Software process monitoring

Periodic fault detection is readily done by analysts without extensive software support. Process monitoring such as the examination of the traces discussed above are one exam e. However, the number of measurements in a single set have such complex interactions that it is... 

EMOS is a combined hardware and software system that gathers chemical and electrical parameters in real-time and processes them so that close process monitoring is maintained along with information that will lead to process optimisation (see Fig. 8.1). EMOS is composed of three main components ... 

As with other spectroscopic techniques, UV-vis spectroscopy can readily be used in lab-based R D. The implementation as process monitors, scanning for deviations from the set state, is certainly an added value and low in maintenance requirements. UV-vis based process control is more demanding on precision, reliability, exactness and operability. The steady progress both in hardware and software is facilitating the growth of UV-vis process analytics in both the pharmaceutical and chemical industries. Given the vast increase in information and knowledge-based control, this may just be what the industries need. 

Wetzel, D. L., Levin, J. A. and Posner, E. S. "On-Line Process Monitoring Hardware Software and Economics". Proc. of the Eighth International Symposium on Near Infrared Reflectance Analysis, Technicon Industrial Systems,... 

The technique is easy and fast to use, involving only cell harvesting, washing and drying of the biomass on an IR-transparent carrier as sample preparation, before the spectra are recorded and evaluated. An instrument dedicated for organism identification is available and has been used for the cited process monitoring experiments with complete spectrometer hardware and software, model IFS 28/B from Bruker (Milton, ON, Canada or Bruker Optik, Karlsruhe, Germany). The whole procedure takes less than an hour. 

The next major advancements in MOCVD control system technology are likely to be in the area of feedback control. First and foremost is the incorporation of real time in-situ process monitors that directly provide feedback into the ongoing deposition process. Second, the development of software which converts a user defined structure to the run parameters for each layer of the structure however, this development appears to be several years away. 

The key point to successful synthesis under microwave irradiation is the use of equipment specially designed for chemical laboratories. Monomodal microwave equipment has overcome the uncertainties associated with the use of domestic microwave ovens. These reactors offer much more precise tanperature and pressure control, and the software provides simplified process monitoring, which results in accurate, reproducible reaction conditions. The energy transfer in a microwave-assisted reaction is rapid, the decomposition of the substances can be avoided, and high yields can be obtained in short reaction times by proper programming of the temperature. When the desired temperatme is reached, the power is automatically reduced and maintained by the software during the reaction period. 

MC600 series Family of modular units for remote detection and process monitoring applications featuring uncooled 320(H) X 240(V) element micro-bolometric FPA detectors, 8-14 pm, extensive diagnostic software, and field-interchangeable lenses. 

Ircon Stinger and Maxline2 series Uncooled pyroelectric 320(H) x 240(V) element FPA, spectral range 5, 8, or 8-14 pm, extensive diagnostic software, for multiple process monitoring and machine vision applications. 

One potential disadvantage of refractively scanned interferometers is the effect of dispersion on the wavenumber accuracy. However, the variation of n with wave-number is known and this effect can be compensated accurately by the appropriate software. This disadvantage is more than offset by the fact that the stationary cube corners in each arm of the interferometer give it a remarkable immunity from the effects of tilt and shear. As a result, this interferometer is often used for process monitoring by FT-IR spectrometry. This interferometer has been installed as the key component of process monitors in well over 100 plants. 

The textbook material has evolved at the University of California, Santa Barbara, and the University of Texas at Austin over the past 40 years. The first edition (SEMI) was published in 1989, adopted by over 80 universities worldwide, and translated into Korean and Japanese. In the second edition (SEM2,2004), we added new chapters on the important topics of process monitoring (Chapter 21), batch process control (Chapter 22), and plantwide control (Chapters 23 and 24). Even with the new chapters, the length of the second edition was about the same as SEMI. Interactive computer software based on MATLAB and Simulink software was extensively used in examples and exercises. The second edition was translated into Chinese in 2004. 

System Level Software Segment - Spacecraft software that monitors and controls processes. 

---