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Sensitivity curve

The sensitivity curves are plots of maximum achieved sensitivity as a function of thickness of the object for a given focal spot size and source to detector distance. The best attainable sensitivity in image intensifier systems is a function of tube voltage, current, scattered radiation and the screen gamma. As a first step, stainless steel plates with thicknesses ranging from 5 mm-30 mm in steps of 5 mm were chosen. These plates had a length of 950 mm and width of 280 mm. The plate is positioned very close and at the center to the LI. tube. The extraneous... [Pg.444]

It can be observed from the Figure 1 that the sensitivity of I.I. system is quite low at lower thicknesses and improves as the thicknesses increase. Further the sensitivity is low in case of as observed images compared to processed images. This can be attributed to the quantum fluctuations in the number of photons received and also to the electronic and screen noise. Integration of the images reduces this noise by a factor of N where N is the number of frames. Another observation of interest from the experiment was that if the orientation of the wires was horizontal there was a decrease in the observed sensitivity. It can be observed from the contrast response curves that the response for defect detection is better in magnified modes compared to normal mode of the II tube. Further, it can be observed that the vertical resolution is better compared to horizontal which is in line with prediction by the sensitivity curves. [Pg.446]

Fowler R FI 1931 The analysis of photoelectric sensitivity curves for clean metals and various temperatures Phys. Rev. 38 45-56... [Pg.1898]

Fig. 2. Spectral sensitivity curves for dyed silver halide plates and films. A, uv-blue B, green C, red D and E, infrared. Fig. 2. Spectral sensitivity curves for dyed silver halide plates and films. A, uv-blue B, green C, red D and E, infrared.
Shock Sensitivity Curves for Waxed and Unwaxed Ammonium Perchlorate... [Pg.15]

Fig 21 Shock sensitivity curves for waxed and unwaxed ammonium perchlorate and for TNT. Vertical lines at top of graph mark lowest percentage of TMD at which a sub-detonation reaction was observed (Ref 69a)... [Pg.929]

Figure 3. Virgo sensitivity curve with contribution from all identified noise sources... Figure 3. Virgo sensitivity curve with contribution from all identified noise sources...
Plot analogous critical values for the mean/SD before resp. after elimination of points (dotted lines). Since the standard deviation will decrease on elimination of suspected outliers, the dotted sensitivity curve for after elimination will be higher than the one for before . Huber s k changes, too, but to a lesser degree. (See Fig. 1.1.)... [Pg.373]

Figure 7. Experimentally determined sensitivity curves for IGI and reference PCS fibres. Figure 7. Experimentally determined sensitivity curves for IGI and reference PCS fibres.
See also Safety entries Chemical sensitization curves, 19 191 Chemical sensitization... [Pg.170]

Figure 13. Sensitivity curve of P-3. Exposure, KrF excimer laser development, TMAH aqueous solution. Figure 13. Sensitivity curve of P-3. Exposure, KrF excimer laser development, TMAH aqueous solution.
Figure 17 shows the sensitivity curves of the resist containing PM-5(run-6)(75 weight%) and 5-naphthoquinone diazide sulfonate of 2,3,4-trihydroxybenzophenone(25 weight%). The average esterification ratio of the photoactive compound was 2.5 units per three OHs in the benzophenone. The y value was 1.6 and the sensitivity was 90mJ/cm2 when developed with 0.34% TMAH aqueous solution for 120 sec at 20°C. The resist containing M-5(run 3)... [Pg.153]

Figure 17. Sensitivity curve of resist containing polymer(I) and sensitizer. Exposure, CA800 (xenon lamp) development, 0.34% TMAH aqueous solution, 20 C, 120 s. Figure 17. Sensitivity curve of resist containing polymer(I) and sensitizer. Exposure, CA800 (xenon lamp) development, 0.34% TMAH aqueous solution, 20 C, 120 s.
Figure 3 shows the sensitivity curves for SPP (solid lines) compared with that of a novolac-based resist (dashed line). From these curves, we obtained the maximum clearing dose (Dq), the dose for 50% thickness remaining (D50), and lithographic contrast (7-value). These resist characteristics are summarized in Table I. [Pg.177]

Figure 3. Sensitivity curves of SPP image reversal (solid line) after 20kV EB exposure compared with a novolac-based resist (dashed line). A 0.3 //m thick resist layer was exposed to EB followed by a flood exposure using near UV radiation and then dip-developed in an aqueous THAH solution for 60 s at 25°C. TMAH concentration A 0.65 wt%, B 0.70 wt%, C 0.80 wt%, D 1.2 wt%. Figure 3. Sensitivity curves of SPP image reversal (solid line) after 20kV EB exposure compared with a novolac-based resist (dashed line). A 0.3 //m thick resist layer was exposed to EB followed by a flood exposure using near UV radiation and then dip-developed in an aqueous THAH solution for 60 s at 25°C. TMAH concentration A 0.65 wt%, B 0.70 wt%, C 0.80 wt%, D 1.2 wt%.
Figure 5. Sensitivity curve of SPP Image reversal to X-rays compared with that of FBM-G. A 0.4 /ui thick SPP layer was exposed to X-rays both In air and In vacuum followed by a flood exposure and then dip-developed In a 0.8 wt% TMAH solution for... Figure 5. Sensitivity curve of SPP Image reversal to X-rays compared with that of FBM-G. A 0.4 /ui thick SPP layer was exposed to X-rays both In air and In vacuum followed by a flood exposure and then dip-developed In a 0.8 wt% TMAH solution for...
Figure 7. Deep UV sensitivity curves of SPP positive node (A) compared with that of SPP negative mode (B). In positive mode, a 0.4 izm thick SPP layer was exposed to deep UV and then dip-developed in a 1.6 wt% TMAH solution for 60 s at 25 °C. In negative mode, SPP was exposed to deep UV followed by a flood exposure using near UV radiation and then dip-developed in a 0.7 wt% TMAH solution for 60 s at 25 C. Figure 7. Deep UV sensitivity curves of SPP positive node (A) compared with that of SPP negative mode (B). In positive mode, a 0.4 izm thick SPP layer was exposed to deep UV and then dip-developed in a 1.6 wt% TMAH solution for 60 s at 25 °C. In negative mode, SPP was exposed to deep UV followed by a flood exposure using near UV radiation and then dip-developed in a 0.7 wt% TMAH solution for 60 s at 25 C.
Figure 10. Sensitivity curves for 1.2 pm thick polv(styrene) films exposed at 193 nm at fluences of 1 and 6 mJ/cnr/pulse and developed by O2 R1E. Figure 10. Sensitivity curves for 1.2 pm thick polv(styrene) films exposed at 193 nm at fluences of 1 and 6 mJ/cnr/pulse and developed by O2 R1E.
Figure 12. Sensitivity curve for 0.8 im thick chlorinated poly(styrene) resist exposed at 248 nm and developed for 21 mins, by O2 RIE. Figure 12. Sensitivity curve for 0.8 im thick chlorinated poly(styrene) resist exposed at 248 nm and developed for 21 mins, by O2 RIE.
Figure 2. A typical sensitivity curve for a negative resist showing the relationship between the gel dose (D ), the sensitivity (Q), and the contrast (7). Figure 2. A typical sensitivity curve for a negative resist showing the relationship between the gel dose (D ), the sensitivity (Q), and the contrast (7).
Figure 12.21. Photocathode spectral sensitivity curves in imlliampcres of cathode current per watt ofradiam power falling on the photocathode, q is the photocathode quantum efficiency, i.e, the probability of photoelectron emission (Adapted from Ref 76.)... Figure 12.21. Photocathode spectral sensitivity curves in imlliampcres of cathode current per watt ofradiam power falling on the photocathode, q is the photocathode quantum efficiency, i.e, the probability of photoelectron emission (Adapted from Ref 76.)...
Figure 4. Typical response or sensitivity curve for a negative electron resist. The value of Dg is obtained from Figure 3 and usually occurs at 0.5 - 0.7 normalized thickness. Figure 4. Typical response or sensitivity curve for a negative electron resist. The value of Dg is obtained from Figure 3 and usually occurs at 0.5 - 0.7 normalized thickness.

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See also in sourсe #XX -- [ Pg.332 , Pg.333 ]

See also in sourсe #XX -- [ Pg.17 , Pg.35 , Pg.37 ]




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Characteristic curve Chemical sensitization

Conductivity sensitivity characteristic curve

Deep-UV sensitivity curves

Eye sensitivity curve

Negative electron resist sensitivity curve

Poly sensitivity curves

Position sensitive detector curved

Positive electron resist sensitivity curve

Sensitivity curve flame

Sensitivity curve for

Sensitivity curve, positive

Sensitivity thinning curves

Typical sensitivity curve

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