Extreme ultraviolet exposure system

Here, we shown a "conventional" system. It consists of a light source, an etched, transparent circuit diagram and a lens to focus the pattern upon the wafer which has a photoresist layer. Upon exposure, the unexposed part of the photoresist is wzished off. Sometimes, the exposed area is removed, depending upon weather the photoresist is positive or negative. Contrast this simple system with a method under development is the "Extreme Ultraviolet (EUV) system, using radiation from excited Xe gas, i.e.- 157 nm. The EUV system is shown in the following ... 

M. Nonchemical physical exposures in the workplace are important because they can cause systemic effects that mimic chemical toxidromes. The most important example is heat stress, which is a major occupational health issue. Other relevant nonchemioal, work-related physical exposure types include ionizing radiation, nonionizing radiation (such as ultraviolet, infrared, and microwave exposure), and increased barometric pressure (eg, among caisson workers). Except for extremes of exposure, the adverse effects of these physical factors are generally associated with chronic conditions. 

Stulen, R. H. 1999. Progress in the development of extreme ultraviolet lithography exposure systems. 

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