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Surface chemistry silicones

Applications of ISS to polymer analysis can provide some extremely useful and unique information that cannot be obtained by other means. This makes it extremely complementary to use ISS with other techniques, such as XPS and static SIMS. Some particularly important applications include the analysis of oxidation or degradation of polymers, adhesive failures, delaminations, silicone contamination, discolorations, and contamination by both organic or inorganic materials within the very outer layers of a sample. XPS and static SIMS are extremely comple-mentar when used in these studies, although these contaminants often are undetected by XPS and too complex because of interferences in SIMS. The concentration, and especially the thickness, of these thin surfiice layers has been found to have profound affects on adhesion. Besides problems in adhesion, ISS has proven very useful in studies related to printing operations, which are extremely sensitive to surface chemistry in the very outer layers. [Pg.523]

Chemical bronchitis, 25 479 Chemical bulk analysis, of silicon surface chemistry, 22 373... [Pg.166]

Parbhoo, B. O Hare, L.-A. Leadley, S. R. Fundamental Aspects of Adhesion Technology in Silicones. In Surfaces, Chemistry Applications-, Chaudhury, M., Pocius, A. V., Eds. Elsevier Amsterdam, 2002 Chapter 14, pp 677-709. [Pg.693]

The surface chemistry of coesite and stishovite was studied by Stiiber (296). The packing density of hydroxyl groups was estimated from the water vapor adsorption. More adsorption sites per unit surface area were found with silica of higher density. Stishovite is especially interesting since it is not attacked by hydrofluoric acid. Coesite is dissolved slowly. The resistance of stishovite is ascribed to the fact that silicon already has a coordination number of six. Dissolution of silica to HaSiFg by hydrogen fluoride is a nucleophilic attack. It is not possible when the coordination sphere of silicon is filled completely. In contrast, stishovite dissolves with an appreciable rate in water buffered to pH 8.2. The surface chemistry of. stishovite should be similar to that of its analog, rutile. [Pg.247]

The surface chemistry of SAMs of silanes on planar substrates such as oxidized silicon wafers is comparable to the chemistry of silica gel, with the absence of a porous structure [47]. [Pg.376]

Figure 6. Example of ion-assisted gas-surface chemistry in the etching of silicon with Xep2. The Xep2 flow is 2 x 10 moles/sec and the argon energy and current are 450 eV and 2.5 ijlA, respectively. (Reproduced with permission from Ref. 31J... Figure 6. Example of ion-assisted gas-surface chemistry in the etching of silicon with Xep2. The Xep2 flow is 2 x 10 moles/sec and the argon energy and current are 450 eV and 2.5 ijlA, respectively. (Reproduced with permission from Ref. 31J...
See Scanning tunneling spectroscopy Superconductors 332—334 Surface Brillouin zone 92 hexagonal lattice 133 one-dimensional lattice 123, 128 square lattice 129 Surface chemistry 334—338 hydrogen on silicon 336 oxygen on silicon 334 Surface electronic structures 117 Surface energy 96 Surface potential 93 Surface resonance 91 Surface states 91, 98—107 concept 98... [Pg.410]

Fig. 26. Ion-assisted gas-surface chemistry using Ar and XeFj on silicon (Volatile reaction product.). Fig. 26. Ion-assisted gas-surface chemistry using Ar and XeFj on silicon (Volatile reaction product.).
One of the early applications of STM was in understanding surfaces of silicon (e.g. dangling bonds). Many applications of the technique of direct relevance to solid state chemistry have since been described in the literature (Dai Lieber, 1993 Lieber, 1994). We shall illustrate these applications by means of a few figures. In Fig. 2.26 we show the image of a solid solution which clearly delineates the two molecules... [Pg.112]

Several excellent reviews are available concerning both surface structure of semiconductors and surface chemistry of semiconductors, including Refs. [5-23]. Here, a comprehensive review is not attempted and the reader is referred instead to those references. The focus of this chapter is primarily on the surface chemistry of silicon and germanium, as these are the two most heavily studied systems. We strive to provide insight into the chemical reactivity of these two surfaces, and hence... [Pg.324]

Hetero-Diels-Alder products (i.e., Diels-Alder products involving an atom other than carbon) have also been observed for a number of systems at the Si(100)-2 x 1 surface. Some examples include the reaction of unsaturated ketones RC=C—CR=0 (e.g., ethylvinylketone) [255], 2-propenenitrile [256-260], and dicarbonyls 0=C—R—C=0 [261]. For a review specifically of heteroatom chemistry at the silicon surface, the reader is referred to Ref. [262]. Here we use the dicarbonyl example to provide an illustration of this class of surface chemistry. Hamers and coworkers have used the [4 + 2] heteroatom cycloaddition reaction of... [Pg.361]

The existing literature on reactions at germanium surfaces under vacuum conditions is not as extensive as that of silicon. However, germanium surface chemistry is an... [Pg.369]

Quayum, M. E., Kondo, T., Nihonyanagi, S., Miyamoto, D. and Uosaki, K. Formation of organic monolayer on a hydrogen terminated Si(l 11) surface via silicon-carbon bond monitored by ATR FT-IR and SFG spectroscopy Effect of orientational order on the reaction rate. Chemistry Letters, 208 (2002). [Pg.385]


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