Precursor dissociation

The methyl-substituted cyclopropenylium ion (215) was suggested to be generated from various 4118 precursors, dissociating via consecutive losses of H and... 

As anticipated in the Introduction, for a system following Scheme 2, the equilibrium constant of the precursor dissociation must not be larger than an upper limiting value. If this holds, one obtains a lifetime of the precursor R—Y that exceeds the natural lifetime (Ad)-1 by the factor of Ac[I]o/AtR/C and this may amount to many orders of magnitude.1517... 

Summary The first ionic dissociation of the Si-Cl bond in neutral hexacoordinate silicon complexes is reported. An equilibrium reaction between the ionic siliconium chloride and its neutral precursor (dissociation-recombination) is observed. The population ratio can be controlled by temperature or by replacement of the chloro ligand by a triflate group. The reaction enthalpy and entropy of the dissociation are both negative, suggesting that solvent organization facilitates dissociation at low temperature. 

The chemisorption of a molecule is often a precursor [31] to fiirther reactions such as dissociation (see section A3,9.5.2). that is, the molecule must reside in the precursor state exploring many configurations until finding that leading to a reaction. Where there is more than one distinct chemisorption state, one can act as a precursor to the other [32], The physisorption state can also act as a precursor to chemisorption, as is observed for the 02/Ag(l 10) system [33],... 

Butler D A, Hayden B E and Jones J D 1994 Precursor dynamics in dissociative hydrogen adsorption on W(100) Chem. Phys. Leff. 217 423... 

Butler D A and Hayden B E 1995 The indirect channel to hydrogen dissociation on W(100)c(2 2)Cu—evidence for a dynamical precursor Chem. Phys. Lett. 232 542... 

Rettner C T, Schweizer E K and Stein H 1990 Dynamics of chemisorption of N2 on W(100) Precursor-mediated and activated dissociation J. Chem. Phys. 93 1442... 

J Rettner C T and Mullins C B 1991 Dynamics of the chemisorption of O2 on Pt(111) Dissociation via direct population of a molecularly chemisorbed precursor at high incidence kinetic energy J. Chem. Phys. 94 1626... 

U ] Rettner C T and Stein H 1987 Effect of the translational energy on the chemisorption of N2 on Fe(111) activated dissociation via a precursor state Phys. Rev. Lett. 59 2768... 

Luntz A C and Harris J 1992 The role of tunneling in precursor mediated dissociation Alkanes on metal surfaces J. 

One of the motivations for studying Van der Waals complexes and clusters is that they are floppy systems with similarities to the transition states of chemical reactions. This can be taken one stage further by studying clusters that actually are precursors for chemical reactions, and can be broken up to make more than one set of products. A good example of this is H2-OH, which can in principle dissociate to fonn either H2 + OH or H2O + H. Indeed, dissociation to H2 O -t H is energetically favoured the reaction H2 + OH—> H2 O -t H is exothennic by about 5000... 

The SiH radical is tlie dominant growtli precursor for tlie fonnation of tlie a-Si H films in a low-temperature silane plasma [32]. Silane molecules are dissociated by energetic plasma electrons ... 

Precursor ions are selected by Ql and passed into the collision cell (Q2 orq2 of Figure 33.5). Here, collision with an inert gas (argon or helium) causes dissociation to occur, and the resulting fragment (product) ions are detected by scanning Q3 (Figure 33.6). 

Inner-sphere. Here, the two reactants first form a bridged complex (precursor)- intramolecular electron transfer then yields the successor which in turn dissociates to give the products. The first demonstration of this was provided by H. Taube. He examined the oxidation of ICrfHoOijj by lCoCl(NHr)< and postulated that it occurs as follows ... 

Tandem quadrupole and magnetic-sector mass spectrometers as well as FT-ICR and ion trap instruments have been employed in MS/MS experiments involving precursor/product/neutral relationships. Fragmentation can be the result of a metastable decomposition or collision-induced dissociation (CID). The purpose of this type of instrumentation is to identify, qualitatively or quantitatively, specific compounds contained in complex mixtures. This method provides high sensitivity and high specificity. The instrumentation commonly applied in GC/MS is discussed under the MS/MS Instrumentation heading, which appears earlier in this chapter. 

Tandem mass spectrometry (MS/MS) is a method for obtaining sequence and structural information by measurement of the mass-to-charge ratios of ionized molecules before and after dissociation reactions within a mass spectrometer which consists essentially of two mass spectrometers in tandem. In the first step, precursor ions are selected for further fragmentation by energy impact and interaction with a collision gas. The generated product ions can be analyzed by a second scan step. MS/MS measurements of peptides can be performed using electrospray or matrix-assisted laser desorption/ionization in combination with triple quadruple, ion trap, quadrupole-TOF (time-of-flight), TOF-TOF or ion cyclotron resonance MS. Tandem... 

The evidence presented so far excludes the formation of dissociated ions as the principal precursor to sulfone, since such a mechanism would yield a mixture of two isomeric sulfones. Similarly, in the case of optically active ester a racemic product should be formed. The observed data are consistent with either an ion-pair mechanism or a more concerted cyclic intramolecular mechanism involving little change between the polarity of the ground state and transition state. Support for the second alternative was found from measurements of the substituent and solvent effects on the rate of reaction. 

The adsorption of C02 on metal surfaces is rather weak, with the exception of Fe, and no molecular or dissociative adsorption takes place at room temperature on clean metal surfaces. At low temperatures, lower than 180 to 300 K, a chemisorbed COf" species has been observed by UPS6 on Fe(lll) and Ni(110) surfaces, which acts as a precursor for further dissociation to CO and adsorbed atomic oxygen. A further step of CO dissociation takes place on Fe(l 11) above 300 to 390 K. 

Similar to the case of CO, the dissociation propensity of NO depends largely on the substrate, following the same general trends. Alkali introduction on metal substrates promotes the dissociative adsorption of NO, both by weakening the N-O intramolecular bond and by stabilizing the molecular state which acts as a precursor for dissociation. 

This backdonation of electron density from the metal surface also results in an unusually low N-N streching frequency in the a-N2 state compared to the one in the y-N2 state, i.e. 1415 cm 1 and 2100 cm"1, respectively, for Fe(l 11)68. Thus the propensity for dissociation of the a-N2 state is comparatively higher and this state is considered as a precursor for dissociation. Because of the weak adsorption of the y-state both the corresponding adsorption rate and saturation coverage for molecular nitrogen are strongly dependent on the adsorption temperature. At room temperature on most transition metals the initial sticking coefficient does not exceed 10 3. 

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