Noyes

Berkowitz, J. B., Funkhouser, J. T., and Stevens, J. I., Unit Operations for Treatment of Hazardous Industrial Wastes, Noyes Data Corporation, Park Ridge, N.J., 1978. [Pg.320]

Ranney, M.W. (1974), Fuel additives . Chemical Technology Review No. 26, Noyes Data Corporation, Park Ridge, NJ. [Pg.459]

Noyes R M 1961 Effeots of diffusion on reaotion rates Prog. React. Kinet. 1 129... [Pg.868]

The basie features of the oseillatory meehanism of the BZ reaetion are given by the Field-Koros-Noyes (FKN) model [14]- This involves three proeesses —A, B and C. Proeess A involves step (8) and step (9) from seetion A3,14.2.1. leading to removal of uiliibitor bromide ion. Proeess B involves step (3) and step (4) from Seetion A3.14.1.1 and gives the autoeatalytie oxidation of the eatalyst. This growth is limited partly by the disproportionation reaetion... [Pg.1101]

Field R J, Koros E and Noyes R M 1972 Csoillations in ohemioal systems, part 2 thorough analysis of temporal osoillations in the bromate-oerium-malonio aoid system J. Am. Chem. Soo. 94 8649-64... [Pg.1116]

Field R J and Noyes R M 1974 Csoillations in ohemioal systems, part 4 limit oyole behavior in a model of a real ohemioal reaotion J. Chem. Phys. 60 1877-84... [Pg.1116]

Frisbie C D, Rozsnyai L F, Noy A, Wrighton M S and Lieber C M 1994 Funotional group imaging by ohemioal foroe miorosoopy Science 265 2071... [Pg.1729]

Collie M J (ed) 1980 Corrosion inhibitors Deveiopments since 1980 (Park Ridge, NJ Noyes) Kuznetsov Y I 1996 Organic inhibitors of Corrosion of Metais (New York Plenum)... [Pg.2739]

Chen F F 1995 Fleiicon piasma sources High Density Plasma Sources ed O Popov (Park Ridge, MD Noyes)... [Pg.2812]

Arthur Amos Noyes Laboratory of Chemical Physics, Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, CA... [Pg.179]

M. Sittig, ed., Elandbook of Toxic and Hazardous Chemicals and Carcinogens, 2nd ed., Noyes Pubbcadons, Park Ridge, N.J., 1985. [Pg.247]

M. T. GiUies, Shortenings, Margarines and Food Oils, Noyes Data Corp., Park Ridge, N.J., 1974, 330 pp. [Pg.120]

J. E. J. Schmit2, Chemical Vapor Deposition of Tungsten andTungsten Silicidesfor VESI FJESI Applications, Noyes PubHcations, Park Ridge, N.J., 1992. [Pg.258]

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