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Silanes substrate

Silane Substrate Cleaning technique Bond strength (Mpa) Area detached (%)... [Pg.407]

The results with the vinyl silane substrate were more consistent with an oxidation that led to a radical at the terminal end, especially if the initial cyclization was viewed as being reversible (Scheme 46). In this way, when R in... [Pg.80]

As already briefly mentioned, the oxygen-atom insertion into Si—H bonds of silanes constitutes a selective method for the chemoselective preparation of silanols, which has been much less studied compared to the CH oxidation. This unique oxyfunctionalization of silanes is also highly stereoselective (equation 35) since, like the CH insertions, it proceeds with complete retention of configuration. A novel application of the SiH insertion process is the synthesis of the unusual iron complex with a silanediol functionality, in which selectively both Si—H bonds of the silicon atom proximate to the iron ligand are oxidized in the silane substrate (equation 36). ... [Pg.1163]

Abstract—This study extends previous work on silanized kaolin clays to other substrates, such as aluminum hydroxide. It will also show that high precision quantitative Fourier Transform Infrared Spectroscopy (FT-IR) diffuse reflectance measurements can be performed on this vinyl silanized substrate and predict that other silanized finely divided powders can be analyzed using these techniques. [Pg.289]

Hanning [4], Miller and Ishida [5], and McKenzie and Koenig [6] favored transmission measurements using FT-IR for monitoring silanized mica quantitatively. Berger and Desmond [3] demonstrated the ability of FT-IR diffuse reflectance measurements to quantitate various silanized substrates including mercapto silane on hydrous clay and epoxy silane on alumina trihydrate. Later Vagberg el at. [Pg.289]

The silane substrate would then displace H2 to give back the starting silane complex for further alcoholysis, and this was determined to be the rate-limiting step. These are all known reactions, and this mechanism and rate-determining step were recently supported by theoretical calculations that showed the heterolysis to be a highly concerted process, i.e., transformation of the a-silane complex to the H2 complex could even take place in a single step, thus circumventing the transient hydride complex (124). It is noteworthy that the mechanism of this reaction involves two different a complexes M(r 2 -Si-H) and M(r 2 -H2). [Pg.167]

Silane Substrates Si -NMR of silanes Conditions Product (Yield %) Si-NMR of products... [Pg.17]

The use of silyl ethers also provided a good glimpse into the steric effects of the C-H insertion [98], Relative rates were obtained for insertion a to the oxygen atom in silyl protected n-butanol. It was found that the reaction rate increased dramatically as the size of the silyl protecting group decreased, with a 100-fold rate difference between TBDPS and TMS. Complementary steric and electronic effects were observed with the tetralkoxy silane substrates [97,98], hi competition experiments, it was found that the carbenoid derived from diazo ester 99 reacted solely with tetraethoxy silane 123 to form product 126, and not the corresponding tetramethoxy or tetraisopropoxy derivatives 124 or 125 (Scheme 28). Thus, the secondary C-H bonds appear to possess the right balance between steric and electronic requirements for the insertion. [Pg.327]

Alkenylsilane acylation has been employed for the synthesis of two furano monoterpenes, dehydroel-sholzione (1) and isoegomaketone (2 Scheme 5). Acylation of isobutene with 3-methyl-2-furoyl chloride gave dehydroelsholzione in poor yield with a variety of Lewis acid catalysts (SnCU, AlCb, TiCU), but using the equivalent silane substrate, the ketone was obtained in 55% overall yield. Probably as a result of work-up conditions, the initial reaction gave a mixture of three products, the conjugated and deconjugated ketones, together with the chloro ketone addition product. Isomerization and dehydrochlorination were effected with a tertiary amine base to maximize the yield of the desired product. [Pg.713]

To explore the enzymatic dioxygenation of aryl silane substrates, a small library of 26 silanes representing several structural classes was obtained from commercial sources. Compounds were selected based upon our desire to produce products that could be further elaborated to polymers, or that would contain chiral silicon atoms. Examples included silanes bearing alkoxy, vinyl and hydrido substituents, in addition to a number of diphenylsilanes. Several whole cell biocatalysts were selected for the study, summarized in Table 1. [Pg.437]

Self-assembly of quaterthiophene diphosphonic acid in alternating layers with tetravalent zirconium on phosphorylated (silane) substrates leading to densely packed films at temperatures of 353 K is reported by Katz et al. [102]. These molecules were also used to self-assemblc onto Zr-phosphonate LB-films which act as template layers. In comparison with the films assembled on the phosphorylated silane surface, these layers do not need heating to give highly ordered films [103,104]. [Pg.697]

The cleaned and silanized substrates were selectively patterned by photolithography using an electrically insulating photoresist [49]. A thin SU-8 2000.5 photoresist layer was spun at 6,000 rpm, soft-baked, exposed using a MJB4 mask aligner (60-80 mJcm ), post-baked, and developed in PGMEA for 30 s [49]. The applied soft and post-bake procedure was as follows 1 min at 65 °C, 1 min at 92 °C, and 1 min at 65 °C. [Pg.59]

Some of these redistributions may be initiated either by homolysis or catalytic activation or even by conventional acidic or basic catalysts, but a number of them proceed more readily in the presence of olefins. These reactions are fast and yield a large number of products that also contain adducts formed during the preliminary redistribution of the silane substrate(s) prior to their hydrosilylation. Redistributions of silicon compovmds catalyzed by transition metals occur when at least one Si—H bond is present in the molecule, since the Si—H bond is the most labile of those undergoing oxidative addition to yield a silyl metal hydride. [Pg.1262]

Tilley and co-workers (86) proposed a new mechanism (called the Glaser-Tilley mechanism), which involves activation of two (sp ) Si—H bonds of the silane substrate, direct addition of (sp ) Si—H to alkene and finally the 1,2-H-migration and reductive elimination step (Scheme 12). Theoretical study by Beddie and Hall (87) showed that the highest energy transition state in this novel mechanism is more than 8 kcal/mol lower in energy than the highest energy transition states in the Chalk-Harrod and modified Chalk-Harrod mechanisms. [Pg.1272]

Silanized substrates (OTS). This type itself splits into two subtypes depending on the compactness of the coating ... [Pg.26]

Since the Me-O-Si bonds are relatively stable, and because the Si-O-Si bonds are highly hydrophobic, the interphase polymer-silane-substrate has become highly resistant to moisture, or in other words, to corrosive attack. The functional group X can be selected from a wide range of available molecules, so that it interacts with functional groups in the polymer. In this way, an extremely stable interface can be obtained that is completely covalently bonded and resistant to water. Such silane technology has been very successful... [Pg.185]

Acetals can be effectively utilized as electrophiles for enol silane substrates under Lewis acidic conditions. As demonstrated by Williams and coworkers, the diastereoselective ZnC -catalyzed Mukaiyama aldol process between enol silane 45 and acetal 44 occurred to produce 46. Thus, the E-unsaturated ketone of the marine macrolide leucascandrolide A was directly installed with a high level of diastereoselectivity resulting from axial addition to the resulting 6-membered oxocarbenium ion. Similar results were... [Pg.510]

The first trap is charged with tetra(p-tolylsilyl)methane (31.0 g, 63 mmol) under nitrogen and cooled to -196°C (liquid nitrogen). Dry hydrogen bromide (230 g, excess) is condensed onto the silane substrate and the trap slowly warmed to —78°C (dry ice slurry). The mixture is stirred for 20 h at this temperature. The second trap is connected at the gas outlet and also cooled to -78°C. The first trap is then allowed to warm to room temperature to evaporate all HBr and condense and recover it in the second trap. The liquid residue in the first trap is an equimolar mixture of tetra(bromosilyl) methane and toluene, both in quantitative yield based on (p-TolSiH2)4C (NMR). It is not necessary for the Step 5 to separate the toluene from (BrSiH2)4C. [Pg.18]


See other pages where Silanes substrate is mentioned: [Pg.440]    [Pg.16]    [Pg.72]    [Pg.28]    [Pg.29]    [Pg.2525]    [Pg.388]    [Pg.389]    [Pg.521]    [Pg.520]    [Pg.620]    [Pg.388]    [Pg.389]    [Pg.437]    [Pg.438]    [Pg.440]    [Pg.443]    [Pg.443]    [Pg.455]    [Pg.689]    [Pg.74]    [Pg.207]    [Pg.186]    [Pg.2525]    [Pg.90]    [Pg.155]    [Pg.713]   
See also in sourсe #XX -- [ Pg.558 ]




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Silicon substrates, surface functionalization silanization

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