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Sensitivity curve, positive electron resist

Figure 5. Typical sensitivity or response curve for a positive electron resist. Positive resist response may also be plotted using other conventions (see... Figure 5. Typical sensitivity or response curve for a positive electron resist. Positive resist response may also be plotted using other conventions (see...
A variety of techniques have been used in the present work to establish the relative sensitivity of positive electron-beam resists made from copolymers of maleic anhydride (Table I). The term sensitivity is used rather loosely at times. In the most practical sense, sensitivity is a comparative measure of the speed with which an exposure can be made. Thus, the exposure conditions, film thickness, developing solvent and temperature may be involved. Most often, the contrast curve is invoked as a more-or-less objective measure of sensitivity. The dose needed to allow removal of exposed film without removing more than about 70% of the unexposed film can be a measure of sensitivity. The initial film thickness and the developing conditions still must be specified so that this measure is not, strictly speaking, an intrinsic property of the polymeric material. [Pg.324]


See other pages where Sensitivity curve, positive electron resist is mentioned: [Pg.99]    [Pg.9]    [Pg.185]    [Pg.276]    [Pg.645]    [Pg.750]    [Pg.365]    [Pg.361]    [Pg.748]    [Pg.657]    [Pg.222]    [Pg.226]   
See also in sourсe #XX -- [ Pg.170 ]




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