Poly sulfones chemicals, resistance

One of the first fictional fluoropolymers was poly-1,2,2-trifluorostyrene. On one hand, it has much better oxidation and chemical resistance in comparison with common hydrocarbon polymers and, on the other hand, a wide range of functional groups can be attached to the aromatic ring. A sulfonated polymer was successfully used as a membrane for fuel cells by General Electric Co.3... 

Poly(ether ether ketone) (PEEK) is an aromatic, high performance, semicrystalline polymer with extremely good thermal stability, chemical resistance, and electrical and mechanical properties. This polymer shows little solubility in organic solvents due to the crystallinity. One of the first ways to characterize PEEK was by sulfonating the polymer. By adding sulfonic acid groups to the backbone, the crystallinity decreased and solubility increased.Commercially available Victrex appears to be one of the more interesting poly(arylene ether) s used for postmodification. 

Within the past several years, improvements in the toughening of high-temperature epoxies and other reactive thermosets, such as cyanate esters and bismaleimides, have been accomplished through the incorporation of engineering thermoplastics. Additions of poly(arylene ether ketone) or PEK and poly(aryl ether sulfone) or PES have been found to improve fracture toughness. Direct addition of these thermoplastics generally improves fracture toughness but results in decreased tensile properties and reduced chemical resistance. 

Poly(sulfone) has the characteristic properties such as chemical inertness, excellent strength, stiffness, high resistance to radiations and temperature, dimensional stability, and biocompatibility [2,16,56], These properties resemble the properties of light metals [57], Further, the properties of poly(sulfone) do not change during... 

In general, poly(naphthylimides) containing six-membered imide rings in backbones are characterised by significantly improved chemical resistance compared to analogous poly(phthalimides) [144-147]. A similar conclusion was made comparing the chemical resistance of sulfonated polyimides and poly(naphthylimides) [124,125]. 

At that time, a mixed electrolyte membrane made of fluorocarbon and poly(styrene sulfonic acid) was used. Later, as development continued for aerospace and military purposes, in 1972, the perfluorocarbon membrane Nafion was introduced and it drastically improved chemical resistance. 

Much less work has been focused on the effect of polymer structure on the resist performance in these systems. This paper will describe and evaluate the chemistry and resist performance of several systems based on three matrix polymers poly(4-t-butoxycarbonyloxy-a-methylstyrene) (TBMS) (12), poly(4-t-butoxycarbonyloxystyrene-sulfone) (TBSS) (13) and TBS (14) when used in conjunction with the dinitrobenzyl tosylate (Ts), triphenylsulfonium hexafluoroarsenate (As) and triphenylsulfonium triflate (Tf) acid generators. Gas chromatography coupled with mass spectroscopy (GC/MS) has been used to study the detailed chemical reactions of these systems in both solution and the solid-state. These results are used to understand the lithographic performance of several systems. 

The chemical modification of poly(arylene ether sulfone)s has already been described in numerous papers. They relate to sulfonation, fluorination, and halomethylation. These derivatives are particularly suitable for the preparation of hydrolysis- and temperature-resistant separation membranes. They are used already for sea water desalination, and also for the separation of gas mixtures. 

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