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Maskless

Nuwaysir, E.R et al.. Gene expression analysis using oligonucleotide arrays produced by maskless photolithography. Genome Res., 12, 1749-1755, 2002. [Pg.54]

The array is formed in a suitable dielectric substrate and the channels and wells are formed therein using maskless semiconductor patterning techniques. The station and control means, such as computer, use existing technology that includes commercially available apparatus [85],... [Pg.550]

Electrochemical micromachining (EMM) is a technique designed to generate patterned microstructures in metals and alloys [ 145]. Microfabrication by EMM may involve maskless or through-mask dissolution. Maskless EMM uses the... [Pg.15]

Bhushan, K.R. (2006) Light-directed maskless synthesis of peptide arrays using photolabile amino acid monomers. [Pg.440]

One application of lasers to lithography is a maskless patterning technology. In this application, the spatial coherence of the laser is the essential property ... [Pg.198]

X. Li, M. Bao, and S. Shen, Maskless etching of three-dimensional silicon stractures in KOH, Sensors... [Pg.475]

Singh-Gasson S, Green RD, Yue Y, Nelson C, Blattner F, Sussman MR, Cerrina F. 1999. Maskless fabrication of hght-directed ohgonucleotide microarrays using a digital micromirror array. Nat Biotechnol 17 974-978. [Pg.143]

Sato H, Kakinuma T, Go JS, Shoji S (2004) In-channel 3-D micromesh structures using maskless multi-angle exposure and their microfilter apphcation. Sens Actuators A 111 87-92... [Pg.63]

Von Gutfeld, R. S., M. H. Gelchinski, and L. T. Romankiw. Maskless laser plating techniques for microelectronic materials. Proc. SPIE... [Pg.109]

Podlesnik, D. V., H. H. Gilgen, and R. M. Osgood, Jr. Maskless chemical etching of submicrometer gratings in single-crystalline GaAs. [Pg.109]

The new competitive methods of making photomasks with semitransparent submicron size elements on the basis of contact, single photolithography or of the modified resistless (maskless) technology are proposed (4,13,18, 29-31). [Pg.356]

The smaller sensor matrix (e.g., a 4 x 4 matrix) is made by physically cutting the large matrix. Furthermore, if the nonrectangular shape of sensors is needed, it can be made by cutting as long as the shape is convex. Such a maskless process scheme should reduce the manufacturing costs drastically. [Pg.534]


See other pages where Maskless is mentioned: [Pg.385]    [Pg.57]    [Pg.308]    [Pg.9]    [Pg.115]    [Pg.34]    [Pg.36]    [Pg.56]    [Pg.385]    [Pg.361]    [Pg.214]    [Pg.492]    [Pg.497]    [Pg.500]    [Pg.114]    [Pg.225]    [Pg.248]    [Pg.291]    [Pg.475]    [Pg.194]    [Pg.56]    [Pg.1851]    [Pg.2082]    [Pg.275]    [Pg.200]    [Pg.207]    [Pg.347]    [Pg.350]    [Pg.467]    [Pg.7]    [Pg.8]    [Pg.142]    [Pg.20]    [Pg.379]    [Pg.7]    [Pg.32]   
See also in sourсe #XX -- [ Pg.74 , Pg.75 , Pg.76 , Pg.77 ]




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Maskless EMM

Maskless array synthesizer

Maskless lithography

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