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Sensitivity curve for

Fowler R FI 1931 The analysis of photoelectric sensitivity curves for clean metals and various temperatures Phys. Rev. 38 45-56... [Pg.1898]

Fig. 2. Spectral sensitivity curves for dyed silver halide plates and films. A, uv-blue B, green C, red D and E, infrared. Fig. 2. Spectral sensitivity curves for dyed silver halide plates and films. A, uv-blue B, green C, red D and E, infrared.
Shock Sensitivity Curves for Waxed and Unwaxed Ammonium Perchlorate... [Pg.15]

Fig 21 Shock sensitivity curves for waxed and unwaxed ammonium perchlorate and for TNT. Vertical lines at top of graph mark lowest percentage of TMD at which a sub-detonation reaction was observed (Ref 69a)... [Pg.929]

Plot analogous critical values for the mean/SD before resp. after elimination of points (dotted lines). Since the standard deviation will decrease on elimination of suspected outliers, the dotted sensitivity curve for after elimination will be higher than the one for before . Huber s k changes, too, but to a lesser degree. (See Fig. 1.1.)... [Pg.373]

Figure 7. Experimentally determined sensitivity curves for IGI and reference PCS fibres. Figure 7. Experimentally determined sensitivity curves for IGI and reference PCS fibres.
Figure 3 shows the sensitivity curves for SPP (solid lines) compared with that of a novolac-based resist (dashed line). From these curves, we obtained the maximum clearing dose (Dq), the dose for 50% thickness remaining (D50), and lithographic contrast (7-value). These resist characteristics are summarized in Table I. [Pg.177]

Figure 10. Sensitivity curves for 1.2 pm thick polv(styrene) films exposed at 193 nm at fluences of 1 and 6 mJ/cnr/pulse and developed by O2 R1E. Figure 10. Sensitivity curves for 1.2 pm thick polv(styrene) films exposed at 193 nm at fluences of 1 and 6 mJ/cnr/pulse and developed by O2 R1E.
Figure 12. Sensitivity curve for 0.8 im thick chlorinated poly(styrene) resist exposed at 248 nm and developed for 21 mins, by O2 RIE. Figure 12. Sensitivity curve for 0.8 im thick chlorinated poly(styrene) resist exposed at 248 nm and developed for 21 mins, by O2 RIE.
Figure 2. A typical sensitivity curve for a negative resist showing the relationship between the gel dose (D ), the sensitivity (Q), and the contrast (7). Figure 2. A typical sensitivity curve for a negative resist showing the relationship between the gel dose (D ), the sensitivity (Q), and the contrast (7).
Figure 4. Typical response or sensitivity curve for a negative electron resist. The value of Dg is obtained from Figure 3 and usually occurs at 0.5 - 0.7 normalized thickness. Figure 4. Typical response or sensitivity curve for a negative electron resist. The value of Dg is obtained from Figure 3 and usually occurs at 0.5 - 0.7 normalized thickness.
Figure 1. Sensitivity curve for a perfectly alternating copolymer of maleic anhydride with a-methylstyrene. A 50 keV beam was used. Figure 1. Sensitivity curve for a perfectly alternating copolymer of maleic anhydride with a-methylstyrene. A 50 keV beam was used.
Figure 3. Sensitivity curve for the perfectly alternating copolymer of the methyl half-ester of maleic acid with a-methylstyrene. Figure 3. Sensitivity curve for the perfectly alternating copolymer of the methyl half-ester of maleic acid with a-methylstyrene.
Fig 5. Spectral sensitivity curves for quartz prism monochromator, (a) With EMI 6256 photomultiplier tube (6) with EMI 9558 Q photomultiplier tube. [Pg.317]

Fig. 6. Spectral sensitivity curve for grating monochromator with 9558 Q... Fig. 6. Spectral sensitivity curve for grating monochromator with 9558 Q...
Plotted in Figure 7 are the sensitivity curves for brominated polymers exposed to deep-UV radiation. The samples were prepared by spin coating polished Si wafers with a 2% solution of the polymer in chlorobenzene. [Pg.671]

Figure 7. Sensitivity curves for brominated samples of poly(TMSP) film thickness, —300 nm 260 nm. Sample designations are explained in the caption... Figure 7. Sensitivity curves for brominated samples of poly(TMSP) film thickness, —300 nm 260 nm. Sample designations are explained in the caption...
A lithographic sensitivity curve for PVTMSK is shown in Figure 6. The sensitivities for both deep-UV and mid-UV exposures were similar, although the deep-UV source emitted only —5% of its radiation at 365 nm. The range marked by an arrow denotes the radiation dose for which the partially developed film had a very rough texture. [Pg.701]

Figure 6. Lithographic sensitivity curve for PVTMSK exposed to deep-UV radiation. The pattern was spray developed for 10 s with 2-propanol at... Figure 6. Lithographic sensitivity curve for PVTMSK exposed to deep-UV radiation. The pattern was spray developed for 10 s with 2-propanol at...
Figure 2 shows the effect of wood cost and plant capacity on electricity cost. As plant sizes increase from 25 to 150 MW, electricity costs fall by 10 to 20 percent, reflecting some economies of scale. Kohan and Barkhordar(1) present analogous sensitivity curves for other products evaluated in this study. [Pg.41]

Fig. 7.54 Time-temperature-sensitization curves for susceptibility to intergranular corrosion. Parameters are carbon concentrations in type 304-based stainless steels. Redrawn from Ref 83... Fig. 7.54 Time-temperature-sensitization curves for susceptibility to intergranular corrosion. Parameters are carbon concentrations in type 304-based stainless steels. Redrawn from Ref 83...
Fig. 7.56 Time-temperature-sensitization curves for intergranular corrosion of type 347 stainless steel in boiling 65% nitric acid, mpy, mils per year. Source Ref 85... Fig. 7.56 Time-temperature-sensitization curves for intergranular corrosion of type 347 stainless steel in boiling 65% nitric acid, mpy, mils per year. Source Ref 85...
Figure 11.25 PEB sensitivity curves for different acrylate and alicyclic/acrylate hybrid resist polymer platforms used in ArF lithography. The target CD was 120 nm L/S at 1 2 duty cycle. [Reproduced from R. Dammel, "Practical photoresist processing, SPIE Short Course No. SC616 (2005).]... Figure 11.25 PEB sensitivity curves for different acrylate and alicyclic/acrylate hybrid resist polymer platforms used in ArF lithography. The target CD was 120 nm L/S at 1 2 duty cycle. [Reproduced from R. Dammel, "Practical photoresist processing, SPIE Short Course No. SC616 (2005).]...
Since more than one feedstock is involved, development of a sensitivity curve for optimum profits vs. feedstock cost requires use of a weight-averaged feedstock cost. The weight-averaged feedstock cost is defined as ... [Pg.493]

Figure 25 Photomultiplier sensitivity curves for some cathode materials... Figure 25 Photomultiplier sensitivity curves for some cathode materials...
Fig. 13 Time-temperature-sensitization curve for AI-3.8 to 4.9% Cu-1.2 to 1.8% Mg alloy (AA 2024-T3) illustrating regions of pitting and ICC corrosion in terms of isothermal heat-treatment time and temperature. (Ref [43], reprinted with permission from ASM International.)... Fig. 13 Time-temperature-sensitization curve for AI-3.8 to 4.9% Cu-1.2 to 1.8% Mg alloy (AA 2024-T3) illustrating regions of pitting and ICC corrosion in terms of isothermal heat-treatment time and temperature. (Ref [43], reprinted with permission from ASM International.)...

See other pages where Sensitivity curve for is mentioned: [Pg.127]    [Pg.135]    [Pg.308]    [Pg.199]    [Pg.80]    [Pg.206]    [Pg.335]    [Pg.382]    [Pg.261]    [Pg.69]    [Pg.185]    [Pg.13]   
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