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Laser-SNMS

Surface and Thin Film Analysis Principles, Instrumentation, Applications [Pg.132]

Edited by H. Bubert and H. Jenett Copyright 2002 Wiley-VCH Verlag GmbH ISBNs 3-527-30458-4 (Hardback) 3-527-60016-7 (Electronic) [Pg.132]


Although the RSF contains matrix-dependent quantities, their variations are damped to some extent by virtue of taking ratios, and in practice the RSF is assumed constant for low concentrations of A (e. g. <1 atom%). It can be evaluated from measurements on a well-characterized set of standards containing A in known dilute concentrations. The accuracy of the method, however, is not as high as in laser-SNMS and XPS. [Pg.93]

SNMS is suitable for quantitative element depth profiling of metallic and electrically insulating samples. Laser-SNMS enables the additional acquisition of 2D element distributions with HF-plasma SNMS bulk analysis is also feasible. [Pg.123]

Surface analysis by non-resonant (NR-) laser-SNMS [3.102-3.106] has been used to improve ionization efficiency while retaining the advantages of probing the neutral component. In NR-laser-SNMS, an intense laser beam is used to ionize, non-selec-tively, all atoms and molecules within the volume intersected by the laser beam (Eig. 3.40b). With sufficient laser power density it is possible to saturate the ionization process. Eor NR-laser-SNMS adequate power densities are typically achieved in a small volume only at the focus of the laser beam. This limits sensitivity and leads to problems with quantification, because of the differences between the effective ionization volumes of different elements. The non-resonant post-ionization technique provides rapid, multi-element, and molecular survey measurements with significantly improved ionization efficiency over SIMS, although it still suffers from isoba-ric interferences. [Pg.132]

Resonant (R-) laser-SNMS [3.107-3.112] has almost all the advantages of SIMS, e-SNMS, and NR-laser-SNMS, with the additional advantage of using a resonance laser ionization process which selectively and efficiently ionizes the desired elemental species over a relatively large volume (Eig. 3.40 C). Eor over 80% of the elements in the periodic table, R-laser-SNMS has almost unity ionization efficiency over a large volume, so the overall efficiency is greater than that of NR-laser-SNMS. Quantification is also simpler because the unsaturated volume (where ionization is incom-... [Pg.132]

A versatile Laser-SNMS instrument consists of a versatile microfocus ion gun, a sputtering ion gun, a liquid metal ion gun, a pulsed flood electron gun, a resonant laser system consisting of a pulsed Nd YAG laser pumping two dye lasers, a non-resonant laser system consisting of a high-power excimer or Nd YAG laser, a computer-controlled high-resolution sample manipulator on which samples can be cooled or heated, a video and electron imaging system, a vacuum lock for sample introduction, and a TOF mass spectrometer. [Pg.135]

Values of Y (X (A)) for elements typically range from 10 to 10 in NR-laser-SNMS, and from 10 to 10 in R-laser-SNMS. If the experimental conditions are not well known, the concentration of A can also be quantified by using the relative sensitivity factor (RSF) method (Eqs (3.8) and (3.9) in Sect. 3.1.3). [Pg.136]

Fig. 3.42. Non-resonant laser-SNMS spec- riety oftransition metals and hydrocarbons trum ofa Si wafer contaminated with a va- [3.105]. Fig. 3.42. Non-resonant laser-SNMS spec- riety oftransition metals and hydrocarbons trum ofa Si wafer contaminated with a va- [3.105].
Element mapping with non-resonant laser- SNM S can be used to investigate the structure of electronic devices and to locate defects and microcontaminants [3.114]. Typical SNMS maps for a GaAs test pattern are shown in Fig. 3.43. In the subscript of each map the maximum number of counts obtained in one pixel is given. The images were acquired by use of a 25-keV Ga" liquid metal ion source with a spot size of approximately 150-200 nm. For the given images only 1.5 % of a monolayer was consumed -"static SNMS". [Pg.137]

Tab. 3.1. NR-laser-SNMS Relative sensitivity factors S (Me, ESi) and detection limits DL for metals on Si wafer surfaces. Tab. 3.1. NR-laser-SNMS Relative sensitivity factors S (Me, ESi) and detection limits DL for metals on Si wafer surfaces.
Fig. 3.43. Non-resonant laser-SNMS mapping of a contact test structure on GaAs. Field of view 40 x 40 pm [3.114],... Fig. 3.43. Non-resonant laser-SNMS mapping of a contact test structure on GaAs. Field of view 40 x 40 pm [3.114],...
Fig. 3.45. R-laser-SNMS images of copper around (a) tellurium and (b) cadmium inclusions [3.116]. Fig. 3.45. R-laser-SNMS images of copper around (a) tellurium and (b) cadmium inclusions [3.116].

See other pages where Laser-SNMS is mentioned: [Pg.132]    [Pg.132]    [Pg.132]    [Pg.132]    [Pg.133]    [Pg.133]    [Pg.133]    [Pg.133]    [Pg.135]    [Pg.135]    [Pg.136]    [Pg.136]    [Pg.137]    [Pg.137]    [Pg.139]    [Pg.139]    [Pg.139]    [Pg.139]    [Pg.141]    [Pg.141]   
See also in sourсe #XX -- [ Pg.912 , Pg.913 , Pg.914 ]




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