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Substrate monitoring

Substrates monitored in same assay buffer ATP concentration held constant. [Pg.198]

Strained BaTi03 films were grown by molecular-beam epitaxy on Ti02-terminated (001) SrTi03 substrates, monitoring the growth by reflection high... [Pg.609]

Figure 1. Nucleation and growth processes of an epitaxial diamond film on a negatively biased single crystalline Si(lOO) substrate monitored with (a) Si surface cleaned... Figure 1. Nucleation and growth processes of an epitaxial diamond film on a negatively biased single crystalline Si(lOO) substrate monitored with (a) Si surface cleaned...
Visualize hybrids by the addition of the alkaline phosphatase substrate. Monitor the reaction (often over several hours) until a striking purple reaction product is obtained (see Notes 16 and 17). Care should be taken to prevent the sections drying out Maintain sections well covered with the substrate solution during the developing process in a humid and light-proof chamber. [Pg.165]

The interest in vesicles as models for cell biomembranes has led to much work on the interactions within and between lipid layers. The primary contributions to vesicle stability and curvature include those familiar to us already, the electrostatic interactions between charged head groups (Chapter V) and the van der Waals interaction between layers (Chapter VI). An additional force due to thermal fluctuations in membranes produces a steric repulsion between membranes known as the Helfrich or undulation interaction. This force has been quantified by Sackmann and co-workers using reflection interference contrast microscopy to monitor vesicles weakly adhering to a solid substrate [78]. Membrane fluctuation forces may influence the interactions between proteins embedded in them [79]. Finally, in balance with these forces, bending elasticity helps determine shape transitions [80], interactions between inclusions [81], aggregation of membrane junctions [82], and unbinding of pinched membranes [83]. Specific interactions between membrane embedded receptors add an additional complication to biomembrane behavior. These have been stud-... [Pg.549]

Example Yon can monitor improper torsion angles to determine wh ich side of a substrate m olecn le faces the active site of a protein. Select three atoms on the substrate molecule and a fourth in the active site. These atom s define an improper torsion angle. Save th is selection as a named selection. Then observe a plot of this improper torsion angle (in the Molecular Dynam ics Results dialog... [Pg.87]

An electrode that responds to the concentration of a substrate by reacting the substrate with an immobilized enzyme, producing an ion that can be monitored with an ion-selective electrode. [Pg.484]

The earliest examples of analytical methods based on chemical kinetics, which date from the late nineteenth century, took advantage of the catalytic activity of enzymes. Typically, the enzyme was added to a solution containing a suitable substrate, and the reaction between the two was monitored for a fixed time. The enzyme s activity was determined by measuring the amount of substrate that had reacted. Enzymes also were used in procedures for the quantitative analysis of hydrogen peroxide and carbohydrates. The application of catalytic reactions continued in the first half of the twentieth century, and developments included the use of nonenzymatic catalysts, noncatalytic reactions, and differences in reaction rates when analyzing samples with several analytes. [Pg.623]

Assays using equiUbrium (end point) methods are easy to do but the time requited to reach the end point must be considered. Substrate(s) to be measured reacts with co-enzyme or co-reactant (C) to produce products (P and Q) in an enzyme-catalyzed reaction. The greater the consumption of S, the more accurate the results. The consumption of S depends on the initial concentration of C relative to S and the equiUbrium constant of the reaction. A change in absorbance is usually monitored. Changes in pH and temperature may alter the equiUbrium constant but no serious errors are introduced unless the equihbrium constant is small. In order to complete an assay in a reasonable time, for example several minutes, the amount and therefore the cost of the enzyme and co-factor maybe relatively high. Sophisticated equipment is not requited, however. [Pg.38]

Fig. 4. Examples of emission spectrometry as a diagnostic monitoring tool for plasma processing, (a) The removal of chlorine contamination from copper diode leads using a hydrogen—nitrogen plasma. Emissions are added together from several wavelengths, (b) The etching and eventual removal of a 50-p.m thick polyimide layer from an aluminum substrate, where (x ) and (° ) correspond to wavelengths (519.82 and 561.02 nm, respectively) for molecular CO2... Fig. 4. Examples of emission spectrometry as a diagnostic monitoring tool for plasma processing, (a) The removal of chlorine contamination from copper diode leads using a hydrogen—nitrogen plasma. Emissions are added together from several wavelengths, (b) The etching and eventual removal of a 50-p.m thick polyimide layer from an aluminum substrate, where (x ) and (° ) correspond to wavelengths (519.82 and 561.02 nm, respectively) for molecular CO2...
Fig. 4. Schematic of an ultrahigh vacuum molecular beam epitaxy (MBE) growth chamber, showing the source ovens from which the Group 111—V elements are evaporated the shutters corresponding to the required elements, such as that ia front of Source 1, which control the composition of the grown layer an electron gun which produces a beam for reflection high energy electron diffraction (rheed) and monitors the crystal stmcture of the growing layer and the substrate holder which rotates to provide more uniformity ia the deposited film. After Ref. 14, see text. Fig. 4. Schematic of an ultrahigh vacuum molecular beam epitaxy (MBE) growth chamber, showing the source ovens from which the Group 111—V elements are evaporated the shutters corresponding to the required elements, such as that ia front of Source 1, which control the composition of the grown layer an electron gun which produces a beam for reflection high energy electron diffraction (rheed) and monitors the crystal stmcture of the growing layer and the substrate holder which rotates to provide more uniformity ia the deposited film. After Ref. 14, see text.
The chemical and electronic properties of elements at the interfaces between very thin films and bulk substrates are important in several technological areas, particularly microelectronics, sensors, catalysis, metal protection, and solar cells. To study conditions at an interface, depth profiling by ion bombardment is inadvisable, because both composition and chemical state can be altered by interaction with energetic positive ions. The normal procedure is, therefore, to start with a clean or other well-characterized substrate and deposit the thin film on to it slowly at a chosen temperature while XPS is used to monitor the composition and chemical state by recording selected characteristic spectra. The procedure continues until no further spectral changes occur, as a function of film thickness, of time elapsed since deposition, or of changes in substrate temperature. [Pg.30]


See other pages where Substrate monitoring is mentioned: [Pg.403]    [Pg.4730]    [Pg.151]    [Pg.316]    [Pg.4393]    [Pg.318]    [Pg.759]    [Pg.189]    [Pg.403]    [Pg.4730]    [Pg.151]    [Pg.316]    [Pg.4393]    [Pg.318]    [Pg.759]    [Pg.189]    [Pg.486]    [Pg.1686]    [Pg.1708]    [Pg.1878]    [Pg.772]    [Pg.779]    [Pg.204]    [Pg.399]    [Pg.38]    [Pg.314]    [Pg.425]    [Pg.112]    [Pg.211]    [Pg.42]    [Pg.321]    [Pg.465]    [Pg.516]    [Pg.108]    [Pg.302]    [Pg.256]    [Pg.243]    [Pg.265]    [Pg.328]    [Pg.350]    [Pg.505]    [Pg.266]    [Pg.865]    [Pg.441]    [Pg.641]   
See also in sourсe #XX -- [ Pg.190 , Pg.267 ]




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Monitoring substrate binding

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