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Protective masking

Health Hazards Information - Recommended Personal Protective Equipment Dust mask, protective... [Pg.347]

In choosing method(s) to control exposure, COSHH limits the use of personal protective equipment (e.g. respirators, dust masks, protective clothing) as the means of protection to those situations only where other measures cannot adequately control exposure. [Pg.102]

Gloves, nitrile and latex Tyvek spray suit Respirator or dust mask Protective eye wear, goggles or glasses... [Pg.208]

Field protection A properly fitting protective mask protects the respiratory... [Pg.40]

Required level of protection Protective mask protective clothing in unusual situations... [Pg.245]

CBR-proof shelters, masks, protective clothing and public instruction are an important part of defense plans. [Pg.246]

The artist and the chemist should take the same precautions when chemical substances are present. As can be seen in Table 10.1, it is prudent to wear goggles and a fireproof apron when working with any chemicals. Because many chemicals are skin irritants, the use of gloves is wise. If powders or gases are present, a face mask protects lung and nasal tissue. [Pg.360]

Fig. 19. Core functionalized mondendron, where Y may be either a masked/protected nucleophilic or electrophilic moiety, GD = branch cell coupling, = branch cell juncture and Z = surface groups... Fig. 19. Core functionalized mondendron, where Y may be either a masked/protected nucleophilic or electrophilic moiety, GD = branch cell coupling, = branch cell juncture and Z = surface groups...
Properties Odorless, yellow crystalline solid. Sp. gr. 1,648 at 20°. M. P. 195°. Boils with decomposition at 410° under normal pressure. Corrosive to metals. A nonpersistent, very violent sternutator, similar to diphenylchlorarsine but much simpler to manufacture. Requires dust filter in gas-mask protection. [Pg.62]

Currendy fielded individual protective equipment includes the MK-V, MCU-2P, M40-A1, and M4-2 masks. Protection is provided by high-efficiency filtration (BW agents) and chemisorption onto activated charcoal filters (CW agents). Future technology may include the use of reactive and regenerative filters in masks. Similar technology is employed in the collective protection units to cap-... [Pg.177]

Employ physical measures Face masks, protective clothing, shelters Mobilize personnel and resources Epidemiologists, laboratories, vaccines, drugs... [Pg.74]

One filter-pair or filter canister per mask. Protective mask PLL parts. [Pg.70]

The M17 chemical and biological protective mask assembly includes the mask, the M15A1 carrier, two lens outserts, and the Ml waterproofing bag. It is made of molded rubber with filter elements in each cheek, plastic eye lenses, and a voice emitter outlet valve in the front. The A1 and A2 models include the capability to drink water while masked. The mask protects the wearer s face, eyes, and respiratory tract against field concentrations of CB agents. The M40 Protective Mask is replacing the M17 Mask. See FM 3-5 for filter exchange rates. [Pg.257]

Carbon Tetrachloride Organic vapor canister with full face mask protective clothing rubber gloves. Immediately remove to fresh air, keep patient warm and quiet and get medical attention promptly. Start artificial respiration if breathing stops. Flush with plenty of water. Remove contaminated clothing and wash before reuse. Hush with plenty of water for eyes get medical attention. [Pg.298]

Copper Cyanide Dust respirator protective goggles or face mask protective clothing. Remove victim to fresh air. Rush with water wash with soap and water. Rush with water for at least 15 minutes. [Pg.303]

Sodium Dichromate Approved dust mask, protective gloves, goggles or face shield. Treat like acid burns. Treat like acid burns. Flush eyes for at least 15 minutes. [Pg.353]

Because these heads exhibit superior directionality, features produced by gaps may be fabricated down to 5 jm. In Figure 5.4.2(b), an example of a printed wax etch mask is displayed. The line width is 40 jm and the smallest spacing between two printed lines is 5 pm. The printed wax features work as an etch mask protecting the material that needs to remain on the substrate. The exposed material is etched, and the mask is stripped. The etched features are displayed in Figure 5.4.2(c). [Pg.422]


See other pages where Protective masking is mentioned: [Pg.287]    [Pg.33]    [Pg.80]    [Pg.92]    [Pg.153]    [Pg.200]    [Pg.326]    [Pg.353]    [Pg.358]    [Pg.398]    [Pg.553]    [Pg.1163]    [Pg.338]    [Pg.821]    [Pg.287]    [Pg.245]    [Pg.354]    [Pg.389]    [Pg.87]    [Pg.73]    [Pg.184]    [Pg.512]    [Pg.191]    [Pg.2577]    [Pg.29]    [Pg.177]    [Pg.258]    [Pg.356]    [Pg.33]   
See also in sourсe #XX -- [ Pg.95 ]




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