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Patterning printing

Sakurai K, Teramura Y, Iwata H (2011) Cells immobilized on patterns printed in DNA by an inkjet printer. Biomaterials 32 3596-3602... [Pg.199]

Figure 7. SEU photographs of resist patterns printed with and without the Dl-CEL on commercially available resist (Hitachi Chemical RI-7000P). Figure 7. SEU photographs of resist patterns printed with and without the Dl-CEL on commercially available resist (Hitachi Chemical RI-7000P).
Gauvreau V, Laroche G (2005) Micro pattern printing of adhesion, spreading, and migration peptides on poly(tetrafluoroethylene) films to promote endothelialization. Bioconjug Chem 16(5) 1088-1097... [Pg.78]

The screen-printing paste is made up in the manner described in Section 4.2.2 and the patterns printed. The heater element and its leads would typically be platinum and the interdigitated electrodes gold. As illustrated below (Fig. 4.49) the heater might also be a composition based on ruthenium oxide (see Section 4.2.2). The contacting tabs are also screen-printed gold. [Pg.211]

Obviously, one of the major concerns in the preparation of the conductive ink is the need for low electrical resistivity. Commercial conductive IJ inks based on silver particles have metal loadings ranging from approximately 20% to 80% by weight. Resistance of a pattern printed from a single pass of a print head is thus expected to be lower for formulations with higher sohds content. However, another factor that influences resistivity is the non-conductive organic load in the ink and in the sintered pattern. Therefore, when choosing... [Pg.237]

Figure 6. SEM micrographs depicting coded (a) 1.0, (b) 0.75 and (c) 0.5 jim line-space patterns printed in SI-NPR. Figure 6. SEM micrographs depicting coded (a) 1.0, (b) 0.75 and (c) 0.5 jim line-space patterns printed in SI-NPR.
T. Yamawaki, K. Wakashima, H. Terada, and K. Sasaki, Electrodeposition Photoresist for Production of Fine Pattern Printed Wiring Boards, Surface Mount International, Conference and Exposition Proceedings of the Technical Program, 1, 654-668, Surface Mount International (1991). [Pg.162]

A photomask is a nearly optically flat glass (transparent to near UV) or quartz plate (transparent to deep UV) with a metal absorber pattern printed on one side. The metal pattern is typically a 0.1 /zm thick chromium layer. The metal absorber pattern on a photomask is opaque to ultraviolet radiation, whereas glass... [Pg.53]

Fig. 122 Negative 200 nm line/space patterns printed at 248 nm in a condensation resist with 0.26 N TMAH developer (courtesy of J.W. Thackeray, Shipley)... Fig. 122 Negative 200 nm line/space patterns printed at 248 nm in a condensation resist with 0.26 N TMAH developer (courtesy of J.W. Thackeray, Shipley)...
Fig. 157 Sub-0.5 pm line/space patterns printed by thermal development and subsequent 02 RIE pattern transfer [336]... Fig. 157 Sub-0.5 pm line/space patterns printed by thermal development and subsequent 02 RIE pattern transfer [336]...
Fig. 181 SEM images of equal line/space patterns printed by interferometric lithography in ESCAP resists (257 nm,257 nm immersion, 157 nm immersion, and EUV) [510]... Fig. 181 SEM images of equal line/space patterns printed by interferometric lithography in ESCAP resists (257 nm,257 nm immersion, 157 nm immersion, and EUV) [510]...
FIGURE 5.5.14 Optical micrographs of gold patterns printed by nTP. (a) 100-nm holes printed with a GaAs hard stamp on a plastic substrate coated with PDMS gold patterns printed with a PDMS stamp on (b) a PDMS substrate (c) a silicon/silicon dioxide substrate and (d) an ITO-coated plastic substrate. (From Y.-L. Loo, et al., J. Vac. Set TechnoL, B, 20, 2853, 2002.)... [Pg.453]

In order to form OFETs, it is necessary to pattern at least the source and drain layer of the device. To form circuits, typically four layers need to be patterned. Printing techniques pattern additively, i.e. material is only deposited where it is wanted. When a material is deposited using a large area deposition technique, the unwanted material needs to be defined and removed in a subtractive process. [Pg.43]

Figure 11.13 SEM images of line-and-space patterns printed with 60-nm-thick Shipley XP-98248 resist on bare silicon and exposed at 157 nm. Process conditions postapplied bake 130°C/60 seconds, postexposure bake 130°C/90 seconds, developer 0.26N tetramethylammonium hydroxide (without surfactant) for 20 seconds. Unexposed resist loss 6nm. Exposure energy 1.35 mJ/cm. Note the significant surface inhibition layer, showing poisoning effects. ... Figure 11.13 SEM images of line-and-space patterns printed with 60-nm-thick Shipley XP-98248 resist on bare silicon and exposed at 157 nm. Process conditions postapplied bake 130°C/60 seconds, postexposure bake 130°C/90 seconds, developer 0.26N tetramethylammonium hydroxide (without surfactant) for 20 seconds. Unexposed resist loss 6nm. Exposure energy 1.35 mJ/cm. Note the significant surface inhibition layer, showing poisoning effects. ...
Exposure latitude is the maximum amount of dose variation that can he tolerated before a pattern prints out of specification (see Fig. 13.35). A + 10% dimension... [Pg.675]

There are three layers in decorative floor covering. The second and the third layers are made from PVC with composition given in the table above. The surface layer is made from polyethylene terephthalate film which protects decorative patterns printed by gravure printing under polyethylene terephthalate film. [Pg.108]

Fig. 5 AFM image of a poly(ferrocenyldimethylsilane) pattern printed with an oxygen-plasma-treated PDMS stamp. The corrugated structure is a result of the stress generated by the difference in thermal expansion between the PDMS matrix and the oxidized surface. Reprinted with permission from [69]. Copyright 2004, John Wiley Sons, Inc. Fig. 5 AFM image of a poly(ferrocenyldimethylsilane) pattern printed with an oxygen-plasma-treated PDMS stamp. The corrugated structure is a result of the stress generated by the difference in thermal expansion between the PDMS matrix and the oxidized surface. Reprinted with permission from [69]. Copyright 2004, John Wiley Sons, Inc.
Tokin developed a piezoelectric ceramic cylinder for a torsional vibrator [61]. Using an interdigital type electrode pattern printed with a 45° cant angle on the cylinder surface, torsion vibration was generated, which is applicable for a simple ultrasonic motor. [Pg.150]

Synthetic iris patterns have been used by ocularists in manufacturing glass eyes and contact lenses for a while. The ocularist s approach to iris synthesis is based on the composition of painted primitives and utilizes layered semitransparent textures built from topological and optic models [32]. These methods are used today to create contact lenses with fake iris patterns printed onto them. [Pg.476]


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See also in sourсe #XX -- [ Pg.103 ]




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