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Photoinitiator applications

Photoinitiation is not as important as thermal initiation in the overall picture of free-radical chain-growth polymerization. The foregoing discussion reveals, however, that the contrast between the two modes of initiation does provide insight into and confirmation of various aspects of addition polymerization. The most important application of photoinitiated polymerization is in providing a third experimental relationship among the kinetic parameters of the chain mechanism. We shall consider this in the next section. [Pg.371]

One key consideration in developing radiation curable adhesive systems is the thermal stability and volatility of any photoinitiators used. These chemicals are designed for liquid systems where these issues do not arise. Few of the commercial photoinitiators have adequate thermal stability at the highest hot melt temperatures (180-200°C) and many are too volatile. Reduced application temperatures and special antioxidant packages are often required. [Pg.736]

The most important practical application of the organometallic complex photoinitiators is the possibility of using these types of initiators in modifying the pre-existing polymer chain, e.g., block, graft, and crosslinked copolymers preparation. [Pg.253]

General concepts have been discussed in Section 3.1.8. General reviews on photoinitiation include those by Pappas,"6" 264 Bassi,26 Mishra300 and Osier and Yang267 and Gruber.268 The applications of azo-compounds and peroxides as photoinitiators are considered in the sections on those initiators (see 3.3.1.1.2, 3.3.2.1.2, 3.3.2.3.2). References to reviews on specific pholoinilialors are given in the appropriate section below. [Pg.98]

Although polysilanes have been used mostly as photoinitiators for polymerization, they may also find application as initiators for other radical reactions. Experiments to test this possibility are now being carried out. [Pg.17]

Soluble polydiorganosilane homo and copolymers have recently shown great potential in such areas as precursors for the preparation of silicon carbide fibers (1), as photoinitiators in alkene polymerization (2), as photoconductors (3), and as positive or negative self-developing photoresists for photolithographic applications (4). A number of copolydiorganosilane copolymers have been reported recently (5) in which the copolymer contained equal amounts of both monomers in the feed. [Pg.112]

The application of the calculated reaction enthalpy allows us to estimate the kinetic chain length (approximately 30) and other kinetic data (reaction rate, final conversion, inhibition time) of the crosslinking reaction. The reaction rate (dx/dt) of this process is a function of the light intensity, the exposure time, of the thiol content of the system (see Fig. 1) and also of the photoinitiator used. The final degree of conversion of the double bonds is generally high (80 - 100 %). [Pg.263]

Polysilylenes have been widely investigated in the past decade because of their potential applications in the field of materials science [1], Recent applications of polysilylenes in SiC precursors [2], microlithography [3], photoinitiators [4], and reprography [5] show that polysilylenes are very promising as advanced materials for high technology of the next generation. [Pg.285]

Chang, C. H., Mar, A., Tiefenthaler, A., and Wostratzky, D. "Photoinitiators Mechanisms and Applications", a publication form Ciba-Geigy Corporation, Hawthorne, New York. [Pg.50]

The development of new classes of cationic photoinitiators has played a critical role in the production of highly sensitive, acid-catalyzed deep-uv photoresists. Sulfonium salts have been widely used in this respect (4). These materials are relatively easy to prepare and structural modifications can be used to produce desired wavelength sensitivity. Triphenylsulfonium salts are particularly well suited for deep-uv application and in addition can be photosensitized for longer wavelength. These salts are quite stable thermally and certain ones such as the hexafluoroantimonate salt are soluble in casting solvents and thus easily incorporated within resist materials. [Pg.28]

Report 100 Photoinitiated Polymerisation - Theory and Applications, J.P. Fouassier, Ecole Nationale Superieure de Chimie, Mulhouse. [Pg.128]

Furthermore, the wide range of polymerization rates is controlled by the photoinitiation conditions. Specifically, the initiator concentration and incident light intensity control the rate of polymerization and, therefore, the rate of heat released upon curing. These conditions can be conveniently altered for in vivo applications to minimize local tissue necrosis from the... [Pg.192]

Cationic photoinitiators are used in coatings, printing inks, adhesives, sealants, and photoresist applications. Most of the applications involve vinyl ether polymerizations or ringopening polymerizations of epoxy monomers (Sec. 7-2b). [Pg.380]

J.R Eouassier, Photoinitiator, Photopolymerization and Photcuring Fundamentals and Applications. [Pg.302]

Surface-initiated polymerization (SIP) has been carried out with a variety of initiators and Fig. 2 describes some of the most common photoinitiators [9-14]. For SIP applications, these initiators are typically modified and... [Pg.49]

Our application of the rotating sector technique to hydrocarbon oxidations has been described (14,15,18). Oxidation rates were measured at the longest convenient chain lengths and corrected for the absorption and evolution of gas in initiation and in peroxy radical-peroxy radical reactions. ,a -Azobiscyclohexylnitrile (ACHN) was used as the photoinitiator at 30°C. and a,a -azobis-l-propanol diacetate as the photoinitiator at 56°C. ,a -Azobisisobutyronitrile (AIBN) was used as a thermal initiator at 30° and 56°C. [Pg.20]


See other pages where Photoinitiator applications is mentioned: [Pg.887]    [Pg.371]    [Pg.401]    [Pg.98]    [Pg.522]    [Pg.120]    [Pg.882]    [Pg.157]    [Pg.79]    [Pg.121]    [Pg.3]    [Pg.4]    [Pg.64]    [Pg.79]    [Pg.82]    [Pg.133]    [Pg.190]    [Pg.222]    [Pg.156]    [Pg.165]    [Pg.224]    [Pg.219]    [Pg.221]    [Pg.380]    [Pg.177]    [Pg.275]    [Pg.333]    [Pg.63]    [Pg.130]    [Pg.211]    [Pg.508]    [Pg.140]   
See also in sourсe #XX -- [ Pg.409 ]




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