Silicon hydrogen chloride

Trichlorosilane can also be synthesised by using contact mass (3-6% of copper) instead of silicon hydrogen chloride can be substituted by a mixture of hydrogen chloride with hydrogen. In this case there is a condensate which consists of 94.5% of trichlorosilane and 5.5% of silicon tetrachloride. 

Chloromethane can be produced by either chlorination of methane or reaction of methanol with hydrogen chloride. In an integrated production of silicones hydrogen chloride obtained by hydrolysis of methylchlorosilanes is recycled to the Direct Process via a chloromethane synthesis. The losses are compensated by make-up chloromethane or hydrogenchloride. Impurities, tike water, methanol, dimethyl ether or oxygen, must be kept at as low a level as possible. 

Moissanite, see Silicon carbide Molybdenite, see Molybdenum disulfide Molybdite, see Molybdenum(VI) oxide Molysite, see Iron(III) chloride Montroydite, see Mercury(II) oxide Morenosite, see Nickel sulfate 7-water Mosaic gold, see Tin disulfide Muriatic acid, see Hydrogen chloride, aqueous solutions... 

Halogens, halides. Hydrogen fluoride, hydrogen chloride, chlorine, fluorine, silicon tetrafluoride... 

The trichlorosilane may be obtained by reacting hydrogen chloride with silicon in yields of 70% and thus is obtainable at moderate cost. As the olefins are also low-cost materials this method provides a relatively cheap route to the intermediates. It is, of course, not possible to produce chloromethylsilanes by this method. 

When this reaction has occuiTcd accidentally sufficient hydrogen chloride has been liberated to explosively burst the vessel. The purest form of hydrogen chloride is made by the action of water on silicon tetrachloride ... 

After succeeding in the direct synthesis of allyidichlorosilane hy reacting elemental silicon with a mixture of allyl chloride and hydrogen chloride in 1993," Jung el cil. reinvestigated the Friedel-Crafts reactions of benzene derivatives with allyidichlorosilanes in detail (Eq. (2)). 

Mixing trichlorosilane, acetonitrile and diphenylsulphoxide, carried out at 10°C, detonated. This accident was put down to the exothermic addition reaction of the silicon-hydrogen bond on the carbon-nitrogen triple bond of nitrile. Other interpretations are possible for instance, the effect of traces of hydrogen chloride formed by the hydrolysis of chlorosilane on acetonitrile. 

Combustion products can affect sensitive electronic equipment. For example, hydrogen chloride (HCI) is formed by the combustion of PVC cables. Corrosion due to combusted PVC cable can be a substantial problem. This may result in increased contact resistance of electronic components. Condensed acids may result in the formation of electrolytic cells on surfaces. Certain wire and cable insulation, particularly silicone rubber, can be degraded on exposure to HCI. A methodology for classifying contamination levels and ease of restoration is presented in the SFPE Handbook... 

Boron trichloride can be prepared by high temperature chlorination of boron trioxide, boric acid, metal borates or other boron compounds. Chlorine, hydrogen chloride, phosgene, silicon tetrachloride, metal chlorides, carbon... 

Silicon combines with halogens at elevated temperatures forming silicon tetrahalides. With chlorine, reaction occurs at 450°C forming silicon tetrachloride, SiCh. The tetrahalides also are obtained when sdicon is heated with anhydrous hydrogen chloride, bromide and iodide ... 

Also, the compound may be prepared by heating silicon with chlorine or dry hydrogen chloride ... 

An example of the first kind can be found in the decomposition of trichloromethyl-silane to give silicon carbide and hydrogen chloride ... 

In the second step, trichlorosilane is formed by the reaction of the silicon with anhydrous hydrogen chloride, HCl. The reaction of the sohd silicon and gaseous HCl occurs at 300°C in the presence of a catalyst. This step is important to purification, since chlorides of the aluminum and boron impurities also are formed. The resulting... 

Vanadium Subsilicide, V2Si, is obtained by fusing a mixture of vanadium trioxide, V2Os, and silicon, with the addition of either a large excess of vanadium or carbon or copper. The carbide or copper alloy produced is decomposed at the temperature employed.11 The silicide forms metallic prisms, of density 5-48 at 17° C., the m.pt. of which is higher than in the ease of the disilicide. It is attacked by the halogens, hydrogen chloride gas, and fused sodium or copper, but hydrochloric acid, nitric acid and sulphuric acid are without action. 

Vanadium Disilicide, VSia, is prepared by reducing a mixture of vanadium trioxide and silicon with magnesium vanadium pentoxide can also be employed with the addition of fluorspar to the mixture.12 Gin used a mixture of the pentoxide, silica, and coke.18 Vanadium disilicide is a very stable compound it forms metallic prisms which melt at 1655° C., have a specific gravity of 4-42, and are hard enough to scratch glass. It is attacked by hydrofluoric acid, hydrogen chloride gas, and fused alkalis. 

Silicon nitride powder can be made by the reaction of silicon tetrachloride vapor with gaseous ammonia. The by-product is gaseous hydrogen chloride. Write a balanced equation for the reaction. 

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