Fabrication processes cross-linking

Eabric can be cross-linked either in the dry or the wet state. If fabric is cross-linked in the dry state, smoothness returns on tumble drying. By contrast, if fabric is cross-linked in the wet state, smoothness is achieved byline-drying the fabric. This concept has been demonstrated using formaldehyde in pad—dry—cure or wet cure processes (eq. 2) (29). 

These are water-soluble crystalline compounds sold as concentrated aqueous solutions. The methylol groups are highly reactive (118—122) and capable of being cured on the fabric by reaction with ammonia or amino compounds to form durable cross-linked finishes, probably having phosphine oxide stmctures after post-oxidizing. This finishing process, as developed by Albright Wilson, is known as the Proban process. 

THPC—Amide Process. The THPC—amide process is the first practical process based on THPC. It consists of a combination of THPC, TMM, and urea. In this process, there is the potential of polymer formation by THPC, melamine, and urea. There may also be some limited cross-linking between cellulose and the TMM system. The formulation also includes triethanolamine [102-71-6J, an acid scavenger, which slows polymerization at room temperature. Urea and triethanolamine react with the hydrochloric acid produced in the polymerization reaction, thus preventing acid damage to the fabric. This finish with suitable add-on passes the standard vertical flame test after repeated laundering (80). 

Polymers. AH nitro alcohols are sources of formaldehyde for cross-linking in polymers of urea, melamine, phenols, resorcinol, etc (see Amino RESINS AND PLASTICS). Nitrodiols and 2-hydroxymethyl-2-nitro-l,3-propanediol can be used as polyols to form polyester or polyurethane products (see Polyesters Urethane polymers). 2-Methyl-2-nitro-l-propanol is used in tires to promote the adhesion of mbber to tire cord (qv). Nitro alcohols are used as hardening agents in photographic processes, and 2-hydroxymethyl-2-nitro-l,3-propanediol is a cross-linking agent for starch adhesives, polyamides, urea resins, or wool, and in tanning operations (17—25). Wrinkle-resistant fabric with reduced free formaldehyde content is obtained by treatment with... 

Methacrylate monomers are most effective with derivatives of bisphenol A epoxy dimethacrylates, in which the methacrylate—methacrylate cross-linking reaction proceeds at a much faster pace than with styrene monomer. This proves beneficial in some fabrication processes requiring faster cure, such as pultmsion and resin-transfer mol ding (RTM). 

Catalyst Selection. The low resin viscosity and ambient temperature cure systems developed from peroxides have faciUtated the expansion of polyester resins on a commercial scale, using relatively simple fabrication techniques in open molds at ambient temperatures. The dominant catalyst systems used for ambient fabrication processes are based on metal (redox) promoters used in combination with hydroperoxides and peroxides commonly found in commercial MEKP and related perketones (13). Promoters such as styrene-soluble cobalt octoate undergo controlled reduction—oxidation (redox) reactions with MEKP that generate peroxy free radicals to initiate a controlled cross-linking reaction. 

Some fabrication processes, such as continuous panel processes, are mn at elevated temperatures to improve productivity. Dual-catalyst systems are commonly used to initiate a controlled rapid gel and then a fast cure to complete the cross-linking reaction. Cumene hydroperoxide initiated at 50°C with benzyl trimethyl ammonium hydroxide and copper naphthenate in combination with tert-huty octoate are preferred for panel products. Other heat-initiated catalysts, such as lauroyl peroxide and tert-huty perbenzoate, are optional systems. Eor higher temperature mol ding processes such as pultmsion or matched metal die mol ding at temperatures of 150°C, dual-catalyst systems are usually employed based on /-butyl perbenzoate and 2,5-dimethyl-2,5-di-2-ethyIhexanoylperoxy-hexane (Table 6). 

One concern in conventional processing is the achievement of uniform reagent appUcation and uniform cross-linking (18). An area in which adequate treatment of aU fibers is necessary is in flame-retardant finishing. One means of obtaining thorough treatment has been the use of vacuum impregnation, in which the fabric is first passed over a vacuum slot to remove air from the fabric interstices, foUowed by exposure to the phosphoms flame-retardant solution in the precondensate ammonia system (19). 

When exposed to heat, cotton fabrics, like most substances, increase in temperature to an extent that is proportional to their specific heats. Altering the chemical composition of the fabrics such that large amounts of heat are absorbed and released in repeatable cycles of controllable temperature ranges produces fabrics that are described as temperature adaptable. The process insolubili2es poly(ethylene glycol)s cross-linked with methylolamides in the cotton fabric (78). As with flame-retardant cellulose, attachment is through an ether linkage to the cellulose at a relatively low DS. 

Of the various amino-resins that have been prepared, the urea-formaldehyde (U-F) resins are by far the most important commercially. Like the phenolic resins, they are, in the finished product, cross-linked (thermoset) insoluble, infusible materials. For application, a low molecular weight product or resin is first produced and this is then cross-linked only at the end of the fabrication process. 

Polymer films that are sensitive to light, x-rays, or electrons— known as photoresists—are nsed extensively to transfer the pattern of an electronic circuit onto a semiconductor surface. Such films must adhere to the semiconductor surface, cross-link or decompose on exposure to radiation, and nndergo development in a solvent to achieve pattern definition. Virtually all aspects of photoresist processing involve surface and interfacial phenomena, and there are many outstanding problems where these phenomena mnst be controlled. For example, the fabrication of multilayer circuits requires that photoresist films of about 1-pm thickness be laid down over a semiconductor surface that has already been patterned in preceding steps. 

Cross-linking the fibers with radiation lead to durable-stretch fabrics. The fabrics can be made by any process, such as weaving and knitting, and from any combination of cross-linked, heat-resistant olefin elastic and inelastic (hard) fibers, e.g., cotton and wool. These fabrics exhibit excellent chemical resistance (e.g., chlorine or caustic resistance) and durability, that is, they retain their shape and feel (hand) over repeated exposure to processing conditions, such as stone-washing, dye-stripping, and PET-dyeing. 

Hollow and porous polymer capsules of micrometer size have been fabricated by using emulsion polymerization or through interfacial polymerization strategies [79,83-84, 88-90], Micron-size, hollow cross-linked polymer capsules were prepared by suspension polymerization of emulsion droplets with polystyrene dissolved in an aqueous solution of poly(vinyl alcohol) [88], while latex capsules with a multihollow structure were processed by seeded emulsion polymerization [89], Ceramic hollow capsules have also been prepared by emulsion/phase-separation procedures [14,91-96] For example, hollow silica capsules with diameters of 1-100 micrometers were obtained by interfacial reactions conducted in oil/water emulsions [91],... 

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