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Metallo-organic chemical vapor deposition

Researchers in Japan have determined that copper interconnects deposited by metallo-organic chemical vapor deposition (MOCVD), then followed by chemical mechanical polishing, provides sub-quarter-micron interconnects and can be achieved on a production basis. Titanium nitride and borophosphosilicate glass provide effective barriers against copper diffusion.PL[H]... [Pg.371]

Pt(S2CNMe(Hex))2] and [Pd(S2CNMe(Hex))2] have been synthesized and used as precursors to grow the first TOPO-capped PtS and PdS nanoparticles and thin films of PtS and PdS by the metallo-organic chemical vapor deposition (MOCVD) method [204]. Platinum and palladium chalcogenides find applications in catalysis [205-210] and materials science [211,212]. The synthesis of thiocarbamato complexes of platinum and palladium from reaction of an aqueous solution of ammonium dithiocarbamate with the platinum or palladium salt has been reported by Nakamoto et al. [213]. However... [Pg.196]

M. Razeghi, Low-Pressure, Metallo-Organic Chemical Vapor Deposition of Ga Inj- AsPi-j, Alloys P. M. Petroff, Defects in III-V Compound Semiconductors... [Pg.184]

See other pages where Metallo-organic chemical vapor deposition is mentioned: [Pg.651]    [Pg.295]    [Pg.179]    [Pg.636]    [Pg.289]    [Pg.651]    [Pg.295]    [Pg.179]    [Pg.636]    [Pg.289]    [Pg.7]    [Pg.236]    [Pg.441]   


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