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Fabrication of Polymer Films

Part of polymers formed by chemical polymerization can deposit spontaneously on the surface of various materials immersed in the polymerization solution. The distribution of the resulting polymers between the precipitated and deposited forms depends on many variables and varies within a broad range. To coat materials with a polymer layer, it is desirable to shift this distribution toward the surface-deposited form, whereas bulk polymerization should be diminished as much as possible. This can usually be achieved by choosing appropriate reaction conditions, such as the concentration of the solution components, the concentration ratio of oxidant to monomer, the reaction temperature, and an appropriate treatment of the surface of the material to be coated by conducting polymers. Although a bulk polymerization cannot be completely suppressed, a reasonably high yield of surface-deposited polymers can be achieved by adjusting the reaction conditions (Malinauskas 2001). [Pg.423]

Several techniques are applicable to bulk polymer materials, such as vacuum deposition technologies. Vacuum deposition processes may be used to obtain thin polymer films that have high density, thermal stability, and insolubility in organic solvents, acids, and alkalis. These polymer deposition techniques involve in situ polymerization on a substrate surface affected by various factors. The layers can be deposited on any substrates that cannot be damaged by the vacuum processes. The following are all examples of vacuum deposition processes (Skolheim 1986 Harsanyi 20(X))  [Pg.423]

The most successful approach so far has been a modification of the PLD method, described earlier. Previous work with UV PLD showed the ability of this technique to deposit thin films of various types of polymer materials. However, it has also been established that the PLD of polymers in a standard variant is limited to a small class of materials. [Pg.424]

It should be noted that in the CVD method with laser activation, the method of cooling the substrate during polymer deposition is also effective. This cooling method creates conditions that hamper the polymer s degradation and allows for a considerable increase in the deposition rate. For example, by irradiating a cooled substrate with an excimer laser in an organic gas environment, polymethylmethacrylate (PMMA) films have been selectively deposited with a high deposition rate (Takashima et al. 1994). [Pg.424]

It should be stressed that the appearance of effective dry methods for polymer deposition is an important achievement, because the standard wet processes do not promote device integration into modem semiconductor processing (Harsanyi 2000). [Pg.424]


Fabrication of Polymer Film Samples for Thermal Stability Testing... [Pg.335]

Another approach to the fabrication of LB films from prefonned polymers is to fonn a hydrophobic main chain by reacting monomers tenninated by a vinyl group [102, 103, 104, 105 and 106]. The side groups studied also included perfluorinated hydrocarbon chains, which tilt with respect to the nonnal to the plane of the film, whereas the analogous ordinary hydrocarbon chains do not [105]. [Pg.2619]

Figure 12. Description of the functions of polymer films forming organic resists, acting as the information pattern in the design and fabrication of electronic integrated circuits. Figure 12. Description of the functions of polymer films forming organic resists, acting as the information pattern in the design and fabrication of electronic integrated circuits.
A vapor phase grafting process based on the ozonization of polymer films and fabrics followed by a treatment with vapors, such as acrylonitrile, dichloroethylene, and vinyl acetate, has been patented by Polyplastic (66). Also cotton fabrics can be used as substrates. [Pg.126]

Structuring of polymer films attracts considerable attention, and various radiation sources have been employed to crosslink selectively suitable polymers for, e.g., waveguide fabrication [99], Incompatible polymer blends have been forced into certain demixing morphologies along pre-patterned surfaces [55], Persistent structures could be formed by laser radiation in various nonabsorbing polymer solutions, such as polyisoprene in n-hexane [57, 58],... [Pg.159]

Electrostatic assembly, which involves attractive forces between two oppositely charged entities (polymers, nanoparticles, and substrates), has been proposed in the pioneering work of Her for the assembly of two- and three-dimensional structures.22 The LbL assembly of charged polyelectrolytes was later reported by Decher et al. for the fabrication of multilayer films of polyelectrolytes.10 23 Their technique is based on the consecutive adsorption of polyanions and polycations from dilute aqueous solutions onto a charged substrate (Fig. 13.2). [Pg.410]

The results from Miyachi et al. [64] showed that nonspecific adsorption of target DNA is decreased when SA embedded in a plasma-polymerized polymer thin film glass substrate is used (Fig. 3). The embedded SA on this substrate can selectively attach to biotinylated-probe ssDNA, which showed selective hybridization to complementary target DNA and a higher signal-to-noise ratio due to the low nonspecific DNA binding on substrate. However, we have to use a special polymerized system to fabricate thin polymer film by this method. [Pg.95]

ZITO films with composition ZnIn2,oSni,502 have been prepared by CVD experiments employing [In(dpm)3], [Sn(acac)2], and [Zn(hfa)2(diamine)], (hfa = hexafluoroacetylacetonato). Such films were used in the fabrication of polymer light-emitting diodes, which exhibited light outputs and current efficiencies almost 70% greater than those of commercial Sn-doped indium oxide (ITO) films. ... [Pg.290]

FIGURE 5.4.5 Process flow for the fabrication of polymer TFTs by inkjet printing. Steps 1 to 4 use a subtractive process for patterning of materials. The subtractive process prints an etch mask on a previously deposited film. Step 5 illustrates the additive inkjet printing process. The additive process simultaneously deposits and patterns the semiconductor material PQT-... [Pg.425]


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Film fabrication

Polymer fabrication

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