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Optoelectronic manufacturing

Baldacchini, T, Zimmerley, M., Potma, E.O., and Zadoyan, R. (2009) Chemical mapping of three-dimensional microstmctures fabricated bytwo-photon polymerization using CARS microscopy. Laser Applications in Microelectronic and Optoelectronic Manufacturing VII (eds M. Meunier, A.S. Holmes, H. Niino, and B. Gu), Proc. of SPIE, vol. 7201. [Pg.136]

Chemical vapor deposition (C VD) is a versatile process suitable for the manufacturing of coatings, powders, fibers, and monolithic components. With CVD, it is possible to produce most metals, many nonmetallic elements such as carbon and silicon as well as a large number of compounds including carbides, nitrides, oxides, intermetallics, and many others. This technology is now an essential factor in the manufacture of semiconductors and other electronic components, in the coating of tools, bearings, and other wear-resistant parts and in many optical, optoelectronic and corrosion applications. The market for CVD products in the U.S. and abroad is expected to reach several billions dollars by the end of the century. [Pg.25]

Optoelectronics is a relatively new and fast-growing industry with many applications. Thin-film processes, such as reactive sputtering, molecular-beam epitaxy (MBE), and particularly MOCVD, play a major part in their production. Equipment and materials are similar to those used in the semiconductor industry and many companies manufacture both types of products. In fact the distinction between the two areas is often blurred. Statistics generally do not single out optoelectronics as such and, for that reason, it is difficult to define the scope of the industry accurately. [Pg.384]

The development in field of optoelectronics, digital components and light emitting diodes and laser diodes is of particular importance in manufacturing commercially attractive instruments. [Pg.96]

The rapid developments in the microelectronics industry over the last three decades have motivated extensive studies in thin-film semiconductor materials and their implementation in electronic and optoelectronic devices. Semiconductor devices are made by depositing thin single-crystal layers of semiconductor material on the surface of single-crystal substrates. For instance, a common method of manufacturing an MOS (metal-oxide semiconductor) transistor involves the steps of forming a silicon nitride film on a central portion of a P-type silicon substrate. When the film and substrate lattice parameters differ by more than a trivial amount (1 to 2%), the mismatch can be accommodated by elastic strain in the layer as it grows. This is the basis of strained layer heteroepitaxy. [Pg.317]

Examination of the practical applications of ion radicals includes coverage of their roles in biological systems as well as in material chemistry, ranging from optoelectronics, organic metals, and magnets to lubricants and the manufacture of paper. [Pg.5]

Ceramic Components Manufacturing Cell Phone Manufacturing Semiconductor Components Optoelectronic Products Consumer Electronics... [Pg.301]

Photovoltaic Module Manufacturing Biomedical Products Technologies Electric Utility Solar Power Generation Optoelectronics... [Pg.378]

Spire Corp. develops, manufactures and markets highly engineered products and services in three principal business areas biomedical, solar and optoelectronics. The company operates primarily through its subsidiary Spire... [Pg.378]


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Optoelectronic

Optoelectronics

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