Metal-organic chemical vapour

Singh HB, Sudha N (1996) OrganoteUurium precursors for metal organic chemical vapour deposition (MOCVD) of mercury cadmium telluride (MCT). Polyhedron 15(5-6), 745-763... 

The assumption of equilibrium which is implicit in EQN (1) is expected to be satisfied at the high temperatures at which metal-organic chemical vapour deposition (MOCVD) growth of nitrides is carried out. At lower temperatures, such as those used in molecular-beam epitaxy (MBE), deviations from equilibrium may occur. 

Ce(R CO.CH.CO.R )3 are readily oxidized (O2) to Ce(R CO.CH.CO.R )4, such as Ce(acac)4(R = R = Me), Ce(dbm)4(R = R = Ph), and Ce(tmhd)4 (R = R = Mc3C), generally found to have square antiprismatic structures, though Ce(tmhd)4 is closer to dodecahedral. These are volatile dark red solids that are soluble in solvents such as benzene and chloroform they are volatile, with vapour pressures high enough for Metal Organic Chemical Vapour Deposition (MOCVD) use, whilst they have also been studied as possible alternatives to lead compounds for petrol additives. 

Recently, low-temperature routes have been sought for by decomposition of organometallic complexes with tellurium-containing ligands. The optoelectronic devices normally require the material to be used as thin films. They are fabricated with special methods, such as molecular beam epitaxy, metal-organic chemical vapour deposition, or atomic layer deposition. 

Some years ago the thermolysis of organopnictogens was considered an esoteric subject of limited interest. The topic has been transformed into one of the growth points of hetero-organic chemistry because of the enormous economic potential of metal organic chemical vapour deposition (MOCVD) processes for the production of III-V type of... 

The bis-Cp titanium bis(/-butanethiolato) and bis(ethanethiolato) complexes have been used as a single-source precursors for the preparation of thin films of titanium sulfides by metal-organic chemical vapour deposition (MOCVD). The crystal and molecular structures of the precursor complexes have been determined for comparison with homologous complexes of the general formula Cp2Ti(SR)2.1618... 

Ziko JL (1988) Metal-organic chemical vapour deposition technology and equipment. In Schuergraf KK Handbook of thin film deposition processes and techniques. Noyes, Park Ridge, NJ, pp234-269... 

A few compounds have been studied for other reasons. These include trimethylaluminium [64] and trimethylgallium [65] which are of interest because of their use in metal organic chemical vapour deposition (MOCVD) processes. The compounds were also studied because the interactions between methyl groups in the same molecule are a continuing source of fascination. Tetramethyltin was studied for the same reason [66]. 

MOCVD Metal-organic chemical vapour deposition... 

Chemical vapour deposition (CVD) is the delivery (by uniform mass transport) of a volatile precursor or precursors to a heated surface on which reaction takes place to deposit a thin film of the solid product the surface must be hot enough to permit reaction but cool enough to allow solid deposition. Multilayer deposition is also possible. Metal-organic chemical vapour deposition (MOCVD) refers specifically to use of metal-organic precursors. 

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