Homoepitaxial metal deposition

Homoepitaxial metal deposition epitaxial metal deposition... 

Epitaxial metal deposition — In an epitaxial deposition the crystal lattice of the substrate is continued in the deposit. In homoepitaxy the substrate and the growing film... 

As discussed in Section 6.2.2, previously studied methods for electrodeposition of metal sulfide thin films involve either chemical reactions in solution to form solid particles (TS in water)42,43) or do not allow long-range homoepitaxial crystal growth (S in DMSO),37"",1) so are not suitable for deposition of ordered thin films of useful thickness. If a system where layer-by-layer... 

After having exploited the use of reconstructed metal surfaces and vicinal surfaces as templates we will now turn to metal films. Since it has been shown that the nanopatterns of the above mentioned surfaces are in many cases excellent templates for overlayer growth the same can be expected for nanostructured metal films. Indeed a number of such systems have been investigated in terms of their potential use as templates. As the first example we refer to the homoepitaxial growth of Ag on the reconstructed 2 ML thick Ag film on Pt(l 11) (see Fig. 10). Already in 1995 Brune et al. were able to show that further Ag deposition at 100 K on this specific surface leads to the ordered growth of Ag islands [169,170]. Later it was reasoned that the ordering occurs due to the confined nucleation of adatoms within the superstructure cells of the periodic surface dislocation network [171]. The same effect is also present for the deposition of mass select Ag7 clusters [172] and Fe film growth on 2 ML Cu on Pt(l 1 1) [170]. 

Once again, polarised microscopy appears to be the best all-round technique because of its high resolution coupled with its imaging facility over a wide field of view. There are a number of variants, involving liquid crystal alignment (43,44), vacuum evaporation of a metal layer (45,46) and homoepitaxial deposition of a thick LB film (32). Of these, the last is least damaging to the monolayer, least subject to artefacts and least difficult to interpret, and has produced evidence for several types of anisotropic behaviour. 

The above findings are directly relevant to the study of diacetylene films. Since homoepitaxy does not occur in the presence of multivalent metal ions, the emphasis should be shifted to materials which can be deposited on a pure water subphase - some have already been demonstrated. It is predicted that these materials will also display heteroepitaxy with fatty acid monolayers. 

A well-known practical example of homoepitaxy is the deposition, by CVD vapor phase epitaxy, of a single crystal Si film on a Si wafer. This is one of the primary steps in the manufacture of bipolar transistors and some metal-oxide semiconductor (MOS) transistors. Explain why an epitaxial Si film on Si is deposited while the Si substrate alone could well suffice as the material for the required electronic and mechanical response ... 

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