its development as an analytical tool followed in the mid 1970s. Recent reviews can be found in the works by Joy, Maher and Silcox " Colliex and the excellent books by Raether and Egerton. ... [Pg.137]

Another example in the polymers industry is illustrated in Figure 17, which is a process aimed at the batch drying of waste residue with solvent recovery. In this application liquid or viscous waste solutions are pumped into a batch dryer where they are dried under vacuum to a solid granular residue. Vaporized water and solvent are recovered by condensation and then separated by gravity. The process scheme is flexible, offering a range of temperatures and vacuum levels for treating... [Pg.110]

The filtration area of large table filters is more than 200 m and having few moving parts can rotate at a cycle time of 1.5 minutes. These machines can handle thick cakes and may be operated at high vacuum levels. The major subassemblies of the machine include ... [Pg.231]

For large process systems of vessels, piping, and other equipment, the downtime required to evacuate the system before it is at the pressure (vacuum) level and then to maintain its desired vacuum condition, can become an important consideration during start-up, repair, and restart operations. [Pg.380]

Figure 5-3. UPS spectrum of Au illustrating the procedure to obtain vacuum level referenced spectra. Figure 5-3. UPS spectrum of Au illustrating the procedure to obtain vacuum level referenced spectra.
Figure 9-19. Bund diagram of LPPP with hole traps and gold electrodes with Va<- vacuum level. Ec conduction band, Eva valence band. E, Fermi level. . baudgup energy. and , " trap depths. ,( ) trap distribution, X electron affmity, and All work function of the gold electrodes. Figure 9-19. Bund diagram of LPPP with hole traps and gold electrodes with Va<- vacuum level. Ec conduction band, Eva valence band. E, Fermi level. . baudgup energy. and , " trap depths. ,( ) trap distribution, X electron affmity, and <J>All work function of the gold electrodes.
A semiconductor can be described as a material with a Fermi energy, which typically is located within the energy gap region at any temperature. If a semiconductor is brought into electrical contact with a metal, either an ohmic or a rectifying Schouky contact is formed at the interface. The nature of the contact is determined by the workfunction, (the energetic difference between the Fermi level and the vacuum level), of the semiconductor relative to the mclal (if interface effects are neglected - see below) 47J. [Pg.469]

The reaction heat is removed by the vacuum evaporation of dilution water. The resulting water vapors allow complete degassing and stripping of any trace of undesired low boiling by products (i.e., 1,4-dioxane for ethoxy sulfates). The product temperature is accurately controlled with the vacuum level kept in the reactor and by the temperature control in the reactor jacket. The automatic control of the different process parameters, i.e., flow rate of reagents, vacuum degree, temperature of thermostatting water, also allows for accurate control of the product concentration. [Pg.695]

Work Function, Fermi Level, Vacuum Level, Galvani and Volta Potentials, Dipole Moments... [Pg.203]

Therefore it is much more useful to use the second way of splitting the energy difference between zero and p, which is common in the area of surface science, i.e. to consider -p as the sum of the work function [Pg.214]

Figure 6.11. Schematic energy diagram of an atom approaching a free electron metal with an sp band. Notice that the vacuum level is the... Figure 6.11. Schematic energy diagram of an atom approaching a free electron metal with an sp band. Notice that the vacuum level is the...
The work function, 0, is defined as the work required to remove an electron infinitely far away from the surface. Typical values are between 2.5 eV and 5.5 eV. The electron is free to travel through space when it has been excited to at least the vacuum level, Evao as illustrated in Fig. 6.14. [Pg.229]

From Fig. 6.14 it becomes clear why one must heat filaments to very high temperatures to see electron emission in electron guns. Only the part of the electron distribution that has obtained energies above 0 can be utilized. The occupation number at the vacuum level can be approximated by e hT leading to the well known Richardson-Dushman formula, which describes the fluxj of electrons evaporating from a surface with work function 0 at temperature T ... [Pg.229]


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