Metal organic chemical vapour deposition MOCVD processes

Some years ago the thermolysis of organopnictogens was considered an esoteric subject of limited interest. The topic has been transformed into one of the growth points of hetero-organic chemistry because of the enormous economic potential of metal organic chemical vapour deposition (MOCVD) processes for the production of III-V type of... 

A few compounds have been studied for other reasons. These include trimethylaluminium [64] and trimethylgallium [65] which are of interest because of their use in metal organic chemical vapour deposition (MOCVD) processes. The compounds were also studied because the interactions between methyl groups in the same molecule are a continuing source of fascination. Tetramethyltin was studied for the same reason [66]. 

In chemical vapor deposition (CVD) reactive vapor precursors react to produce solid materials in the gas phase or at the solid-gas interface on the substrate surface at appropriate temperatures. Typical precursors used in the CVD process are metal hydrides, metal chlorides, and metal organic compounds. In the case that the precursor species are metal organic compounds, the process is called metal-organic chemical vapor deposition (MOCVD). The precursor molecules are introduced into a reactor sometimes with a carrier gas and decompose by means of heat, irradiation of UV light, or electrical plasma formed in the gas. Thermal CVD is the most commonly used method. This technique has an advantage that refractory materials can be vapour-deposited at relatively low temperatures,... 

The rapidly advancing applications of metal alkoxides for synthesis of ceramic materials by sol-gel/MOCVD (metallo-organic chemical vapour deposition) processes (Chapter 7) have more recently given a new impetus to intensive investigations on synthetic, reactivity (including hydrolytic), structural, and mass-spectroscopic aspects of oxo-alkoxide species. ... 

The catalytic activity is a manifestation of the chemical lability of metal alkoxides especially their reactivity with hydroxyl-containing molecules. The volatility and solubility in common organic solvents of certain metal alkoxides has made them attractive precursors for depositing pure metal oxides by chemical vapour deposition (MOCVD) or by the sol-gel process. The requirement for heterometal oxides as useful materials in the electronics industry has stimulated research in this field in recent years and led to renewed interest in the preparation and characterization of alkoxides of some of the p-block elements which had previously been neglected. In particular, the discovery of the high Tc copper oxide-based superconducting heterometal oxides has made a tremendous impact on this field. 

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