Magnetron configurations

Fig. 5.25. Dual magnetron configuration for MF reactive magnetron transitionmode sputtering. Fast PEM control of the reactive gas flow inlet is applied via a piezoelectric valve for the gas inlet between the targets is used. Either all oxygen can be introduced between the cathodes or the total flow can be divided such that most of the reactive gas is introduced via the outer gas lines...

The influence of the surface area of cathode on the plasma deposition rate is shown in Figure 15.27. It is clear that the plasma deposition rate decreases with the increase of cathode surface area. This is because plasma deposition rate is proportional to current density in cathodic polymerization as described in Chapter 8. The patterns of distribution due to magnetron configuration are similar, but the trends are magnified as the deposition rate increases with smaller cathode area. 

Anode Cathode Anode Figure 4-18. Magnetron configuration of glow... 

Sputter is a non-thermal PVD process whereby atoms are accelerated from a plasma, or also from what is known as an ion gun . Deposition takes place when particles are vaporized from a surface. The sputtered particles are projected from sources known as magnetrons where the plasma is magnetically localized near the target surface. A balanced magnetron configuration will project ions from the plasma to the target surface. 

Figure 5.7 Some Single Magnetron and Multiple Magnetron Configurations...

Cylindrical (hollow) magnetron (sputtering) A hollow cylindrical tube, often with ends flared toward the interior, where a magnetic field confines the secondary electrons emitted from the inside surface to paths parallel to the axis of the tube (magnetron configuration). The flares prevent the loss of the electrons from the ends of the tube. See also Magnetron. 

Magnetron, hemispherical A magnetron configuration where the target surface is the interior surface of a hemispherical section. The anode is often positioned around the lip of the hemisphere. 

Magnetron, planar A magnetron configuration where the target surface is a planar surface and the magnetic field is in a configuration such that it is round or oval. The sputter-erosion track resembles a Racetrack. 

Magnetron, post A magnetron configuration that is a post, perhaps with flares on the ends (spool), with a magnetic field either axial to the post or in a series of looped magnetic fields around the post. The electrons are confined along the surface of the post and between the flared ends. Also called a Spool magnetron. 

Magnetron, rotatable cylindrical A planar-like magnetron configuration where the target... 

Magnetron, unbalanced (sputtering) A magnetron configuration in which the magnetic... 

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