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Galvanostatic electrodeposition

Desai JD (1999) Galvanostatic electrodeposition of Bi2Sc3 thin films. BuU Electrochem 15 ... [Pg.149]

Fig. 7.5. Galvanostatic electrodeposition of PPy containing anti-IgG onto gold electrode (0.5 M Py, 0.1 mg ml anti-IgG in PBS, pH 7.2, current density = 1 mA cm ). Fig. 7.5. Galvanostatic electrodeposition of PPy containing anti-IgG onto gold electrode (0.5 M Py, 0.1 mg ml anti-IgG in PBS, pH 7.2, current density = 1 mA cm ).
FIGURE 20.9 Average growth height versus deposition time for zinc galvanostatic electrodeposition at 20 A dm-2. [Pg.490]

The observation of metal crystals at two different size scales has been used to identify microdefects in the polymer structure. Thus the largest amount of defects (5 x 10 cm ) is found in PANI layers synthesized at constant potential, whereas use of the RSWP procedure results in PANI with the lowest amount of microdefects (2.6 x lO cm ). An interesting example demonstrating clearly the inhomogeneity of the polymer surface was recently obtained in smdies on copper galvanostatic electrodeposition on thick PEDOT layers [195]. [Pg.307]

Popov KI, Maksimovic MD, Totovski DC, Nakic VN (1983) Some aspects of current dcmsily distribution in electrolytic cells I dendritic growth of cadmium at the cathode edge in galvanostatic electrodeposition. Surf Technol 19 173-180... [Pg.140]

Equations (6.10) and (6.11) are valid in the hydrogen evolution range at overpotentials lower than the critical one for the change of the growth of dendrites. The situation is dramatically different in galvanostatic electrodeposition of powder. In this case, due to the increase of the surface coarseness, the low increase of the limiting diffusion current density caused by the increase of the surface area of a... [Pg.219]

Fig. 6.11 (a) Particle size distribution curves for Cu powders obtained by potentiostatic electrodeposition on Pt electrodes, (b) particle size distribution curves for Cu powders obtained by galvanostatic electrodeposition on Pt electrodes. The surface area of the electrode 0.63 cm and (c) particle size distribution curves for Cu powders obtained by the potentiostatic and galvanostatic (the average current in the potentiostatic regime) electrodepositions on Cu electrodes. The surface area of the electrode 0.63 cm (Reprinted from Refs. [6, 7, 62] with kind permission from Springer)... [Pg.226]

Anyway, the effect of the increasing current density in the galvanostatic electrodeposition is qualitative same as the increase of overpotential in potentiostatic electrodeposition, and the essence of the particle size distribution curve formation is the same in both cases. [Pg.227]

Kozlov et al. [176] prepared polycrystalline GaAs by the sequential galvanostatic electrodeposition of layers of Ga from alkaline and As from acidic solutions. The two-layer electrodeposit was annealed to form GaAs by reaction-diffusion. The Ga diffusion coefficient was determined to be in the temperature range of 80-190 "C. [Pg.1938]

Tsuda and Hussey [196] examined the galvanostatic electrodeposition of AlxInySbioo-x-y in a Lewis acidic AlCL-l-ethyl-3-methylimidazolium chloride (2 1) ionic liquid containing In(I) and Sb(III). The deposits obtained at a high applied current density are most likely mixtures of ALIUySbioo-x-y and InSb. [Pg.1940]

This effect in galvanostatic electrodeposition will be in the opposite direction. It was shown by Maksimovic et al. [20, 21] that the... [Pg.129]

Fig. 3.23 Particle size distribution curves for copper powders obtained by galvanostatic electrodeposition on platinum electrodes. Surface area of the electrode 0.63 cm (Reprinted from [6, 83] with permission from Springer.)... Fig. 3.23 Particle size distribution curves for copper powders obtained by galvanostatic electrodeposition on platinum electrodes. Surface area of the electrode 0.63 cm (Reprinted from [6, 83] with permission from Springer.)...
Fig. 3.25 The powder particles obtained by the galvanostatic electrodeposition. The current density 3,600 A/m. Fiactirai (149-177) pm and apparent density 0.524 g cm. (a) x200 (b) xlOOO, and (c) x3500. The powdtr was not sieved (Reprinted from [62] with permission frinn Serbian Chemical Society.)... [Pg.176]

Gupta and Datta developed CuNi alloys (70 30) as substrates for fabricating the anode compartment of direct ethanol fuel cells [201-202]. Surfactant assisted (i.e., 2 wt% PTFE) galvanostatic electrodeposition at 15 mA cm" was employed to deposit PtRu and PtMo on the substrate [201]. The activity of PtMo/CuNi was superior only over short time periods (below 200 s) compared to PtRu/CuNi. The reaction products were not analyzed and alkaline direct ethanol fuel cell experiments were thus far not presented using these catalysts. [Pg.224]

Figure 4.64. Mesoporous PtRu catalyst layer supported on a) RVC, b) UGF, and c) Ti mesh. Galvanostatic electrodeposition using micellar media based on Triton X-100. 20 A m 341 K [218], (With kind permission from Springer Science+Business Media Journal of Applied Electrochemistry, Direct methanol fuel cells with reticulated vitreous carbon, uncompressed graphite felt and Ti mesh anodes, 38, 2008, 51-62, Cheng T, Gyenge E, figure 7.)... Figure 4.64. Mesoporous PtRu catalyst layer supported on a) RVC, b) UGF, and c) Ti mesh. Galvanostatic electrodeposition using micellar media based on Triton X-100. 20 A m 341 K [218], (With kind permission from Springer Science+Business Media Journal of Applied Electrochemistry, Direct methanol fuel cells with reticulated vitreous carbon, uncompressed graphite felt and Ti mesh anodes, 38, 2008, 51-62, Cheng T, Gyenge E, figure 7.)...
Figure 5,3,3 Ta layer galvanostatically electrodeposited at 120°C. The current density was -0. / mA cm and the thickness of the deposited layer was approximately 120nm... Figure 5,3,3 Ta layer galvanostatically electrodeposited at 120°C. The current density was -0. / mA cm and the thickness of the deposited layer was approximately 120nm...
In 2004, Lee et al. observed a different mechanism for nanotube formation. While preparing platinum nanowires by galvanostatic electrodeposition in an unmodified AAO template, they noticed that at high current densities, the deposition process occurs quickly along the pore walls resulting in the current collector of hollow metal nanotubes. They hypothesized that this was the result of a high electric field created at the tips of the initial tube-shaped formation that results from the plasma-deposited base electrode. The rest of the deposition was then kineticaUy driven up the pore walls. This was the first demonstration of a kinetics-related mechanism. [Pg.375]

Pt-Rh/carbon fibre Galvanostatic electrodeposition Continuous Pt-Rh layer on carbon fibres 5.2 mg cm Cyclic voltammetry at 25 °C in 1.03 mM NHj-1-0.1 MKOH Peak current density 15 mA cm (scan rate n = 10 mV s 37... [Pg.367]

Pt deposited on Rh/RANEY Ni Galvanostatic electrodeposition Amorphous, boulder-like Pt deposits 10 mg cm Pt -1-1 mg cm Ru Cyclic voltammetry at 25 CinlMNHj-rlM KOH Peak current density ca. 200 mA cm (i/=10mV s ) 38... [Pg.367]

Pt/Ni Galvanostatic electrodeposition Submicron-sized Pt particles 1.0-2.0 mg cm Cyclic voltammetry at room temperature in 0.1 MNH3-tl MKOH Peak current density increased from 0.4 to 1 mA cm (y = 5 mV s ) with increasing Pt loading from 1.0 to 2.0 mg cm 45... [Pg.368]

Pt/ITO Galvanostatic electrodeposition Dispersed Pt particles, particle size 700-800 nm 0.12mgcm Cyclic voltammetry at 25 Cin0.2MNH3-l-lM KOH Peak current density 0.7 mA cm (v = 5 mV s ) 46... [Pg.369]

Pt/ITO Galvanostatic electrodeposition 3D porous flower-like Pt particles assembled by nanosheets 0.065 mg cm Cyclic voltammetry at 25°Cin0.1MNH3+lM KOH Peak current density 3.5 mA cm v= 10 mV s ) 47... [Pg.369]

Pt/glassy carbon Galvanostatic electrodeposition Pt nanoparticles with size of several nm to tens of nm within a short deposition time, or Pt nanosheets at a longer deposition time 0.007- 0.055 mg cm Cyclic voltammetry at 25 °Cin0.1MNH3-tlM KOH Peak current density increased from 0.8 to 4.6 mA cm (i/= 10 mV s ) with increasing Pt loading from 0.007 to 0.055 mg cm 49... [Pg.369]


See other pages where Galvanostatic electrodeposition is mentioned: [Pg.122]    [Pg.194]    [Pg.277]    [Pg.486]    [Pg.488]    [Pg.636]    [Pg.253]    [Pg.278]    [Pg.253]    [Pg.161]    [Pg.180]    [Pg.410]    [Pg.266]    [Pg.367]   
See also in sourсe #XX -- [ Pg.15 , Pg.15 , Pg.16 , Pg.16 , Pg.17 , Pg.17 , Pg.18 , Pg.18 , Pg.19 , Pg.19 , Pg.20 , Pg.20 , Pg.21 , Pg.21 , Pg.22 , Pg.22 , Pg.23 , Pg.23 , Pg.24 , Pg.24 , Pg.25 , Pg.25 , Pg.26 , Pg.26 , Pg.27 , Pg.27 , Pg.28 , Pg.28 , Pg.29 , Pg.29 , Pg.30 , Pg.30 , Pg.31 , Pg.32 ]

See also in sourсe #XX -- [ Pg.591 ]




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