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Germanium state

The oxidation state -1-4 is predominantly covalent and the stability of compounds with this oxidation state generally decreases with increasing atomic size (Figure 8.1). It is the most stable oxidation state for silicon, germanium and tin, but for lead the oxidation state +4 is found to be less stable than oxidation state +2 and hence lead(IV) compounds have oxidising properties (for example, see p. 194). [Pg.162]

The concept of oxidation states is best applied only to germanium, tin and lead, for the chemistry of carbon and silicon is almost wholly defined in terms of covalency with the carbon and silicon atoms sharing all their four outer quantum level electrons. These are often tetrahedrally arranged around the central atom. There are compounds of carbon in which the valency appears to be less than... [Pg.162]

Silicon, germanium, tin and lead can make use of unfilled d orbitals to expand their covalency beyond four and each of these elements is able (but only with a few ligands) to increase its covalency to six. Hence silicon in oxidation state -f-4 forms the octahedral hexafluorosilicate complex ion [SiFg] (but not [SiCl] ). Tin and lead in oxidation state -1-4 form the hexahydroxo complex ions, hexahydroxostannate(IV). [Sn(OH) ] and hexahydroxoplum-bate(IV) respectively when excess alkali is added to an aqueous solution containing hydrated tin(IV) and lead(IV) ions. [Pg.163]

Areen silicon and germanium are ascribed to the d electron states silicon does not have 3 d electrons, whereas germanium does. Certain transitions (e.g. carbon /3 hn) do depend upon the d character of the electronic configuration in contrast to subsequent isitions. [Pg.178]

The element is a gray-white metalloid. In its pure state, the element is crystalline and brittle, retaining its luster in air at room temperature. It is a very important semiconductor material. Zone-refining techniques have led to production of crystalline germanium for semiconductor use with an impurity of only one part in lOio. [Pg.93]

Interface states played a key role in the development of transistors. The initial experiments at Bell Laboratories were on metal/insulator/semiconductor (MIS) stmctures in which the intent was to modulate the conductance of a germanium layer by applying a voltage to the metal plate. However, only - 10% of the induced charges were effective in charging the conductance (3). It was proposed (2) that the ineffective induced charges were trapped in surface states. Subsequent experiments on surface states led to the discovery of the point-contact transistor in 1948 (4). [Pg.348]

Considerable interest in the sohd-state physics of sihcon carbide, that is, the relation between its semiconductor characteristics and crystal growth, has resulted from the expectation that SiC would be useflil as a high temperature-resistant semiconductor in devices such as point-contact diodes (148), rectifiers (149), and transistors (150,151) for use at temperatures above those where sihcon or germanium metals fail (see Semiconductors). [Pg.468]

The thyristor is a semiconductor device made of germanium or silicon wafers and comprises three or more Junctions, which can be switched from the OFF state to the ON state or vice versa. Basically it is a ptipn junction, as shown in Figure 6.20(a) and can be considered as composed of two transistors with npn and pnpjunctions, as illustrated in Figure 6.20(b). It does not turn ON when it is forward biased, unlike a diode, unless there is a gate firing pulse. Thyristors are forced commutated (a technique... [Pg.114]

Zhang Weihan, Yan Shuxia, Ji Zhijiang. Effective segregation coefficient and steady state segregation coefficient of germanium in Czochralski silicon. J Cryst Growth 169 598, 1996. [Pg.931]

Germanium In situ STM studies on Ge electrodeposition on gold from an ionic liquid have quite recently been started at our institute [59, 60]. In these studies we used dry [BMIM][PF<3] as a solvent and dissolved Gel4 at estimated concentrations of 0.1-1 mmol 1 the substrate being Au(lll). This ionic liquid has, in its dry state, an electrochemical window of a little more than 4 V on gold, and the bulk deposition of Ge started several hundreds of mV positive from the solvent decomposition. Furthermore, distinct underpotential phenomena were observed. Some insight into the nanoscale processes at the electrode surface is given in Section 6.2.2.3. [Pg.304]

Consider each of the following in the solid state sodium, germanium, methane, neon, potassium chloride, water. Which would be an example of... [Pg.318]

State which atom of each of the following pairs is more electropositive (a) potassium, rubidium (b) germanium, bromine (c) oxygen, selenium (d) aluminum, silicon. [Pg.738]

If the assumption is made that the bond orbitals and one metallic orbital (except for the state with maximum valence, which has no metallic orbital) have the same hybrid character, values of the radii for the various pure valence states of the metals of the first ascending branch, from copper to germanium, can be calculated by use of equations (10c) and (10d). These values are given in table 6. There are also given the values interpolated for resonance between the state of maximum valency (with no metallic orbital) and the next state (with valency two less, and with a metallic orbital) in the ratio 25 75, the number of orbitals being included in the calculation as a weight factor. [Pg.385]

The start of the solid-state electronic industry is generally recognized as 1947 when Bardeen, Brattain, and Shockley of Bell Telephone Laboratories demonstrated the transistor function with alloyed germanium. The first silicon transistor was introduced in 1954 by Texas Instruments and, in 1956, Bell Laboratories produced the first diffused junction obtained by doping. The first-solid state transistor diodes and resistors had a single electrical function and were (and still are) known as discrete devices. [Pg.345]

The state of the synthetic art in this area, in 1979, is much more satisfactory. During the past decade, several new synthetic developments have occurred such that we are closer to the point where the limitations upon synthesis of trifluoromethyl compounds are related more to stability problems in isolated cases, and are not nearly so much due to lack of widely applicable synthetic techniques. We find ourselves, for example, in a position in 1979 where the germanium compound, Ge(CF3)4, which in the past decade, was considered by many workers to be of insufficient stability to permit isolation, has been prepared by four independent methods and is known to be stable to over 100°C. Many of these new synthetic techniques have emerged from studies conducted in our laboratory at the University of Texas and previously... [Pg.178]


See other pages where Germanium state is mentioned: [Pg.189]    [Pg.434]    [Pg.162]    [Pg.37]    [Pg.276]    [Pg.278]    [Pg.280]    [Pg.281]    [Pg.294]    [Pg.344]    [Pg.345]    [Pg.512]    [Pg.320]    [Pg.421]    [Pg.219]    [Pg.432]    [Pg.117]    [Pg.673]    [Pg.174]    [Pg.8]    [Pg.255]    [Pg.260]    [Pg.294]    [Pg.403]    [Pg.32]    [Pg.198]    [Pg.1100]    [Pg.76]    [Pg.340]    [Pg.343]    [Pg.58]    [Pg.146]    [Pg.199]    [Pg.231]    [Pg.215]   
See also in sourсe #XX -- [ Pg.37 , Pg.39 ]

See also in sourсe #XX -- [ Pg.37 , Pg.39 ]




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