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Layer, inversion

Figure Bl.22.4. Differential IR absorption spectra from a metal-oxide silicon field-effect transistor (MOSFET) as a fiinction of gate voltage (or inversion layer density, n, which is the parameter reported in the figure). Clear peaks are seen in these spectra for the 0-1, 0-2 and 0-3 inter-electric-field subband transitions that develop for charge carriers when confined to a narrow (<100 A) region near the oxide-semiconductor interface. The inset shows a schematic representation of the attenuated total reflection (ATR) arrangement used in these experiments. These data provide an example of the use of ATR IR spectroscopy for the probing of electronic states in semiconductor surfaces [44]-... Figure Bl.22.4. Differential IR absorption spectra from a metal-oxide silicon field-effect transistor (MOSFET) as a fiinction of gate voltage (or inversion layer density, n, which is the parameter reported in the figure). Clear peaks are seen in these spectra for the 0-1, 0-2 and 0-3 inter-electric-field subband transitions that develop for charge carriers when confined to a narrow (<100 A) region near the oxide-semiconductor interface. The inset shows a schematic representation of the attenuated total reflection (ATR) arrangement used in these experiments. These data provide an example of the use of ATR IR spectroscopy for the probing of electronic states in semiconductor surfaces [44]-...
When Uq3 > Up the MOSEET conducts. The conduction current is deterrnined by 1 where Q is the amount of charge in the inversion layer and t is the transit time for electrons to travel from source to drain. Q = C LW (U g — Up) where C = is the gate oxide capacitance per unit area... [Pg.352]

As k g increases, the depletion width at the drain junction grows and can accommodate more charge. Thus, less charge is needed in the inversion layer to balance the gate charge. Because the surface potential at the drain edge of the channel is k g, when U g — < Up inversion can no longer be... [Pg.352]

Temperature Inversion in meteorology, a departure from the normal decrease of temperature with increasing altitude such that the temperature is higher at a given height in the inversion layer than would be expected from the temperature below the layer. This warmer layer leads to increased stability and limited vertical mixing of air. [Pg.550]

Fumigation The result of a pollutant being trapped under or in an inversion layer, or the process of using poisonous gases to kill insects. [Pg.1444]

Mixing height The height above an internal or external pollutant source within which emitted pollutants are dispersed and mixed with the surrounding atmosphere. In meteorological terms, this is the area below the inversion layer. [Pg.1460]

Atmospheric information, including local climate (precipitation, temperature, wind speed and direction, presence of inversion layers), weather extremes (storms, floods, winds), release characteristics (direction and speed of plume movement, rate, amount, and temperature of release, relative densities), and types of atmospheric hazards and hazards assessment... [Pg.601]

Figure 7.4 Band bending at the interface between a semiconductor and an electrolyte solution (a)-(c) n-type semiconductor (a) enrichment layer, (b) depletion layer, (c) inversion layer (d)-(f) p-t.ype semiconductor (d) enrichment layer, (e) depletion layer, (f) inversion layer. Figure 7.4 Band bending at the interface between a semiconductor and an electrolyte solution (a)-(c) n-type semiconductor (a) enrichment layer, (b) depletion layer, (c) inversion layer (d)-(f) p-t.ype semiconductor (d) enrichment layer, (e) depletion layer, (f) inversion layer.
Atmospheric and Terrain Parameters In addition to terrain parameters, basic atmospheric parameters are listed below. There can be many other meteorological effects which can be important in some circumstances (e.g., inversion layers) and are beyond the scope of this introduction. [Pg.63]

But even in a homogeneously doped material an etch stop layer can be generated by an inhomogeneous charge carrier distribution. If a positive bias is applied to the metal electrode of an MOS structure, an inversion layer is formed in the p-type semiconductor. The inversion layer passivates in alkaline solutions if it is kept at the PP using a second bias [Sm5], as shown in Fig. 4.16b. This method is used to reduce the thickness variations of SOI wafers [Og2]. Illuminated regions... [Pg.71]

To illustrate the application of the Monte Carlo method, we consider the problem of simulating the dispersion of material emitted from a continuous line source located between the ground and an inversion layer. A similar case has been considered by Runca et al. (1981). We assume that the mean wind u is constant and that the slender-plume approximation holds. The line source is located at a height h between the ground (z = 0) and an inversion layer (z = Zi). If the ground is perfectly reflecting, the analytical expression for the mean concentration is found by integrating the last entry of Table II over y from -< to -Hoo. The result can be expressed as... [Pg.291]

Fig. 5-44. Space charge layers of n-type semiconductor electrodes (c) an inversion layer, (d) a deep depletion layer. Fig. 5-44. Space charge layers of n-type semiconductor electrodes (c) an inversion layer, (d) a deep depletion layer.
As the potential Ai )sc of an inversion layer increases and as the Fermi level at the electrode interface coincides with the band edge level, the electrode interface is in the state of degeneracy (Fermi level pinning) and both the capacity Csc and the potential A4>sc are maintained constant. Figure 5-48 shows schematically the capacity of a space charge layer as a function of electrode potential. As the electrode potential shifts in the anodic (positive) direction from a cathodic (negative) potential, an accumulation, a depletion, and an inversion layer are successively formed here, the capacity of the space charge layer first decreases to a minimum and then increases to a steady value. [Pg.179]

Fig. 6-48. Differential capacity of a space charge layer of an n-type semiconductor electrode as a function of electrode potential solid cunre = electronic equilibrium established in the semiconductor electrode dashed curve = electronic equilibrium prevented to be established in the semiconductor electrode AL = accumulation layer DL = depletion layer IL = inversion layer, DDL - deep depletion layer. Fig. 6-48. Differential capacity of a space charge layer of an n-type semiconductor electrode as a function of electrode potential solid cunre = electronic equilibrium established in the semiconductor electrode dashed curve = electronic equilibrium prevented to be established in the semiconductor electrode AL = accumulation layer DL = depletion layer IL = inversion layer, DDL - deep depletion layer.
LD. ff is in the order of 100 nm. In contrast, the thickness of the accumulation and inversion layers, in which the mobile charge carriers (electrons or holes) are concentrated, is in the order of 5 to 10 nm and is much thinner than the thickness of the depletion layer. [Pg.181]


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