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Anode magnetron configurations

ANODE MAGNETRON FOR CATHODIC POLYMERIZATION 4.1. Effect of Magnetic Field Configuration... [Pg.326]

The distribution of the deposition rate in an AMC plasma polymerization system with PM, OM, or NM anodes is shown in Figure 15.25. These results show that the anode magnetron shifts the deposition pattern to high in the center of the cathode. The edge effect diminishes but a small peak appears in the center. The distribution with OM configuration seems to be more uniform than that with PM configuration, but because of the uniformity the deposition rate at center portion is slightly lower. [Pg.328]

Anode Cathode Anode Figure 4-18. Magnetron configuration of glow... [Pg.174]

Magnetron, hemispherical A magnetron configuration where the target surface is the interior surface of a hemispherical section. The anode is often positioned around the lip of the hemisphere. [Pg.651]

Figure 15.24 Schematic diagram of different magnetic field configurations on the backside of anode electrodes (a) parallel magnetic field configuration (PM), (b) opposite magnetic field configuration (OM), and (c) no magnetron (NM). Figure 15.24 Schematic diagram of different magnetic field configurations on the backside of anode electrodes (a) parallel magnetic field configuration (PM), (b) opposite magnetic field configuration (OM), and (c) no magnetron (NM).

See other pages where Anode magnetron configurations is mentioned: [Pg.326]    [Pg.368]    [Pg.326]    [Pg.368]    [Pg.19]    [Pg.19]    [Pg.312]    [Pg.332]    [Pg.223]    [Pg.327]    [Pg.327]    [Pg.175]    [Pg.509]    [Pg.33]    [Pg.252]    [Pg.252]   
See also in sourсe #XX -- [ Pg.328 ]




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