Phenol carboxylic acid resin

A thermoset polymer containing one or more epoxide groups and curable by reaction with amines, alcohols, phenols, carboxylic acids, acid anhydrides, and mercap-tans. It has been primarily used as a matrix resin in composites and adhesives. 

Carbon, hydrogen and possibly oxygen Resin and derivatives Natural drying oils Cellulose derivatives Alkyd resins Epoxy resins (uncured) Phenol-formaldehyde resins Polystyrene Acrylic resins Natural and synthetic rubbers Carbon monoxide Aldehydes (particularly formaldehyde, acrolein and unsaturated aldehydes) Carboxylic acids Phenols Unsaturated hydrocarbons Monomers, e.g. from polystyrene and acrylic resins... 

Group of plastics composed of resins produced by reactions of epoxides or oxiranes with compounds such as amines, phenols, alcohols, carboxylic acids, acid anhydrides and unsaturated compounds. 

Organic carboxylic acids are commonly found in foods, in the adipate process stream, and as pollutants. Fatty acids are the lipophilic portion of glycerides and a major component of the cell membrane. Phenols are widely used in polymers, as wood preservatives, and as disinfectants. Chloro-phenols such as 4-chlorophenol, two isomeric dichlorophenols, 2,4,6-tri-chlorophenol, three isomeric tetrachlorophenols, and pentachlorophenol were separated on a Dowex (The Dow Chemical Co. Midland, MI) 2-X8 anion exchange resin using an acetic acid-methanol gradient.138... 

Riley and Taylor [39] have studied the uptake of about 30 organics from seawater onto the resin at pH 2 - 9. At the 2 - 5 p,g/l level none of the carbohydrates, amino acids, proteins or phenols investigated were adsorbed in any detectable amounts. Various carboxylic acids, surfactants, insecticides, dyestuffs, and especially humic acids are adsorbed. The humic acids retained on the XAD-1 resin were fractionated by elution with water at pH 7, M aqueous ammonia, and 0.2 M potassium hydroxide. 

The use of phenolic polymers in photocrosslinkable systems usually involves multicomponent systems which incorporate polyfunctional low molecular weight crosslinkers. For example, Feely et al. [9] have used hydroxymethyl melamine in combination with a photoactive diazonaphthoquinone which produces an indene carboxylic acid upon irradiation to crosslink a novolac resin. Similarly, Iwayanagi et al. [10] have used photoactive bisazides in combination with poly(p-hydroxy-sty-rene) to afford a negative-tone resist material which does not swell upon development in aqueous base. 

The workhorse of the VLSI industry today is a composite novolac-diazonaphthoquinone photoresist that evolved from similar materials developed for the manufacture of photoplates used in the printing industry in the early 1900 s (23). The novolac matrix resin is a condensation polymer of a substituted phenol and formaldehyde that is rendered insoluble in aqueous base through addition of 10-20 wt% of a diazonaphthoquinone photoactive dissolution inhibitor (PAC). Upon irradiation, the PAC undergoes a Wolff rearrangement followed by hydrolysis to afford a base-soluble indene carboxylic acid. This reaction renders the exposed regions of the composite films soluble in aqueous base, and allows image formation. A schematic representation of the chemistry of this solution inhibition resist is shown in Figure 6. 

At the present time, most of the positive photoresists used in the manufacture of microcircuits consist of a low molecular weight phenolic resin and a photoactive dissolution inhibitor. This composite system is not readily soluble in aqueous base but becomes so upon irradiation with ultraviolet light. When this resist is exposed, the dissolution inhibitor, a diazoketone, undergoes a Wolff rearrangement followed by reaction with ambient water to produce a substituted indene carboxylic acid. This photoinduced transformation of the photoactive compound from a hydrophobic molecule to a hydrophillic carboxylic acid allows the resin to be rapidly dissolved by the developer. (L2,3)... 

The Pechmann and Knoevenagel reactions have been widely used to synthesise coumarins and developments in both have been reported. Activated phenols react rapidly with ethyl acetoacetate, propenoic acid and propynoic acid under microwave irradiation using cation-exchange resins as catalyst <99SL608>. Similarly, salicylaldehydes are converted into coumarin-3-carboxylic acids when the reaction with malonic acid is catalysed by the montmorillonite KSF <99JOC1033>. In both cases the use of a solid catalyst has environmentally friendly benefits. Methyl 3-(3-coumarinyl)propenoate 44, prepared from dimethyl glutaconate and salicylaldehyde, is a stable electron deficient diene which reacts with enamines to form benzo[c]coumarins. An inverse electron demand Diels-Alder reaction is followed by elimination of a secondary amine and aromatisation (Scheme 26) <99SL477>. 

The Surlyn A ionomers (E. I. du Pont de Nemours Co.) are believed to be derived from copolymers of ethylene with minor amounts of methacrylic acid which are treated subsequently, so that substantial amounts of the carboxylic acid are converted to the sodium or other metal carboxylate. Resins similar to the one studied in this work contain about 10 weight % methacrylic acid. The ash (sodium carbonate) indicates about 40% neutralization. This resin, which contains 0.05% Santo-white Powder (Monsanto Chemical Co.), a phenolic antioxidant, is of medium molecular weight—i.e., probably corresponding to an ethylene homopolymer with a melt flow index around 20 (17). The molecular weight distribution is broad (17). 

Only a few examples have been reported of the etherification of alcohols with resin-bound diarylmethyl alcohols (Entry 5, Table 3.30 Entry 5, Table 3.31 [564]). Diarylmethyl ethers do not seem to offer advantages over the more readily accessible trityl ethers, which are widely used as linkers for both phenols and aliphatic alcohols. Attachment of alcohols to trityl linkers is usually effected by treating trityl chloride resin or 2-chlorotrityl chloride resin with the alcohol in the presence of a base (phenols pyridine/THF, 50 °C [565] or DIPEA/DCM [566] aliphatic alcohols pyridine, 20-70 °C, 3 h-5 d [567-572] or collidine, Bu4NI, DCM, 20 °C, 65 h [81]). Aliphatic or aromatic alcohols can be attached as ethers to the same type of light-sensitive linker as used for carboxylic acids (Section 3.1.3). 

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