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Film/coating formation amorphous

The solution of PDD/dichloroethane was spread over the quartz substrate and then a high quality film could be obtained. Though the as prepared film was opaque, it turned to be colored but transparent by annealing at 150 C for 48 hrs, which indicates the formation of 1-D tt-conjugated system. From the IR spectra of this film the formation of C=C bonds can be confirmed. The film was applicable for the third harmonic generation (THG) measurement. Under the UV irradiation, however, the PDD film becomes dark purple in color and less applicable for THG measurement. The film of PDEDBB was eilso obtained by a spin coating technique. X-ray diffraction pattern indicates that PDEDBB film is completely amorphous, though PDEDBB powders show some indication of crystalline diffraction. [Pg.197]

The inclusion of 5 wt% PCBM [l-(3-methoxycarbonyl)propyl-l-phe-nyl-[6,6]C6i] in the spin-coating solutions resulted in efficient polymer emission quenching for all the polythiophenes studied. The transient absorption spectra of the amorphous poly(541)/PCBM blend film. At 10 ps exhibited an absorption peak around 700 nm, similar to that observed for the poly(541) pristine film. The shape of the transient spectrum varied with time, with the absorption peak shifting from 700 nm at 10 is to 900 nm for time delays >100 (is, demonstrating the formation of two distinct transient species in the blend film. The monoexponential lifetime was t = 8 (is under Ar atmosphere and significantly shortened under 02 atmosphere. Monoexponential phase is therefore assigned to the decay of poly(541) triplet excitons. [Pg.301]

As mentioned in Sect. 2.2.1.3 [33], we proposed that a trace amount of /3-phase, induced by the use of an electron-deficient moiety (TAZ) as an end-capper for PFO, can improve device performance to give a better blue purity. Following the idea of /3-phase formation, we further proposed a novel simple physical method to generate /3-phase at a content of up to 1.32% in a PFO film spin-coated on a substrate (the remaining part is amorphous phase) by immersing it in a mixed solvent/non-solvent (tetrahydrofuran/methanol) for a few seconds [45]. The device based on PFO with 1.32% / -phase (ITO/PEDOT PSS/emitting polymer/CsF/Al) has a dramatically enhanced device efficiency and an improved blue-color purity of 3.85 cd A-1 (external quantum efficiency, 3.33%) and CIE of x+y = 0.283 (less than the limit of... [Pg.63]

To increase the wear resistance of surfaces, silicon and metals are often coated with a hard nitride, carbide, boride, or oxide film. Nanoindentation and fracture simulations have been used extensively to elucidate failure mechanisms of these typically more brittle surfaces, which include crack propagation and film delamination. Considerable attention has also focused on nanocomposite materials, which possess nanocrystalline inclusions in an otherwise amorphous matrix. The nanocrystalline component is sufficiently small to preclude the formation of stable dislocations, and thus provide a higher hardness. [Pg.1845]

Most nitride and oxynitride films are deposited at substrate temperatures much higher than 500°C. The formation reactions take place generally only between 900°C and 2500°C. Under such conditions, coating of glass is impossible. There are some exceptions, however, where it is possible to develop low temperature reactions. Thus, for instance, amorphous germanium nitride Ge3N4 has been deposited by ammonolysis of GeCl4 at substrate temperatures between 400 and 600°C [143]. Such films can be used in electronics [144]. [Pg.144]


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Film formation

Film/coating formation

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