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Oxides lead , photoelectron spectroscopy

Buckley, A. N., 1994. A survey of the application of X-ray photoelectron spectroscopy to flotation research. Colloids Surf, 93 159 - 172 Buckley, A. N. and Woods, R., 1995. Identifying chemisorption in the interaction of thiol collectors with sulphide minerals by XPS adsorption of xanthate on silver and silver sulphide. Colloids and Surfaces A Physicochemical and Engineering Aspects, 104,2 - 3 Buckley, A. N. and Woods, R., 1996. Relaxation of the lead-deficient sulphide surface layer on oxidized galena. Journal of Applied Electrochemistry, 26(9) 899 - 907 Buckley, A. N. and Woods, R., 1997. Chemisorption—the thermodynamically favored process in the interaction of thiol collectors with sulphide minerals. Inert. J. Miner. Process, 51 15-26... [Pg.270]

Other workers (165) used X-ray photoelectron spectroscopy (XPS) to examine the influence of ammonia oxidation on the surface composition of alloy gauzes. After several months on stream, the surface was covered by the same types of highly faceted structures noted by others. As illustrated in Fig. 14, XPS analysis provides evidence that the top microns, and in particular the top 100 A of the surface, were enriched in rhodium. This enrichment was attributed to the preferential volatilization of platinum oxide. The rhodium in the surface layers was present in the oxide form. Other probes confirm the enrichment of the surface in rhodium after ammonia oxidation (166). Rhodium enrichment has been noted by others (164, 167), and it has been postulated that in some cases it leads to catalyst deactivation (168). [Pg.393]

They studied the chemistry of oxidized Si(lll) surfaces treated at two concentrations of the silane in trichloroethylene solution using angle-dependent X-ray photoelectron spectroscopy (XPS or ESCA). Although these are non-aqueous adsorption studies, sufficient surface silanol or adsorbed water is present for complete hydrolysis to occur because no trace of chlorine is seen in the XPS spectra. The two concentrations studied were 1% v/v, termed saturated, and <1/400% v/v, termed dilute. They lead to two distinct types of molecular bonding to the surface. C( 1 s) XPS spectra of these two situations are shown in Fig. 3. [Pg.73]

Experimental determinations of barrier heights on oxide semiconductor interfaces using photoelectron spectroscopy are rarely found in literature and no systematic data on interface chemistry and barrier formation on any oxide are available. So far, most of the semiconductor interface studies by photoelectron spectroscopy deal with interfaces with well-defined substrate surfaces and film structures. Mostly single crystal substrates and, in the case of semiconductor heterojunctions, lattice matched interfaces are investigated. Furthermore, highly controllable deposition techniques (typically molecular beam epitaxy) are applied, which lead to films and interfaces with well-known structure and composition. The results described in the following therefore, for the first time, provide information about interfaces with oxide semiconductors and about interfaces with sputter-deposited materials. Despite the rather complex situation, photoelectron spectroscopy studies of sputter-deposited... [Pg.130]

According to X-ray photoelectron spectroscopy data, the adsorption of CO on supported Ru of rather low-dispersion (0.27 by hydrogen chemisorption) at 310 K leads to the formation of some oxidized Ru, which can be re-reduced by hydrogen treatment 101). Similarly, an EXAFS study of the effect of RT chemisorption of CO on very highly dispersed Rh (1.70... [Pg.59]

What do the photoelectron spectroscopy of lead halides, oxides, and sulfides tell us about the makeup of the valence band in each case ... [Pg.14]

Based on X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR), electron spin resonance (ESR), Mbssbauer, and extended X-ray absorption fine structure spectroscopy (EXAFS) , van Veen and collaborators concluded that the thermal treatment at temperatures where catalytic activity is maximum ( 500-600°C) does not lead to complete destruction of the macrocycles, but rather to a ligand modification which preserves the Me-N4 moiety intact. Furthermore, the stability of this catalytic site is improved because the reactive parts of the ligands are bound to the carbon support and thus are no longer susceptible to an oxidative attack. Thermal treatments at higher temperatures (up to 850°C) led to some decomposition of the Me-N4 moiety, and thus to a decrease of the catalytic activity, and to the reduction of some of the ions to their metallic state. [Pg.89]


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