Surface analysis techniques technologies

Semiconductor Processing Technologies and the Application of Surface Analysis Techniques... 

Recent developments in surface-characterization methods have been made possible to a great extent by technological advances in areas such as lasers, ultra-high vacuum, charged-particle optics, and computer science. The surface-analysis techniques are commonly used to probe the interface between two phases after one phase is removed, but there is now a growing demand for additional methods for in situ interface characterization. 

Included in the book is the symposium s keynote address by C. B. Duke, followed by several introductory chapters for the scientist or engineer not familiar with surface-analysis techniques. The following chapters offer detailed discussions of a wide range of research and development problems in industry. Each author was asked to identify the relevant problems, to indicate where possible the relative utility of different analytical techniques for these problems, and to identify problem areas where new or improved techniques are required. Thus, the book provides a broad review of significant technological phenomena and of the surface-analysis techniques useful for elucidating important problems. 

Cohalt Silicides. The interest in the study of metal silicides is growing at much faster rate because of their use as interconnects and contacts in semiconductor and VLSI technology. The silicides in general have lower resistivity than polysilicon and are able to withstand high annealing temperatures than most pure metal interconnects. In the development of the metal-silicide studies the most important quantities of interest are metal/Si ratio as a function of depth, the silicide film thickness and the identification and the quantification of any contaminants present. The conventional surface analysis techniques... 

Alternative methods to MS for the analysis of protein phosphorylation would involve immunoaffinity techniques using antibodies specific for phosphorylated residues. Surface plasmon resonance technology has been recently used for the determination of active concentration of phosphotyrosine-containing proteins at picomolar levels.117... 

However, this article is not intended to provide an exhaustive review of the voluminous literature on the application of surface analytical techniques to semiconductor problems. Numerous reviews have been published which have treated various aspects of these applications (1-jj). This article is intended to give an overview, drawing from more recent publications, of the ways in which surface analysis continues to play a vital role in the development and application of the numerous material technologies involved in semiconductor processes. In addition, the need for further development of surface techniques and a summary of the materials problem that do not lend themselves to the available analytical techniques are described. 

In the kinetic studies of the adsorption process, the mass transport of the analyte to the binding sites is an important parameter to account for. Several theoretical descriptions of the chromatographic process are proposed to overcome this difficulty. Many complementary experiments are now needed to ascertain the kinetic measurements. Similar problems are found in the applications of the surface plasmon resonance technology (SPR) for association rate constant measurements. In both techniques the adsorption studies are carried out in a flow system, on surfaces with immobilized ligands. The role of the external diffusion limitations in the analysis of SPR assays has often been mentioned, and the technique is yet considered as giving an estimate of the adsorption rate constant. It is thus important to correlate the SPR data with results obtained from independent experiments, such as those from chromatographic measurements. 

The surface science of metal oxides has come of age over the past decade, stimulated by a variety of technological challenges. Examples include the needs to understand metal-metal oxide interfaces in semiconductor devices, sensors, and catalysts. Consequently, new techniques for surface analysis and modeling have been exploited to probe the complex surface-adsorbate interactions that govern chemical processes on oxide surface. 

The development of new methods for studying surfaces is progressing rapidly, precipitated by the phenomenal growth and interest in surface physics and chemistry which was stimulated, in part, by the need for clean, well-characterized surfaces for microelectronic and other high-technology applications. The biomaterials field should be able to capitalize upon this plethora of new methods which have appeared primarily in the past 15 years. In particular, many of the new techniques measure surface chemistry directly, in contrast to older methods which often required indirect or thermodynamic data. At the present stage of development in the field of surface analysis, a picture of a surface must be built up by using a variety of methods. Combinations of the classic surface analysis methods (e.g., con-... 

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