SCALPEL mask

As mentioned above, the SCALPEL mask is uniformly illuminated hy a parallel beam of 100-keV electrons. In the SCALPEL exposure tool, a reduction-projection optic in a telecentric doublet arrangement produces a 4 1 demagnified image of the mask at the wafer plane. Given that the features to be printed are much larger than the wavelength of the electrons (X. 3.7 pm) used, the full benefits of the... 

Another challenge faced by SCALPEL technology is related to the fact that the SCALPEL mask is not protected by pellicles, making particulate and airborne molecular contamination a major issue. In particular, many components of the SCALPEL tool are sensitive to the presence of charged particulates these include electrostatic chucks, electrostatic optics, and apertures. The fact that the SCALPEL tool is designed to operate in a vacuum environment (10 torr) has been reasonably effective in limiting the amount of particulate and molecular contamination, but has not eliminated them entirely. 

The faster running material on the plate (/ f = 0.5) corresponds to the nine-membered ring 1 1 cyclic adduct L-10. Remove the silica from the plate (caution wear a mask as absorbed materials on silica dust are extremely hazardous) using a scalpel, and dissolve the product in chloroform (20 mL). 

Someone either vaccinated previously or vaccinated that day should collect the specimens while wearing a mask and gloves. They should use the blunt edge of a scalpel to open a lesion to obtain vesicular or pustular fluid, a cotton swab to harvest the fluid, and forceps to pick up scabs. They should place the specimens in a... 

By design, the SCALPEL exposure tool employs a small (1 mm x 1 mm) electron optical field, which is consistent with the strutted mask design and step-and-scan writing strategy. Since the electron optical field is the same width as the pattern area between the mask struts, die exposure is accomplished by mechanically scanning the mask and wafer through the effective electron optical field. ... 

Nylon membrane Biodyne B or similar see Notes 5 and 6). Carefully cut a piece of membrane (e.g., Pall Biodyne B) 2 mm larger in each dimension than the window in the mask. Measure the dimensions of the mask window, marking the corners on the membrane with a soft pencil. Carefully cut out the membrane by scoring a sterile scalpel along a clean ruler. 

Surgical staff should wear appropriate protective clothing and equipment, which can protect from unwanted fluid splash or sharps injuries. PPE includes gloves, face masks, soak-proof gowns, impervious boots or shoe covers, face shields, and other eye protection devices. Make safety scalpels with movable shields or retracting blades available to surgeons and other operating room personnel. 

AFM can be used to follow the deposition of thin films over time. Simple thickness measurements can be performed by either scoring the film with a scalpel after deposition or masking part of the substrate before deposition of the film, and measuring the height of the step created. In Fig. 2.5, plasma polymer films grown from acrylic acid monomer are shown to grow initially as discrete islands, which then coalesce and eventually form a flat, pinhole-free film after approximately 240 s. This result is contrary to the often-stated view of plasma deposition that films always grow as a conformal layer. 

---