Kodak 809 resist

Figure 3.48. UV transmission characteristics of dyed PMMA and Kodak 809 resist as a function of wavelength. Reproduced with permission from r erence 173. Copyright 1984 Society of Photo-Optical Instrumentation Engineers.)...

CHj groups on the outside which are quite inert chemically These represent Eastman Kodak resists. 

Most polyesters (qv) are based on phthalates. They are referred to as aromatic-aHphatic or aromatic according to the copolymerized diol. Thus poly(ethylene terephthalate) [25038-59-9] (PET), poly(butyelene terephthalate) [24968-12-5] (PBT), and related polymers are termed aromatic-aHphatic polyester resins, whereas poly(bisphenol A phthalate)s are called aromatic polyester resins or polyarylates PET and PBT resins are the largest volume aromatic-aHphatic products. Other aromatic-aHphatic polyesters (65) include Eastman Kodak s Kodar resin, which is a PET resin modified with isophthalate and dimethylolcyclohexane. Polyarylate resins are lower volume specialty resins for high temperature (HDT) end uses (see HeaT-RESISTANT POLYAffiRS). 

This polymer has a slightly stiffer chain and hence slightly higher melting point and heat distortion temperatures than poly(ethylene terephthalate). Films are available (Kodel-Kodak) which have been biaxially stretched about 200% from polymer with molecular weights of about 25 000. They are similar electrically to poly(ethylene terephthalate), are weaker mechanically but have superior resistance to water and in weathering stability. Some properties are given in Table 25.6. 

The most familiar negative photoresists are examples of two-component, resist materials. These include Kodak s KTFR, Merck s Selectilux N, Hunt s HNR, etc., all of which consist of a cyclized synthetic rubber matrix resin which is radiation insensitive but forms excellent films. This resin is combined with a bis-arylazide sensitizer. 

Phenanthrene purified by the sodium treatment was found superior to that from the azeotropic distillation, but both products gave satisfactory results. A good grade of commercially available phenanthrene ( white label grade supplied by the Eastman Kodak Company), although recrystallized and treated with Raney nickel, resisted hydrogenation under the described conditions. 

Microresist 700 Series Waycoat HNR HR Series Selectilux N OMR Series ON NR Series Isopoly Negative Resists Eastman Kodak Phillip A. Hunt E. M. Chemicals Dynachem (Tokyo Ohka) Tokyo Ohka Microimage Technology... 

Leo Baekeland to meet with him one fateful day back in 1898. "Come in, come in, Dr. Baekeland, the founder of the Kodak empire said to his Belgian guest. "I think you will find this chair very comfortable. The meeting went well, and as a result we now have plywood, particle board, heat-resistant pot handles, heat shields for spacecraft, beautiful old radios, and a fascinating story. 

Dimethyldioctadecylammonium bromide was obtained from Kodak and used without further purification. Chloroform was used as the spreading solvent and was redistill before use. All other chemicals were of analytical grade and used as received. The water used as a subphase was of Milli-Q grade with a resistivity higher than 18 M cm. 

Bol, 1.1. High Resolution Optical Lithography Using Dyed Single-Layer Resist In Proceedings of Kodak Microelectronics Seminar-Interface 84 Eastman Kodak Rochester, NY, 1984. 

It is heat seal resistant unless produced as a coextrusion or coated. A good barrier to most gases and volatiles, but only fair to moisture. It is easily metallised. Found as PETP and PETG (Kodak), Pet G contains an additional glycol molecule. 

Commercial PCTG/PC blends (Ektar DA series, Eastman Kodak) have been used in lawn and garden equipment, floor care appliance parts, sterilizable medical equipment, etc., where their combination of clarity, toughness, chemical resistance, heat resistance, UV and gamma radiation resistance have been well utilized. Molded parts... 

Resists as different as naturally occurring colloids (such as gelatin, albumin, and shellac) or synthetic polymers (such as polyvinyl alcohol, polyacrylics, polyvinyl pyrrolidone, and polyvinyl hutyral) rendered photosensitive by dichromate or other means, as well as synthetic photosensitive polymers such as polyvinyl cinnamates (Kodak positive resists), diazonaphthoquinone/novolac, and solid-film resists such as Riston (introduced by Dupont in 1968) have all been used in PCB fabrication. Some of these resists are still being used today. 

Scheme 6.5 Synthetic scheme of 2,6-bis(4-azidobenzal)-4methylcyclohexanone (IX)(Hans Wagner s bis-aryl azide that was the basis of Kodak s KTFR resist system).

Stover, M. Nagler, I. Bol, and V. MiUer, Submicron optical lithography i hne lens photo resist technology, Proc. SPIE 470, 22 33 (1984) I. Bol, High resolution optical hthography using dyed single resist, in Kodak Microelectronics Seminar Interface 84, pp. 19 22 (1984). 

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